IP Library Granted Patent US 7,361,579
Granted Patent B2
US 7,361,579 · App. 11/419,058 · Granted Apr 22, 2008

Method for selective chemical vapor deposition of nanotubes

Assignee: Motorola, Inc.
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Quick Facts
Patent No.
US 7,361,579
App. No.
11/419,058
Granted
Apr 22, 2008
Kind
B2
Abstract

A method of fabricating a nanotube structure which includes providing a substrate, providing a mask region positioned on the substrate, patterning and etching through the mask region to form at least one trench, depositing a conductive material layer within the at least one trench, depositing a solvent based nanoparticle catalyst onto the conductive material layer within the at least one trench, removing the mask region and subsequent layers grown thereon using a lift-off process, and forming at least one nanotube electrically connected to the conductive material layer using chemical vapor deposition with a methane precursor.

Claims (15)

1. A method of fabricating nanotube structures comprising the steps of:

providing a substrate;

providing at least one electronic circuit positioned on the substrate;

providing a mask region positioned on the substrate and the at least one electronic circuit;

patterning and etching through the mask region;

depositing a nanoparticle catalyst which includes a solvent onto the at least one electronic circuit;

removing the mask region;

forming at least one nanotube with a first end and a second end using a reaction chamber; and

wherein the first end of the at least one nanotube is connected to a first portion of the at least one circuit and the second end of the at least one nanotube is connected to a second portion of the at least one circuit.

2. A method as claimed in claim 1 wherein the step of depositing the nanoparticle catalyst includes one of spraying on and spinning on the nanoparticle catalyst.

3. A method as claimed in claim 1 wherein the step of forming the at least one nanotube includes a step of using one of methane, ethylene, acetylene, carbon monoxide, and another suitable hydrocarbon gas within the reaction chamber.

4. A method as claimed in claim 1 wherein the reaction chamber includes one of a chemical vapor deposition chamber, a molecular beam epitaxy chamber, a chemical beam epitaxy chamber, and another suitable chamber.

5. A method as claimed in claim 1 wherein the at least one nanotube includes one of carbon, boron nitride, and another suitable nanotube forming material.

6. A method as claimed in claim 1 further including the step of forming the at least one nanotube in the presence of an electric field.

7. A method as claimed in claim 1 wherein the first and second ends are electrically coupled to the first and second portions, respectively.

Assignments (2)
CHANGE OF NAME Recorded Jun 27, 2011
From: MOTOROLA, INC
To: MOTOROLA SOLUTIONS, INC.
Reel/Frame 026505/0179 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 26, 2011
From: ZHANG, RUTH YU-AI; TSUI, RAYMOND K.; TRESEK, JOHN, JR.; RAWLETT, ADAM M.
To: MOTOROLA, INC.
Reel/Frame 026500/0228 →
Continuity (3)
Division 1074029500 · Dec 18, 2003
Division 1014054800 · May 7, 2002
Related Publication 20060228477A1 · Oct 12, 2006