IP Library Granted Patent US 7,459,211
Granted Patent B2
US 7,459,211 · App. 11/463,907 · Granted Dec 2, 2008

Anti-ultraviolet reflector

Assignee: Chi Lin Technology Co., Ltd.
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Quick Facts
Patent No.
US 7,459,211
App. No.
11/463,907
Granted
Dec 2, 2008
Kind
B2
Abstract

Disclosed is an anti-UV reflector for distributing a light from a point light source or a linear light uniformly over a target. The anti-UV reflector mainly includes a light reflecting polymeric substrate and a protecting layer of anti-UV material provided on the polycarbonate substrate for reducing yellowing in the polycarbonate substrate. When a light from a point light source or a linear light illuminates the anti-UV reflector, UV radiation in the light is filtered or absorbed by the protecting layer thereby reducing yellowing in the polyearbonate substrate.

Claims (16)

1. An anti-ultraviolet (anti-UV) reflector, comprising:

a polymeric substrate, wherein the polymeric substrate is made of polycarbonate and further comprises inorganic compound particles, and the inorganic compound is selected from the group consisted of titanium dioxide, calcium carbonate, barium sulfate, magnesium oxide, zinc oxide and mixtures thereof;

a polypropylene layer disposed on the polymeric substrate, wherein the polypropylene layer further comprises inorganic compound particles, an anti-UV ingredient, and an acid anhydride; and

an adhesive layer disposed between the polymeric substrate and the polypropylene layer.

2. The anti-UV reflector according to claim 1 , wherein the inorganic compound is selected from the group consisted of titanium dioxide, calcium carbonate, barium sulfate, magnesium oxide, zinc oxide and mixtures thereof.

3. The anti-UV reflector according to claim 1 , wherein the anti-UV ingredient is an UV absorbing agent selected from the group consisted of benzotriazole (BTA), benzophenone, cyanoacrylate, amino-type compound, hindered amino-type compound, salicyl-type compound, nickel complex and mixtures thereof.

4. An anti-UV reflector, comprising:

a polymeric substrate, wherein the polymeric substrate is made of polycarbonate and further comprises inorganic compound particles, and the inorganic compound is selected from the group consisted of titanium dioxide, calcium carbonate, barium sulfate, magnesium oxide, zinc oxide and mixtures thereof, and an acid anhydride; and

an acrylic resin layer disposed on the polymeric substrate, wherein the acrylic resin layer further comprises inorganic compound particles and an anti-UV ingredient.

5. The anti-UV reflector according to claim 4 , wherein the inorganic compound is selected from the group consisted of titanium dioxide, calcium carbonate, barium sulfate, magnesium oxide, zinc oxide and mixtures thereof.

6. The anti-UV reflector according to claim 4 , wherein the anti-UV ingredient is an UV absorbing agent selected from the group consisted of benzotriazole (BTA), benzophenone, cyanoacrylate, amino-type compound, hindered amino-type compound, salicyl-type compound, nickel complex and mixtures thereof.

7. An anti-UV reflector, comprising:

a polymeric substrate, wherein the polymeric substrate is made of polycarbonate and further comprises inorganic compound particles, and the inorganic compound is selected from the group consisted of titanium dioxide, calcium carbonate, barium sulfate, magnesium oxide, zinc oxide and mixtures thereof; and

a protection layer disposed on the polymeric substrate, wherein the protection layer is made of a material selected from the group consisted of polyester, coating resin, fluorocarbon resin, silicone resin, acrylic resin, alkyd resin, polyurethane (PU) resin, epoxy resin, unsaturated polyester resin and mixtures thereof, and the protection layer further comprises inorganic compound particles and an anti-UV ingredient.

8. The anti-UV reflector according to claim 7 , wherein the inorganic compound is selected from the group consisted of titanium dioxide, calcium carbonate, barium sulfate, magnesium oxide, zinc oxide and mixtures thereof.

9. The anti-UV reflector according to claim 7 , wherein the anti-UV ingredient is an UV absorbing agent selected from the group consisted of benzotriazole (BTA), benzophenone, cyanoacrylate, amino-type compound, hindered amino-type compound, salicyl-type compound, nickel complex and mixtures thereof.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 27, 2015
From: CHI LIN TECHNOLOGY CO., LTD.
To: CHI MEI CORPORATION
Reel/Frame 036887/0891 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 17, 2013
From: CHI LIN OPTOELECTRONICS CO., LTD.
To: CHI LIN TECHNOLOGY CO., LTD.
Reel/Frame 030438/0231 →
CHANGE OF NAME Recorded May 15, 2013
From: CHI LIN TECHNOLOGY CO., LTD.
To: CHI LIN OPTOELECTRONICS CO., LTD.
Reel/Frame 030425/0223 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 11, 2006
From: SHIH, HSI-HSIN; WU, KUO-LUNG; CHANG, TIEN-CHIEH; CHENG, SHIH-KAI; LEE, MAO-SONG
To: CHI LIN TECHNOLOGY CO., LTD.
Reel/Frame 018091/0160 →
Priority Claims (1)
TW 94127631 A · Aug 12, 2005 · national
Continuity (1)
Related Publication 20070037000A1 · Feb 15, 2007