Semiconductor device and method of fabricating the same
View Patent ↗There is provided a semiconductor device and method of fabricating the same that employs an insulation film of a borazine-based compound to provided enhanced contact between a material for insulation and that for interconnection, increased mechanical strength, and other improved characteristics. The semiconductor device includes a first insulation layer having a recess with a first conductor layer buried therein, an etching stopper layer formed on the first insulation layer, a second insulation layer formed on the etching stopper layer, a third insulation layer formed on the second insulation layer, and a second conductor layer buried in a recess of the second and third insulation layers. The second and third insulation layers are grown by chemical vapor deposition with a carbon-containing borazine compound used as a source material and the third insulation layer is smaller in carbon content than the second insulation layer.
1. A semiconductor device, comprising
a first insulation layer,
a first conductor layer formed in the first insulation layer,
an etching stopper layer formed on the first insulation layer and the first conductor layer,
a second insulation layer formed on the etching stopper layer, the second insulation layer having a first via hole and a first trench formed therein, wherein a bottom of the first via hole exposes an upper surface of the first conductor layer and a top of the first via hole connects to a bottom of the first trench,
a second conductor layer formed in the first via hole and the first trench,
a third insulation layer formed on the second insulation layer, and
a cap layer formed on the second conductor layer and the third insulation layer;
wherein, the third insulation layer connects to the second insulation layer and the cap layer,
wherein each of the second insulation layer and the third insulation layer independently comprises a borazine based compound, and
wherein the third insulation layer has a smaller carbon content than the second insulation layer.
2. The semiconductor device of claim 1 , wherein the borazine based compound comprised in the second insulation layer and the borazine based compound comprised in the third insulation layer are independently selected from B,B,B-trimethylborazine, N,N,N-trimethylborazine, B,B,B-triethylborazine, N,N,N-triethylborazine, B,B,B-tripropylborazine, N,N,N-tripropylborazine, B,B,B-tributylborazine, N,N,N-tributylborazine, B,B,B,N,N,N-hexamethylborazine, B,B,B-triethyl-N,N,N-trimethylborazine, B,B,B-tripropyl-N,N,N-trimethylborazine, B,B,B-triethenylborazine, B,B,B-triethenyl-N,N,N-trimethylborazine, B,B,B-triethynylborazine, B,B,B-triethynyl-N,N,N-trimethylborazine, B,B,B-triaminoborazine, B,B,B-triamino-N,N,N-trimethylborazine, B,B,B-trismethylaminoborazine, B,B,B-trismethylamino-N,N,N-trimethylborazine, B,B,B-trisdimethylaminoborazine, B,B,B-trisdimethylamino-N,N,N-trimethylborazine, and combinations thereof.
3. The semiconductor device of claim 1 , wherein the second insulation layer consists of a first borazine based compound, and wherein the third insulation layer consists of a second borazine based compound.
4. The semiconductor device of claim 1 , wherein the second insulation layer has a carbon content of 5-40%, as determined by x-ray photoelectron spectroscopy.
5. The semiconductor device of claim 4 , wherein the third insulation layer has a carbon content of 1-25%, as determined by x-ray photoelectron spectroscopy.
6. The semiconductor device of claim 4 , wherein the third insulation layer has a carbon content of 2-30%, as determined by x-ray photoelectron spectroscopy.
7. The semiconductor device of claim 1 , wherein the cap layer comprises a material selected from SiC, SiO 2 , SiN, SiCN, and SiOC.
8. The semiconductor device of claim 1 , wherein the third insulation layer comprises N,N,N-trimethylborazine.
9. The semiconductor device of claim 1 , wherein the second insulation layer comprises B,B,B—N,N,N-hexamethylborazine.
10. The semiconductor device of claim 1 , wherein the second insulation layer comprises B,B,B—N,N,N-hexamethylborazine, wherein the third insulation layer comprises N,N,N-trimethylborazine, and wherein the cap layer comprises SiC.
11. The semiconductor device of claim 10 , wherein the carbon content of the second insulation layer is 32%, as determined by x-ray photoelectron spectroscopy, and wherein the carbon content of the third insulation layer is 25%, as determined by x-ray photoelectron spectroscopy.
12. A semi conductor device, comprising
a first insulation layer,
a first conductor layer formed in the first insulation layer,
an etching stopper layer formed on the first insulation layer and the first conductor layer,
a second insulation layer formed on the etching stopper layer, the second insulation layer having a first via hole and a first trench formed therein, wherein a bottom of the first via hole exposes an upper surface of the first conductor layer and a top of the first via hole connects to a bottom of the first trench,
a second conductor layer formed in the first via hole and the first trench,
a third insulation layer formed between the second insulation layer and the second conductor layer, wherein the third insulation layer forms a side wall and a bottom surface of the first trench and a side wall of the first via hole, and wherein the third insulation layer connects to the second insulation layer and the second conductor layer, and
a cap layer formed on the second conductor layer, the second insulation layer, and the third insulation layer;
wherein each of the second insulation layer and the third insulation layer independently comprises a borazine based compound, and
wherein the third insulation layer has a smaller carbon content than the second insulating layer.
13. The semiconductor device of claim 12 , wherein the second insulation layer consists of a first borazine based compound, and the third insulation layer consists of a second borazine based compound.
14. The semiconductor device of claim 12 , wherein the cap layer comprises SiO 2 .
15. The semiconductor device of claim 12 , wherein the second conductor layer comprises copper.
16. A semiconductor device, comprising
a first insulation layer,
a first conductor layer formed in the first insulation layer,
an etching stopper layer formed on the first insulation layer and the first conductor layer,
a third insulation layer formed on the etching stopper layer,
a second insulation layer formed on the third insulation layer, the second insulation layer having a first via hole and a first trench formed therein, wherein a bottom of the first via hole exposes an upper surface of the first conductor layer and a top of the first via hole connects to a bottom of the first trench,
a second conductor layer formed in the first via hole and the first trench, and
a cap layer formed on the second conductor layer, the second insulation layer;
wherein, the third insulation layer connects to the second insulation layer and the etching stopper layer,
wherein each of the second insulation layer and the third insulation layer independently comprises a borazine based compound, and
wherein the third insulation layer has a smaller carbon content than the second insulation layer.
17. The semiconductor device of claim 16 , wherein the second insulation layer consists of a first borazine based compound and the third insulation layer consists of a second borazine based compound.
18. The semiconductor device of claim 16 , wherein the second conductor layer comprises copper.
19. The semiconductor device of claim 16 , wherein the third insulation layer comprises N,N,N-trimethylborazine.
20. The semiconductor device of claim 16 , wherein the second insulation layer comprises B,B,B—N,N,N-hexamethylborazine.