Electro-chemical processor
View Patent ↗A processor for making porous silicon or processing other substrates has first and second chamber assemblies. The first and second chamber assemblies include first and second seals for sealing against a wafer, and first and second electrodes, respectively. The second seal is moveable towards and away from a wafer in the processor, to move between a wafer load/unload position, and a wafer process position. The second electrode may move with the second seal. A light source shines light onto the first side of the wafer. The processor may be pivotable from a substantially horizontal orientation, for loading and unloading a wafer, to a substantially vertical orientation, for processing a wafer.
1. A processor comprising:
a housing;
a first seal in the housing;
a first electrode in the housing;
a second seal in the housing moveable relative to the first seal;
a second electrode having a polarity different from the first electrode; and
one or more lamps positioned to shine light through an open central area of the first electrode, towards a workpiece between the first and second seals.
2. The processor of claim 1 further comprising a motor linked to the housing for pivoting the housing.
3. The processor of claim 1 wherein the housing comprises a head attached to a base, and with second electrode and the second seal in the head, and with the first seal and the first electrode attached to the base.
4. The processor of claim 1 with the first electrode having an annular shape.
5. The processor of claim 3 with the second seal and the second electrode forming a moveable electrode assembly, and further including an actuator in the head attached to the moveable electrode assembly.
6. The processor of claim 5 further comprising a lens and a diffuser between the lamps and the first seal.
7. The processor of claim 4 with the first electrode having an angled inside facing surface.
8. The processor of claim 4 with the first electrode spaced apart from the first seal by a dimension less than the diameter of the first electrode.
9. The processor of claim 1 with the housing including a base and a head, and with the second seal and the second electrode in the head and the first seal and the first electrode in the base, and further including a plurality of locating pins in the base around an outside perimeter of the first seal, with an upper section of substantially each of the locating pins within a bore in the head, for maintaining the head in alignment with the base.
10. A porous silicon processor comprising:
a process chamber having a first seal spaced apart from a first electrode, and a second seal spaced apart from a second electrode, and with the second seal and the second electrode on a moveable electrode assembly;
a containment chamber substantially enclosing the process chamber, with a loading opening and a drain/exhaust opening connecting into the containment chamber; and
a light source positioned to project light onto a wafer supported on the first seal.
11. The processor of claim 10 further comprising a motor linked to the containment chamber for pivoting the containment chamber, and the process chamber in the containment chamber, into loading and processing positions.
12. The processor of claim 10 with the first electrode spaced apart from the first seal by a dimension 150% to 400% greater than the spacing between the second electrode and the second seal.
13. Apparatus, comprising:
a head having a moveable electrode assembly including a head electrode and a head seal substantially concentric with the head electrode, with the head seal spaced apart from the head electrode, and with the head seal and the head electrode forming a head process chamber with a second side of a wafer;
a head fluid inlet and a head fluid outlet in the electrode assembly connecting into the head process chamber;
a base having a base seal;
a base electrode supported on the base and substantially concentric with the base seal;
a window on the base, with the base, the base seal, the base electrode, and the window forming a base process chamber with a first side of the wafer;
a base fluid inlet and a base fluid outlet in the base; and
a light source projecting light through the window onto the first side of the wafer.
14. The processor of claim 13 with the base electrode having an open central area and with the light source projecting light through the open central area of the base electrode.
15. A processor comprising:
a workpiece support;
a first process chamber on a first side of the support;
a second process chamber on a second side of the support, opposite to the first side;
process fluid supply means for supplying process fluid into the first and second process chambers;
seal means for sealing the first process chamber from the second process chamber;
electrical current means for passing electrical current through a process fluid in the first process chamber, a workpiece, and process fluid in the second process chamber, respectively; and
lighting means for illuminating the workpiece.
16. The processor of claim 15 further comprising means for pivoting the process chambers between a load position and a process position.
17. The processor of claim 15 with the workpiece support comprising a seal.
18. A processor comprising:
a housing;
a first seal in the housing;
a first electrode in the housing having a first open central area;
a second seal in the housing moveable relative to the first seal;
a second electrode in the housing having second open central area;
one or more first lamps positioned to shine light through the first open central area of the first electrode towards the first seal; and
one or more second lamps positioned to shine light through the second open central area of the second electrode towards the second seal.