IP Library Granted Patent US 7,501,069
Granted Patent B2
US 7,501,069 · App. 11/421,173 · Granted Mar 10, 2009

Flexible structures for sensors and electronics

Assignee: The Board of Trustees of the University of Illinois
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Quick Facts
Patent No.
US 7,501,069
App. No.
11/421,173
Granted
Mar 10, 2009
Kind
B2
Abstract

This invention provides free-standing structures, functionalized free-standing structures and functional devices that are flexible, including nano- and micromachined flexible fabrics comprising woven networks and mesh networks. The present invention provides processing methods for making and functionalizing flexible free-standing structures having a wide range of integrated materials, devices and device components. The methods of the present invention are capable of providing large area functional electronic, optoelectronic, fluidic, and electromechanical devices and device arrays which exhibit good device performance in stretched, bent and/or deformed configurations.

Claims (18)

1. A method of making a free-standing structure, said method comprising the steps of:

providing a substrate;

providing a first sacrificial layer on the substrate;

providing a first patterned structural layer comprising a plurality of first structural elements on said first sacrificial layer, wherein the first structural elements are not in direct physical contact with each other, have inner surfaces in contact with the first sacrificial layer and have outer surfaces opposite to said inner surfaces;

providing a second sacrificial layer on the first patterned structural layer;

removing material from selected regions of said second sacrificial layer thereby forming a plurality of removal spaces in the second sacrificial layer that provides at least one exposed region of the outer surface of each of the first structural elements;

providing a second patterned structural layer comprising a plurality of second structural elements on said second sacrificial layer, wherein the second structural elements are not in direct physical contact with each other, and wherein at least one second structural element contacts at least one exposed region of the outer surface of each of the first structural elements; and

removing the first and second sacrificial layers, wherein removal of the first and second sacrificial layers releases the first and second patterned structural layers and generates said free-standing structure comprising interlocking assemblies of interconnected first and second structural elements, and wherein said interlocking assemblies of the interconnected first and second structural elements are independently displaceable;

wherein the free-standing structure comprises a fabric, wherein said interlocking assemblies of the interconnected first and second structural elements comprise elements of said fabric.

2. A method of making a structure, said method comprising the steps of:

providing a substrate;

providing a first sacrificial layer on the substrate;

providing a first patterned structural layer comprising a plurality of first structural elements on said first sacrificial layer, wherein the first structural elements are not in direct physical contact with each other, have inner surfaces in contact with the first sacrificial layer and have outer surfaces opposite to said inner surfaces;

providing a second sacrificial layer on the first patterned structural layer;

removing material from selected regions of said second sacrificial layer thereby forming a plurality of removal spaces in the second sacrificial layer that provides at least one exposed region of the outer surface of each of the first structural elements;

providing a second patterned structural layer comprising a plurality of second structural elements on said second sacrificial layer, wherein the second structural elements are not in direct physical contact with each other, and wherein at least one second structural element contacts at least one exposed region of the outer surface of each of the first structural elements; and

removing the first and second sacrificial layers, wherein removal of the first and second sacrificial layers releases the first and second patterned structural layers and generates said structure comprising interlocking assemblies of interconnected first and second structural elements, and wherein said interlocking assemblies of said interconnected first and second structural elements are independently displaceable; and

wherein said structure comprises a woven network of interwoven assemblies of said interconnected first and second structural elements, wherein said woven network comprises a first set of assemblies of structural elements provided in a woof configuration and a second set of assemblies of structural elements provided in a warp configuration.

Assignments (3)
CONFIRMATORY LICENSE Recorded May 25, 2011
From: ILLINOIS URBANA-CHAMPAIGN, UNIVERSITY OF
To: AIR FORCE, UNITED STATES
Reel/Frame 026420/0880 →
CONFIRMATORY LICENSE Recorded Aug 15, 2006
From: UNIVERSITY OF ILLINOIS URBANA-CHAMPAIGN
To: UNITED STATES AIR FORCE
Reel/Frame 018125/0178 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 10, 2006
From: LIU, CHANG; CHEN, NANNAN
To: THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS
Reel/Frame 018086/0478 →
Continuity (2)
Provisional Application 6068619600 · Jun 1, 2005
Related Publication 20070020445A1 · Jan 25, 2007