Radiation source for the generation of short-wavelength radiation
View Patent ↗In a radiation source for the generation of short-wavelength radiation, it is the object of the invention to effectively increase the protection of the collimator optics by a buffer gas without substantially reducing the radiation transmission. A vacuum chamber which encloses a radiation-emitting plasma and is outfitted with at least one feed line and one outlet line for a buffer gas in order to ensure protection against debris for at least one optical element which directs the radiation to a radiation outlet opening in the vacuum chamber has chamber areas with particle deceleration of varying magnitude by the buffer gas. The particle deceleration is greater at least in a first chamber area in which the optical element is arranged than in any other chamber area.
1. A radiation source for the generation of short-wavelength radiation, comprising:
a radiation-emitting plasma being enclosed by a vacuum chamber;
said vacuum chamber being outfitted with at least one feed line and one outlet line for a buffer gas in order to ensure protection against debris for at least one optical element which directs the radiation to a radiation outlet opening in the vacuum chamber;
said vacuum chamber having chamber areas with particle deceleration of varying magnitude by the buffer gas; and
wherein the particle deceleration being greater at least in a first chamber area in which the optical element is arranged than in any other chamber area.
2. The radiation source according to claim 1 , wherein the chamber areas in which there is a particle deceleration of varying magnitude have different buffer gas densities, wherein the highest buffer gas density is present in the chamber area in which the optical element is arranged.
3. The radiation source according to claim 2 , wherein the feed line for the buffer gas has a plurality of partial lines whose gas outlet openings at the surface of the optical element exit in direction of the plasma.
4. The radiation source according to claim 1 , wherein the vacuum chamber has two chamber areas located next to one another, a first chamber area which contains the plasma and optical element is separated from a second chamber area with the radiation outlet opening by flow resistance which passes radiation.
5. The radiation source according to claim 4 , wherein the feed line for the buffer gas is connected to the first chamber area and the outlet line for the buffer gas, which communicates with a pump device, is connected to the second chamber area.
6. The radiation source according to claim 1 , wherein a coil arrangement is arranged in the chamber area in which the optical element is located in order to generate a magnetic field whose magnetic field lines are directed perpendicular to the optical axis of the optical element.
7. The radiation source according to claim 6 , wherein the coil arrangement is formed of a pair of Helmholtz coils.
8. The radiation source according to claim 6 , wherein a permanent magnet is provided for the coil arrangement.
9. The radiation source according to claim 1 , wherein the ratio of the distances from the plasma to the optical element and from the plasma to the radiation outlet opening is greater than 1:6.