Patent Assignment
Reel/Frame 027121/0006
Change of Assignee's Address
Recorded: 2011-10-26
Pages: 16
Assignor
XTREME TECHNOLOGIES GMBH
Executed: 2010-10-08
Assignee
XTREME TECHNOLOGIES GMBH
15 STEINBACHSTRASSE, AACHEN, 52074, GERMANY
Covered Properties
(35)
Arrangement for Generating Extreme Ultraviolet (Euv) Radiation Based on a Gas Discharge
Method for Generating Extreme Ultraviolet Radiation Based on a Radiation-Emitting Plasma
Arrangement for Monitoring the Energy Radiated by an Euv Radiation Source
Method for Energy Control of Pulsed Driven, Gas Discharged-Coupled Beam Sources
Method for Energy Stabilization of Gas Discharged Pumped in Selected Impulse Following Driven Beam Sources
Detector Arrangement for Energy Measurement of Pulsed X-Ray Radiation
Arrangement for the Suppression of Particle Emission in the Generation of Radiation Based on Hot Plasma
Method for the Stabilization of the Radiation Output of a Gas Discharge-Coupled Radiation Source in Pulsed Operation
Plasma Radiation Source and Device for Creating a Gas Curtain for Plasma Radiation Sources
Arrangement for the Optical Detection of a Moving Target Flow for a Pulsed Energy Beam Pumped Radiation
Radiation Source for Generating Extreme Ultraviolet Radiation
Multi-level accomodation unit
Application:
10/722,910 →
Publication:
US 2005/0115165
Radiation Source with High Average Euv Radiation Output
Arrangement for Debris Reduction in a Radiation Source Based on a Plasma
Arrangement for Generating Pulsed Currents with a High Repetition Rate and High Current Strength for Gas Discharge Pumped Radiation Sources
Apparatus for the Temporally Stable Generation of Euv Radiation by Means of a Laser-Induced Plasma
Arrangement for Providing Target Material for the Generation of Short-Wavelength Electromagnetic Radiation
Arrangement for Providing a Reproducible Target Flow for the Energy Beam-Induced Generation of Short-Wavelength Electromagnetic Radiation
Device and Method for Generating Extreme Ultraviolet (Euv) Radiation
Method and Arrangement for the Suppression of Debris in the Generation of Short-Wavelength Radiation Based on a Plasma
Radiation Source for the Generation of Short-Wavelength Radiation
Collector Mirror for Plasma-Based, Short-Wavelength Radiation Sources
Arrangement for the Generation of Intensive Short-Wavelength Radiation Based on a Gas Discharge Plasma
Arrangement and Method for the Generation of Extreme Ultraviolet Radiation
Euv Radiation Source with High Radiation Output Based on a Gas Discharge
Arrangement for the Generation of Short-Wavelength Radiation Based on a Gas Discharge Plasma and Method for the Production of Coolant-Carrying Electrode Housing
Narrow-Band Transmission Filter for Euv Radiation
Arrangement for Generating Extreme Ultraviolet Radiation Based on an Electrically Operated Gas Discharge
Arrangement for Generating Extreme Ultraviolet Radiation by Means of an Electrically Operated Gas Discharge
Arrangement for Generating Extreme Ultraviolet Radiation from a Plasma Generated by an Energy Beam with High Conversion Efficiency and Minimum Contamination
Arrangement for the Generation of Extreme Ultraviolet Radiation by Means of Electric Discharge at Electrodes Which Can Be Regenerated
Method and Arrangement for Stabilizing the Average Emitted Radiation Output of a Pulsed Radiation Source
Arrangement for Switching High Electric Currents by a Gas Discharge
Device for the Generation of a Gas Curtain for Plasma-Based Euv Radiation Sources
Method and Arrangement for Cleaning Optical Surfaces in Plasma-Based Radiation Sources
Related Assignments
(1)
Other recorded transfers of the patents in this record — the chain of ownership.