Excimer laser device, laser gas exchange method and partial gas exchange quantity calculation method
View Patent ↗To provide an excimer laser device and method in which the frequency of full gas exchange within the laser chamber is reduced, and more preferably full gas exchange is made unnecessary. The gas supply device and gas exhaust device are controlled so that the laser gas in the laser chamber is partially exchanged in a gas exchange quantity that maintains the quantity of impurities in the laser chamber at or below a fixed level. Also, the gas exchange quantity is obtained using the total quantity of output light energy reduction A, the total gas pressure in the laser chamber P, and output light energy reduction quantity per unit time k, for the case where partial gas exchange is repeated infinitely in the laser chamber.
1. An excimer laser device, comprising:
a laser chamber in which laser gas is enclosed and impurities increase with passage of time;
a gas supply device that supplies laser gas to the laser chamber;
a gas exhaust device that exhausts laser gas from the laser chamber; and
a controller that controls the gas supply device and the gas exhaust device,
a means for determining a laser gas replenishment quantity using a limiting value of a quantity of output light energy reduction, a total gas pressure in the laser chamber, and an output light energy reduction quantity per unit time when a partial gas exchange is required,
wherein the controller controls the gas supply device and the gas exhaust device so as to carry out the partial gas exchange of the laser gas in the laser chamber based on the determined laser gas replenishment quantity.
2. The excimer laser device according to claim 1 , wherein the controller controls the gas supply device and the gas exhaust device so as to carry out partial gas exchange of the laser gas in the laser chamber in a gas exchange quantity that maintains the quantity of impurities in the laser chamber at an approximately fixed level.
3. The excimer laser device according to claim 1 , wherein the controller controls the gas supply device and the gas exhaust device so as to carry out partial gas exchange of the laser gas in the laser chamber in a gas exchange quantity between a gas exchange quantity required to maintain the quantity of impurities in the laser chamber at an approximately fixed level and a gas exchange quantity greater by 5% than the gas exchange quantity required to maintain the quantity of impurities in the laser chamber at the approximately fixed level.
4. The excimer laser device according to claim 1 , wherein the controller controls the gas supply device and the gas exhaust device so as to carry out partial gas exchange of the laser gas in the laser chamber in a gas exchange quantity between a gas exchange quantity required to maintain the quantity of impurities in the laser chamber at an approximately fixed level and a gas exchange quantity greater by 10% than the gas exchange quantity required to maintain the quantity of impurities in the laser chamber at the approximately fixed level.
5. A partial gas exchange quantity calculation method that determines a partial gas exchange quantity that maintains a quantity of impurities in a laser chamber in which laser gas is enclosed and the impurities increase with passage of time, at an approximately fixed level, comprising the step of:
determining the partial gas exchange quantity using a limiting value of a quantity of output light energy reduction, a total gas pressure in the laser chamber, and an output light energy reduction quantity per unit time, for a case where partial gas exchange in the laser chamber is repeated.