Substrate processing apparatus and substrate processing method
View Patent ↗A substrate processing apparatus performs a chemical solution process in a chemical solution process room that is partially formed within a chamber. During the chemical solution process, the substrate processing apparatus seals the chemical solution process room, and measures the pressure within the chemical solution process room, and controls the pressure within the chemical solution process room, based on a measured value. Irrespective of location environment of the substrate processing apparatus, the chemical solution process room can be controlled to a predetermined pressure. The substrate processing apparatus also permits efficient pressure control with respect to a minimum required amount of region.
1. A substrate processing apparatus that performs a predetermined process of a substrate comprising:
a) a chamber having a first processing room and a second processing room;
b) a partition member that vertically partitions said chamber into said first processing room, and said second processing room;
c) a processing part that processes the substrate with a chemical solution in said first processing room;
d) a measuring part that measures pressure within said first processing room; and
e) a pressure adjusting part that adjusts the pressure within said first processing room, based on a measurement on said measuring part, wherein said processing part comprises:
c-1) a processing bath that stores a chemical solution and is disposed within said first processing room; and
c-2) a holding part that holds and immerses the substrates in the chemical solution stored in said processing bath,
said first processing room and said second processing room are arranged vertically in said chamber relative to each other, and
said second processing room is provided with a plurality of deionized water discharging portions through which deionized water is supplied to the substrate.
2. The substrate processing apparatus according to claim 1 wherein,
said partition member is provided with a transfer gate to permit passage of the substrate, and a door to open and close said transfer gate; and
said pressure adjusting part adjusts the pressure within said first processing room, with said door closed.
3. The substrate processing apparatus according to claim 2 wherein, said pressure adjusting part comprises:
e-1) a gas supplying part that supplies gas into said first processing room;
e-2) a gas exhausting part that exhausts gas within said first processing room; and
e-3) a controller that controls a flow of at least one of said gas supplying part and said gas exhausting part.
4. The substrate processing apparatus according to claim 3 wherein,
said second processing room is disposed between said first processing room and a gate through which the substrate is loaded and unloaded with respect to said chamber
5. The substrate processing apparatus according to claim 4 wherein, said holding part transports the substrate between said first processing room and said second processing room.
6. The substrate processing apparatus according to claim 5 wherein, said controller adjusts pressure within said first processing room according to a content of a process in said processing part.