Method of manufacturing an adaptive AIGaN buffer layer
View Patent ↗A method of compensating resistivity of a near-surface region of a substrate includes epitaxially growing a buffer layer on the substrate, wherein the buffer is grown as having a dopant concentration as dependent on resistivity and conductivity of the substrate, so as to deplete residual or excess charge within the near-surface region of the substrate. The dopant profile of the buffer layer be smoothly graded, or may consist of sub-layers of different dopant concentration, to also provide a highly resistive upper portion of the buffer layer ideal for subsequent device growth. Also, the buffer layer may be doped with carbon, and aluminum may be used to getter the carbon during epitaxial growth.
1. A method of compensating resistivity of a near-surface region of a substrate comprising:
providing the substrate;
measuring a resistivity of the substrate;
determining a conductivity type of the substrate; and
epitaxially growing a buffer layer on the substrate, the buffer layer being grown as having a dopant concentration selected responsive to the measured resistivity and the determined conductivity type of the substrate, to deplete residual charge within the near-surface region of the substrate,
wherein the substrate has n-type conductivity, and the buffer layer is doped with a p-type dopant at the dopant concentration selected responsive to the measured resistivity and the n-type conductivity of the substrate, and
wherein the buffer layer is doped with carbon, and aluminum is used to getter the carbon during said epitaxially growing the buffer layer.
2. The method of compensating resistivity of claim 1 , wherein the buffer layer is epitaxially grown as having sublayers of different respective dopant concentrations, and dopant concentration is greatest in a first sublayer nearest the substrate and is respectively lower in each succeeding sublayer.
3. The method of compensating resistivity of claim 1 , wherein the buffer layer is epitaxially grown as having a graded dopant profile, wherein dopant concentration is greatest at the substrate and progressively lower further away from the substrate.
4. The method of compensating resistivity of claim 1 , wherein the substrate is silicon carbide.
5. The method of compensating resistivity of claim 4 , wherein the buffer layer is gallium nitride.
6. A method of adaptively controlling resistivity of a near-surface region of a substrate comprising:
determining a conductivity type and initial resistivity of the substrate;
selecting a target resistivity for the substrate; and
epitaxially growing a buffer layer on the substrate, wherein a dopant concentration of the buffer layer is selected responsive to the conductivity type and the initial resistivity of the substrate to deplete residual charge within the substrate, so that the initial resistivity of the near-surface region of the substrate is changed to be substantially the target resistivity,
wherein the substrate has n-type conductivity, and the buffer layer is doped with a p-type dopant at the dopant concentration selected responsive to the initial resistivity and the n-type conductivity of the substrate, and
wherein the buffer layer is doped with carbon, and aluminum is used to getter carbon during said epitaxially growing a buffer layer.
7. The method of adaptively controlling resistivity of claim 6 , wherein the buffer layer is epitaxially grown as having sublayers of different respective dopant concentrations, wherein dopant concentration is greatest in a first sublayer nearest the substrate and is respectively lower in each succeeding sublayer.
8. The method of adaptively controlling resistivity of claim 6 , wherein the buffer layer is epitaxially grown as having a graded dopant profile, wherein dopant concentration is greatest at the substrate and progressively lower further away from the substrate.
9. The method of adaptively controlling resistivity of claim 6 , wherein the substrate is silicon carbide.
10. The method of adaptively controlling resistivity of claim 9 , wherein the buffer layer is gallium nitride.
11. The method of adaptively controlling resistivity of claim 6 , wherein the initial resistivity of the substrate is not less than 10 3 ohms/cm.
12. A method of adaptively controlling resistivity of a near-surface region of a substrate comprising:
determining a conductivity type and initial resistivity of the substrate;
selecting a target resistivity for the substrate; and
epitaxially growing a buffer layer on the substrate, wherein a dopant concentration of the buffer layer is selected responsive to the conductivity type and the initial resistivity of the substrate to deplete residual charge within the substrate, so that the initial resistivity of the near-surface region of the substrate is changed to be substantially the target resistivity.
13. The method of adaptively controlling resistivity of claim 12 , wherein the substrate has n-type conductivity, and the buffer layer is doped with a p-type dopant at a dopant concentration selected responsive to the initial resistivity and the n-type conductivity of the substrate.
14. The method of adaptively controlling resistivity of claim 13 , wherein the buffer layer is epitaxially grown as having sublayers of different respective dopant concentrations, wherein dopant concentration is greatest in a first sublayer nearest the substrate and is respectively lower in each succeeding sublayer.
15. The method of adaptively controlling resistivity of claim 13 , wherein the buffer layer is epitaxially grown as having a graded dopant profile, wherein dopant concentration is greatest at the substrate and progressively lower further away from the substrate.
16. The method of adaptively controlling resistivity of claim 12 , wherein the substrate has p-type conductivity, and the buffer layer is doped with a p-type dopant at a dopant concentration responsive to the resisitivity and the p-type conductivity of the substrate.
17. The method of adaptively controlling resistivity of claim 16 , wherein the buffer layer is epitaxially grown as having sublayers of different respective dopant concentrations, wherein dopant concentration is lowest in a first sublayer nearest the substrate and is respectively greater in each succeeding sublayer.
18. The method of adaptively controlling resistivity of claim 16 , wherein the buffer layer is epitaxially grown as having a graded dopant profile, wherein dopant concentration is lowest at the substrate and progressively greater further away from the substrate.
19. The method of adaptively controlling resistivity of claim 12 , wherein the substrate is silicon carbide.
20. The method of adaptively controlling resistivity of claim 19 , wherein the buffer layer is gallium nitride.
21. The method of adaptively controlling resistivity of claim 12 , wherein the buffer layer is epitaxially grown as having sublayers of different respective dopant concentration.
22. The method of adaptively controlling resistivity of claim 12 , wherein the buffer layer is epitaxially grown as having a graded dopant profile.
23. The method of adaptively controlling resistivity of claim 12 , wherein the substrate is silicon carbide, the buffer layer is gallium nitride and the buffer layer dopant is carbon.
24. The method of adaptively controlling resistivity of claim 12 , wherein the initial resistivity of the substrate is not less than 10 3 ohms/cm.