Mesoscale pyramids, arrays and methods of preparation

1. A method of preparing a pyramidal particulate, said method comprising:

providing a substrate and a mask thereon, said mask comprising at least one aperture therethrough;

anisotropically treating said substrate through said aperture and under said mask to provide a pyramidal recess in said substrate, wherein said mask is undercut; and

depositing a layer of a first material component through said undercut mask and on said pyramidal recess surface to provide said pyramidal particulate with a smaller configuration than said pyramidal recess.

2. The method of claim 1 further comprising removing said pyramidal particulate from said substrate.

3. The method of claim 1 depositing at least one of a second material layer and a third material layer on said first material layer, in said recess.

4. The method of claim 1 wherein said aperture has a diameter dimension ranging from about 100 nm to about 250 nm.

5. The method of claim 1 wherein said mask comprises a substantially two-dimensional array of apertures, and at least said first material layer is deposited in an array of pyramidal recesses in said substrate.

6. The method of claim 5 removing said mask and releasing said pyramidal particulate.

7. The method of claim 5 wherein said substrate is anisotropically treated under said mask.

8. The method of claim 7 positioning said two-dimensional array of said material components at least partially within a dielectric material.

9. The method of claim 8 using said two-dimensional array to characterize optical properties of said pyramidal material components.

10. The method of claim 9 comprising at least one of microscopic and spectroscopic analyses of said pyramidal components, said two-dimensional array oriented about an axis of irradiation, said irradiation polarizable and wavelength variable.

11. The method of claim 10 correlating orientation of said pyramidal material components with at least one of illumination wave vector and polarization vector.

12. The method of claim 1 wherein said layer of said first material component on said pyramidal recess surface is deposited by physical vapor deposition.

13. The method of claim 12 wherein said physical vapor deposition is electron beam physical vapor deposition.