Bubbler for substrate processing

1. A vaporization chamber for a substrate processing system that comprises:

a main body made of aluminum; the main body defining a first inner surface, which defines, at least in part, a cavity;

a cover member that is also made of aluminum, the cover member defining a second inner surface, which also defines, at least in part, the cavity; the cover member comprising a carrier gas cover inlet, a liquid source cover inlet, a source cover outlet which extend from a first outer surface through the cover member to the second inner surface; and

a transition member that is made of stainless steel and has a transition outer surface and a transition inner surface; the transition inner surface being aluminum cladded; the cover member comprising a carrier gas cover inlet, a liquid source cover inlet, a source cover outlet which extend from a first outer surface through the cover member to second inner surface; the transition inner surface and the cover outer surface being welded together.

2. A vaporization chamber as in claim 1 , further comprising a liquid level sensing device that extends through an opening in the transition member and the cover member into the cavity.

3. A vaporization chamber as in claim 2 , wherein the liquid level sensing device is configured to sense the capacitance difference between a liquid source material and a vaporized source material.

4. A vaporization chamber as in claim 1 , wherein the liquid and vaporized source material is trisilane.

5. A vaporization chamber as in claim 1 , further comprising a cooling/heating jacket.

6. A vaporization chamber as in claim 1 , further comprising a first tubular member that extends from the carrier gas cover inlet to a lower portion of the cavity and a second tubular member that extends from the a liquid source cover inlet to the lower portion of the cavity.

7. A vaporization chamber as in claim 1 , including at least one connector that is welded to at least one of the carrier gas cover inlet, a liquid source cover inlet, and the source cover outlet.

8. A vaporization chamber as in claim 1 , wherein the transition inner surface comprises aluminum that is mechanically cladded to stainless steel.

9. A vaporization chamber as in claim 1 , wherein the vaporization chamber is a bubbler.

10. A vaporization chamber for vaporizing liquid trisilane:

a main body made of a non-ferric material the main body defining a first inner surface, which defines, at least in part, a cavity;

a quantity of liquid trisilane contained within the cavity;

a cover member that is also made of a non-ferric material, the cover member defining a second inner surface, which also defines, at least in part, the cavity; the cover member comprising a carrier gas cover inlet, a liquid source cover inlet, a source cover outlet which extend from a first outer surface through the cover member to the second inner surface; and

a transition member that is made of a ferric material and has a transition outer surface and a transition inner surface; the transition inner surface being cladded with a non-ferric material; the cover member comprising a carrier gas cover inlet, a liquid source cover inlet, a source cover outlet which extend from a first outer surface through the cover member to second inner surface; the transition inner surface and the cover outer surface being welded together.

11. A vaporization chamber as in claim 10 , wherein the main body is made of aluminum.

12. A vaporization chamber as in claim 10 , wherein the cover member is made of aluminum.

13. A vaporization chamber as in claim 10 , wherein the transition member is made of stainless steel.

14. A vaporization chamber as in claim 10 , wherein the transition inner surface is cladded with aluminum.