Photosensitive resin composition, method of manufacturing a thin-film transistor substrate, and method of manufacturing a common electrode substrate using the same
View Patent ↗A photosensitive resin composition for an organic layer pattern includes about 100 parts by weight of an acryl-based copolymer and about 5 to about 100 parts by weight of a 1,2-quinonediazide compound. The acryl-based copolymer is prepared by copolymerizing about 5 to about 60 percent by weight of an isobonyl carboxylate-based compound based on a total weight of the acryl-based copolymer, about 10 to about 30 percent by weight of an unsaturated compound carrying an epoxy group, about 20 to about 40 percent by weight of an olefin-based unsaturated compound, and about 10 to about 40 percent by weight of one selected from unsaturated carboxylic acid, unsaturated carboxylic acid anhydride, and a mixture thereof. Methods of manufacturing a TFT substrate and a common electrode substrate using the photosensitive resin composition are also provided. Advantageously, the organic layer pattern may have a mountain structure having an improved local flatness without concave and convex structures.
1. A method of manufacturing a common electrode substrate, the method comprising:
forming a light-blocking layer on a base substrate;
forming a color filter layer covering a portion of the light-blocking layer on the substrate;
forming an insulating layer covering the light-blocking layer and the color filter layer;
forming a common electrode layer having a boundary portion on the insulating layer;
coating a photosensitive resin composition on the common electrode layer to form a photoresist film, the photosensitive resin composition comprising:
about 100 parts by weight of an acryl-based copolymer prepared by copolymerizing i) about 5 to about 60 percent by weight of an isobonyl carboxylate-based compound comprising a compound represented by the chemical formula
wherein X represents an alkenyl group including C 1 -C 10 , and R 1 , R 2 , R 3 and R 4 represent hydrogen atoms or alkyl groups including C 1 -C 10 , ii) about 10 to about 30 percent by weight of an unsaturated compound carrying an epoxy group, iii) about 20 to about 40 percent by weight of an olefin-based unsaturated compound, and iv) about 10 to about 40 percent by weight of one selected from the group consisting of unsaturated carboxylic acid, unsaturated carboxylic acid anhydride, and a mixture of the unsaturated carboxylic acid and unsaturated carboxylic acid anhydride; and
about 5 to about 100 parts by weight of a 1,2-quinonediazide compound;
exposing the photoresist film to a light; and
developing the photoresist film exposed to the light to form a tilted layer having a tapered structure.
2. The method of claim 1 , wherein the exposing of the photosensitive resin composition to a light is performed by using a mask having a plurality of light-blocking patterns spaced apart from each other by predetermined distances.
3. A method of manufacturing a thin-film transistor substrate for a liquid crystal display apparatus, the method comprising:
forming a gate metal pattern comprising a gate electrode on a base substrate;
forming a gate-insulating layer on the gate metal pattern;
forming a channel layer corresponding to the gate electrode on the gate-insulating layer;
forming a source metal pattern comprising a source electrode and a drain electrode on the gate-insulating layer having the channel layer;
forming an overcoating layer that covers the gate-insulating layer, the channel layer, and the source metal pattern, and has a contact hole through which the drain electrode is exposed;
forming a pixel electrode layer that is electrically connected to the drain electrode via the contact hole and has a boundary portion on the overcoating layer;
coating a photosensitive resin composition on the pixel electrode layer to form a photoresist film, the photosensitive resin composition comprising:
about 100 parts by weight of an acryl-based copolymer prepared by copolymerizing i) about 5 to about 60 percent by weight of an isobonyl carboxylate-based compound comprising a compound represented by the chemical formula
wherein X represents an alkenyl group including C 1 -C 10 , and R 1 , R 2 , R 3 and R 4 represent hydrogen atoms or alkyl groups including C 1 -C 10 , ii) about 10 to about 30 percent by weight of an unsaturated compound carrying an epoxy group, iii) about 20 to about 40 percent by weight of an olefin-based unsaturated compound, and iv) about 10 to about 40 percent by weight of one selected from the group consisting of unsaturated carboxylic acid, unsaturated carboxylic acid anhydride, and a mixture of the unsaturated carboxylic acid and unsaturated carboxylic acid anhydride; and
about 5 to about 100 parts by weight of a 1,2-quinonediazide compound;
exposing the photoresist film to a light; and
developing the photoresist film exposed to the light to form a tilted layer having a tapered structure with a peak centered about a center of the boundary portion to increase a response speed of a liquid crystal formed on the tilted layer, wherein a shape of the tilted layer depends on an amount of light the photoresist film is exposed to.