Resist removing method and resist removing apparatus
View Patent ↗In an inventive resist removing method, sulfuric acid and hydrogen peroxide water are supplied to a surface of a substrate to remove a resist from the substrate surface. Thereafter, hydrogen peroxide water is supplied to the substrate surface to remove the sulfuric acid from the substrate surface.
1. A resist removing apparatus comprising:
a substrate holding mechanism for holding a substrate;
a sulfuric acid supplying mechanism which supplies sulfuric acid to a surface of the substrate held by the substrate holding mechanism;
a hydrogen peroxide water supplying mechanism which supplies hydrogen peroxide water to the surface of the substrate held by the substrate holding mechanism;
a mixture nozzle, from which the sulfuric acid supplied from the sulfuric acid supplying mechanism and the hydrogen peroxide water supplied from the hydrogen peroxide water supplying mechanism are spouted toward the surface of the substrate held by the substrate holding mechanism;
a pipe connected to the mixture nozzle;
an agitation communication pipe provided in the pipe for agitating the sulfuric acid supplied from the sulfuric acid supplying mechanism and the hydrogen peroxide water supplied from the hydrogen peroxide water supplying mechanism; and
a control unit which controls the sulfuric acid supplying mechanism and the hydrogen peroxide water supplying mechanism so that the sulfuric acid and the hydrogen peroxide water are supplied to the surface of the substrate held by the substrate holding mechanism to remove a resist from the substrate surface, and then the hydrogen peroxide water is supplied to the substrate surface freed of the resist.
2. A resist removing apparatus as set forth in claim 1 , further comprising a mixing valve connected to the pipe, which mixes the sulfuric acid supplied from the sulfuric acid supplying mechanism and the hydrogen peroxide water supplied from the hydrogen peroxide water supplying mechanism to prepare a mixture of the sulfuric acid and the hydrogen peroxide water.
3. A resist removing apparatus as set forth in claim 1 , further comprising:
a second hydrogen peroxide water supplying mechanism which supplies hydrogen peroxide water to the surface of the substrate held by the substrate holding mechanism; and
a hydrogen peroxide water nozzle from which the hydrogen peroxide water supplied from the second hydrogen peroxide water supplying mechanism is spouted toward the surface of the substrate held by the substrate holding mechanism.
4. A resist moving apparatus comprising:
a substrate holding mechanism which holds a substrate;
a sulfuric acid supplying mechanism which supplies sulfuric acid to a surface of the substrate held by the substrate holding mechanism;
a hydrogen peroxide water supplying mechanism which supplies hydrogen peroxide water to the surface of the substrate held by the substrate holding mechanism;
a mixture nozzle, from which the sulfuric acid supplied from the sulfuric acid supplying mechanism and the hydrogen peroxide water supplied from the hydrogen peroxide water supplying mechanism are spouted toward the surface of the substrate held by the substrate holding mechanism;
a pipe connected to the mixture nozzle;
an agitation communication pipe provided in the pipe for agitating the sulfuric acid supplied from the sulfuric acid supplying mechanism and the hydrogen peroxide water supplied from the hydrogen peroxide water supplying mechanism; and
a control unit which controls the sulfuric acid supplying mechanism and the hydrogen peroxide water supplying mechanism so that the sulfuric acid and the hydrogen peroxide water are supplied to the surface of the substrate held by the substrate holding mechanism to remove a resist from the substrate surface.