Mask data creation method
View Patent ↗A method of creating data of a mask for manufacturing a semiconductor device. The mask includes at least one auxiliary pattern arranged adjacent to a line pattern. The at least one auxiliary pattern is allocated in accordance with a rule-based method on the basis of an interval between a first line pattern and a second line pattern adjacent to the first line pattern. Size of the at least one auxiliary pattern is then optimized in accordance with a model-based OPC (Optical Proximity Correction), by shifting edges of the at least one auxiliary pattern and edges for one of the line patterns on the basis of a first light intensity threshold on the at least one auxiliary pattern and a second light intensity threshold on the line patterns.
1. A method of creating data of a mask for manufacturing a semiconductor device, the mask comprising at least one auxiliary pattern arranged adjacent to a line pattern, comprising:
allocating the at least one auxiliary pattern in accordance with a rule-based method on the basis of an interval between a first line pattern and a second line pattern adjacent to the first line pattern; and
optimizing a size of the at least one auxiliary pattern in accordance with a model-based OPC (Optical Proximity Correction), by shifting edges of the at least one auxiliary pattern and edges for one of the line patterns on the basis of a first light intensity threshold on the at least one auxiliary pattern and a second light intensity threshold on the line patterns.
2. The method claimed in claim 1 , wherein the first light intensity threshold is higher than the second light intensity threshold.
3. The method claimed in claim 2 , wherein the first light intensity threshold is from 4% to 40% higher than the second light intensity threshold.
4. The method claimed in claim 1 , the optimizing comprising giving an offset to the at least one auxiliary pattern so that the at least one auxiliary pattern is not transferred from the mask onto a resist layer on a semiconductor substrate.
5. The method claimed in claim 1 , wherein a width of the at least one auxiliary pattern allocated in the step of allocating is fixed.
6. The method claimed in claim 1 , wherein:
a table including a relationship between a range of the interval between the first line pattern and the second line pattern and a position where the at least one auxiliary pattern is allocated; and
the optimizing comprising optimizing a width of the at least one auxiliary pattern and widths of the first and the second line patterns.
7. The method claimed in claim 6 , wherein the table includes a relationship between a location and a corresponding number of the at least one auxiliary pattern to be allocated.
8. A method of creating data of a mask for manufacturing a semiconductor device, the mask comprising at least one auxiliary pattern arranged adjacent to a shaped pattern, comprising:
allocating the at least one auxiliary pattern in accordance with a rule-based method on the basis of an interval between a first shaped pattern and a second shaped pattern adjacent to the first shaped pattern; and
optimizing a size of the at least one auxiliary pattern in accordance with a model-based OPC (Optical Proximity Correction), by shifting edges of the at least one auxiliary pattern and edges for one of the shaped patterns on the basis of a first light intensity threshold on the at least one auxiliary pattern and a second light intensity threshold on the shaped patterns.
9. The method claimed in claim 8 , wherein the first light intensity threshold is from 4% to 40% higher than the second light intensity threshold.
10. The method claimed in claim 8 , the optimizing comprising giving an offset to the at least one auxiliary pattern so that the at least one auxiliary pattern is not transferred from the mask onto a resist layer on a semiconductor substrate.
11. The method claimed in claim 8 , wherein a width of the at least one auxiliary pattern allocated in the step of allocating is fixed.
12. The method claimed in claim 8 , wherein the shaped patterns are one of line patterns, hole patterns, and slit-shaped draw patterns.
13. A method of creating data of a mask, which includes at least one auxiliary pattern arranged adjacent to a line pattern, comprising:
allocating the at least one auxiliary pattern in accordance with a rule-based method on the basis of an interval between a first line pattern and a second line pattern adjacent to the first line pattern; and
optimizing a size of the at least one auxiliary pattern in accordance with a model-based OPC (Optical Proximity Correction), by setting a condition for shifting edges of the at least one auxiliary pattern and edges for one of the line patterns in which a first light intensity threshold on the at least one auxiliary pattern is higher than a second light intensity threshold on the line patterns to avoid transferring the at least one auxiliary pattern from the mask onto a resist layer.