Patent Assignment
Reel/Frame 032086/0615
Assignment of Assignor's Interest
Recorded: 2014-01-17
Pages: 6
Assignor
XTREME TECHNOLOGIES GMBH
Executed: 2013-12-10
Assignee
USHIO DENKI KABUSHIKI KAISHA
2-6-1, OTE-MACHI, CHIYODA-KU, TOKYO-TO, JAPAN
Covered Properties
(50)
Method of Producing Short-Wave Radiation from a Gas-Discharge Plasma and Device for Implementing It
Patent:
6,414,438 →
Application:
09/693,490 →
Method and Apparatus for Generating High Output Power Gas Discharge Based Source of Extreme Ultraviolet Radiation and/or Soft X-Rays
Stable Energy Detector for Extreme Ultraviolet Radiation Detection
Arrangement for Generating Extreme Ultraviolet (Euv) Radiation Based on a Gas Discharge
Method for Generating Extreme Ultraviolet Radiation Based on a Radiation-Emitting Plasma
Arrangement for Monitoring the Energy Radiated by an Euv Radiation Source
Method for Energy Control of Pulsed Driven, Gas Discharged-Coupled Beam Sources
Method for Energy Stabilization of Gas Discharged Pumped in Selected Impulse Following Driven Beam Sources
Detector Arrangement for Energy Measurement of Pulsed X-Ray Radiation
Arrangement for the Suppression of Particle Emission in the Generation of Radiation Based on Hot Plasma
Method for the Stabilization of the Radiation Output of a Gas Discharge-Coupled Radiation Source in Pulsed Operation
Method and Device for Producing Extreme Ultraviolet Radiation or Soft X-Ray Radiation
Plasma Radiation Source and Device for Creating a Gas Curtain for Plasma Radiation Sources
Arrangement for the Optical Detection of a Moving Target Flow for a Pulsed Energy Beam Pumped Radiation
Radiation Source for Generating Extreme Ultraviolet Radiation
Radiation Source with High Average Euv Radiation Output
Arrangement for the Generation of Euv Radiation with High Repetition Rates
Arrangement for Debris Reduction in a Radiation Source Based on a Plasma
Arrangement for Generating Pulsed Currents with a High Repetition Rate and High Current Strength for Gas Discharge Pumped Radiation Sources
Apparatus for the Temporally Stable Generation of Euv Radiation by Means of a Laser-Induced Plasma
Arrangement for Providing Target Material for the Generation of Short-Wavelength Electromagnetic Radiation
Arrangement for Providing a Reproducible Target Flow for the Energy Beam-Induced Generation of Short-Wavelength Electromagnetic Radiation
Device and Method for Generating Extreme Ultraviolet (Euv) Radiation
Method and Arrangement for the Suppression of Debris in the Generation of Short-Wavelength Radiation Based on a Plasma
Radiation Source for the Generation of Short-Wavelength Radiation
Collector Mirror for Plasma-Based, Short-Wavelength Radiation Sources
Arrangement for the Generation of Intensive Short-Wavelength Radiation Based on a Gas Discharge Plasma
Arrangement and Method for the Generation of Extreme Ultraviolet Radiation
Arrangement for Radiation Generation by Means of a Gas Discharge
Euv Radiation Source with High Radiation Output Based on a Gas Discharge
Arrangement for the Suppression of Unwanted Spectral Components in a Plasma-Based Euv Radiation Source
Arrangement for the Generation of Short-Wavelength Radiation Based on a Gas Discharge Plasma and Method for the Production of Coolant-Carrying Electrode Housing
Narrow-Band Transmission Filter for Euv Radiation
Arrangement for Generating Extreme Ultraviolet Radiation Based on an Electrically Operated Gas Discharge
Arrangement for Generating Extreme Ultraviolet Radiation by Means of an Electrically Operated Gas Discharge
Arrangement for Generating Extreme Ultraviolet Radiation from a Plasma Generated by an Energy Beam with High Conversion Efficiency and Minimum Contamination
Arrangement for the Generation of Extreme Ultraviolet Radiation by Means of Electric Discharge at Electrodes Which Can Be Regenerated
Method and Arrangement for Stabilizing the Average Emitted Radiation Output of a Pulsed Radiation Source
Arrangement and Method for the Generation of Extreme Ultraviolet Radiation by Means of an Electrically Operated Gas Discharge
Arrangement for Switching High Electric Currents by a Gas Discharge
Device for the Generation of a Gas Curtain for Plasma-Based Euv Radiation Sources
Method and Arrangement for Cleaning Optical Surfaces in Plasma-Based Radiation Sources
Arrangement for Generating Euv Radiation
Arrangement for the Continuous Generation of Liquid Tin as Emitter Material in Euv Radiation Sources
Method and Apparatus for the Generation of Euv Radiation from a Gas Discharge Plasma
Method and Arrangement for the Stabilization of the Source Location of the Generation of Extreme Ultraviolet (Euv) Radiation Based on a Discharge Plasma
Method for the Spatially Resolved Measurement of Parameters in a Cross Section of a Beam Bundle of High-Energy Radiation of High Intensity
Method and Apparatus for the Generation of Short-Wavelength Radiation by Means of a Gas Discharge-Based High-Frequency, High-Current Discharge
Method and Arrangement for the Adjustment of Characteristics of a Beam Bundle of High-Energy Radiation Emitted from a Plasma
Device for Generating Short-Wavelength Electromagnetic Radiation Based on a Gas Discharge Plasma
Related Assignments
(3)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Jun 5, 2012
From: AIXUV GMBH
To: BRUKER ADVANCED SUPERCON GMBH
Reel/Frame 028318/0671 →
Assignment of Assignor's Interest
Jun 5, 2015
From: BRUKER ADVANCED SUPERCONGMBH
To: RI RESEARCH INSTRUMENTS GMBH
Reel/Frame 035793/0380 →
Assignment of Assignor's Interest
Dec 19, 2018
From: COMMISSARIAT A L'ENERGIE ATOMIQUE (CEA)
To: RI RESEARCH INSTRUMENTS GMBH; USHIO DENKI KABUSHIKI KAISHA
Reel/Frame 048829/0753 →