IP Library Granted Patent US 7,800,086
Granted Patent B2
US 7,800,086 · App. 11/464,887 · Granted Sep 21, 2010

Arrangement for radiation generation by means of a gas discharge

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Quick Facts
Patent No.
US 7,800,086
App. No.
11/464,887
Granted
Sep 21, 2010
Kind
B2
Abstract

An arrangement for the generation of radiation by a gas discharge has the object of achieving a considerable reduction in the inductance of the discharge circuit for the gas discharge while simultaneously increasing the lifetime of the electrode system. Also, the use of different emitters is ensured. A rotary electrode arrangement accommodated in the discharge chamber contains electrodes which are rigidly connected to one another at a distance from one another and are mounted so as to be rotatable around a common axis. Capacitor elements of a high-voltage power supply for generating high-voltage pulses for the two electrodes are arranged in a free space formed by the mutual distance. The electrodes are electrically connected to the capacitor elements and to a voltage source for charging the capacitor elements.

Claims (30)

1. An arrangement for generating radiation by a gas discharge comprising:

a discharge chamber having a discharge area for the gas discharge for forming a plasma that emits the radiation from a starting material and an emission opening for the generated radiation;

a first electrode and a second electrode, said electrodes being mounted so as to be rotatable;

a high-voltage power supply for generating high-voltage pulses between the two electrodes;

said electrodes being rigidly connected to one another at a distance from one another and being mounted so as to be rotatable around a common axis;

capacitor elements of said high-voltage power supply being arranged in a free space formed by the mutual distance; and

said electrodes being electrically connected to said capacitor elements and to a voltage source for charging the capacitor elements.

2. The arrangement according to claim 1 , wherein the electrodes are immersed in baths of a molten metal which are electrically separated from one another, so that the surface of the electrodes is wetted by the metal during the rotation of the electrodes.

3. The arrangement according to claim 2 , wherein the metal bath is a tin bath.

4. The arrangement according to claim 2 , wherein the metal bath is a lithium bath or gallium bath.

5. The arrangement according to claim 1 , wherein the electrodes are in electrical contact with immersion elements which are oriented coaxial to the axis of rotation and which penetrate into molten metal baths which are electrically separated from one another, wherein the electrical connection of the electrodes to the voltage source is carried out by the metal bath.

6. The arrangement according to claim 3 , wherein the electrical connection of the electrodes to the voltage source is carried out by melt bath.

7. The arrangement according to claim 6 , wherein an injection device is directed to the discharge area, which injection device supplies a series of individual volumes of the starting material serving to generate radiation and injects them into the discharge area at a distance from the electrodes.

8. The arrangement according to claim 4 , wherein an injection device is directed to the discharge area, which injection device supplies a series of individual volumes of the starting material serving to generate radiation and injects them into the discharge area at a distance from the electrodes.

9. The arrangement according to claim 5 , wherein an injection device is directed to the discharge area, which injection device supplies a series of individual volumes of the starting material serving to generate radiation and injects them into the discharge area at a distance from the electrodes.

10. The arrangement according to claim 1 , wherein an injection device is directed to the discharge area, which injection device supplies a series of individual volumes of the starting material serving to generate radiation and injects them into the discharge area at a distance from the electrodes, and in that the electrical connection of the electrodes to the voltage source is carried out by sliding contacts.

11. The arrangement according to claim 7 , wherein the individual volumes injected into the discharge area are formed as liquid or solid droplets.

12. The arrangement according to claim 11 , wherein the droplets comprise metal material.

13. The arrangement according to claim 12 , wherein tine or lithium is provided as metal material.

14. The arrangement according to claim 11 , wherein the droplets comprise liquid or frozen xenon.

15. The arrangement according to claim 3 , wherein the molten metal picked up by the electrodes is provided as starting material for the generation of radiation.

16. The arrangement according to claim 10 , wherein an energy beam provided by an energy beam source is directed to the starting material for the generation of radiation so that an at least partial pre-ionization of the starting material is carried out.

17. The arrangement according to claim 16 , wherein the energy beam source is a laser beam source.

18. The arrangement according to claim 16 , wherein the energy beam source is an electron beam source.

19. The arrangement according to claim 16 , wherein the energy beam source is an ion beam source.

20. The arrangement according to claim 1 , wherein a device for preventing deposits of material arranged between the discharge area and the capacitor elements is accommodated in the free space between the electrodes.

21. The arrangement according to claim 20 , wherein the device is a labyrinth seal comprising cylindrical rings which are oriented coaxial to the axis of rotation, arranged in an alternating manner at the electrodes, overlap at least partially, and surround the capacitor elements.

22. The arrangement according to claim 21 , wherein the cylindrical rings comprise metal.

23. The arrangement according to claim 21 , wherein the cylindrical rings comprise electrically insulating ceramic material.

24. The arrangement according to claim 1 , wherein cooling ducts are arranged in the electrodes.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 17, 2014
From: XTREME TECHNOLOGIES GMBH
To: USHIO DENKI KABUSHIKI KAISHA
Reel/Frame 032086/0615 →
CHANGE OF ASSIGNEE'S ADDRESS Recorded Oct 25, 2011
From: XTREME TECHNOLOGIES GMBH
To: XTREME TECHNOLOGIES GMBH
Reel/Frame 027114/0810 →
CHANGE OF ASSIGNEE'S ADDRESS Recorded Aug 16, 2010
From: XTREME TECHNOLOGIES GMBH
To: XTREME TECHNOLOGIES GMBH
Reel/Frame 024841/0548 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 16, 2006
From: ZIENER, DR. CHRISTIAN; HERGENHAN, DR. GUIDO; FLOHRER, FRANK; KLEINSCHMIDT, DR. JUERGEN
To: XTREME TECHNOLOGIES GMBH
Reel/Frame 018118/0621 →