IP Library Assignment 072989/0001
Patent Assignment
Reel/Frame 072989/0001

Release of Security Interest in Intellectual Property Collateral at Reel/Frame No. 64185/0755

Recorded: 2025-09-30 Pages: 67
Assignor
Assignee
WOLFSPEED, INC.
4600 SILICON DRIVE, DURHAM, NORTH CAROLINA, 27703
Covered Properties (754)
Wide bandgap transistors with gate-source field plates
Application: 11/078,265 →
Publication: US US20060202272A1
Igbt Structure for Wide Band-Gap Semiconductor Materials
Application: 14/212,991 →
Publication: US US20150263145A1
Semiconductors Having Die Pads with Environmental Protection and Process of Making Semiconductors Having Die Pads with Environmental Protection
Application: 16/704,644 →
Publication: US US20210175138A1
Methods and Systems for Matching Both Dynamic and Static Parameters in Dies, Discretes, and/or Modules, and Methods and Systems Based on the Same
Application: 16/706,028 →
Publication: US US20210175214A1
Nondestructive Characterization for Crystalline Wafers
Application: 16/750,358 →
Publication: US US20200365685A1
High Speed, Efficient Sic Power Module
Application: 16/784,857 →
Publication: US US20200177079A1
Semiconductor Die Having a Drift Region with a Charge Compensation Region Formed Therein Where the Charge Compensation Region Has a Plurality of Guard Rings Formed in First and Second Opposite Doping Type Portions
Application: 16/806,489 →
Publication: US US20210273090A1
Power Semiconductor Package with Improved Performance
Application: 16/832,918 →
Publication: US US20210305166A1
High Speed, Efficient Sic Power Module
Application: 16/851,197 →
Publication: US US20200244164A1
Semiconductor Device Having a First Barrier Layer Formed on a Gate Pad and Gate Electrode and an Isolation Layer Provided Between the First Barrier Layer and a Second Barrier Layer Formed Thereon
Application: 16/863,642 →
Publication: US US20210343847A1
Conduction Enhancement Layers for Electrical Contact Regions in Power Devices
Application: 16/863,797 →
Publication: US US20210343708A1
Group III-Nitride High-Electron Mobility Transistors Configured with Recessed Source and/or Drain Contacts for Reduced On State Resistance and Process for Implementing the Same
Application: 16/876,752 →
Publication: US US20210359118A1
High Power Multilayer Module Having Low Inductance and Fast Switching for Paralleling Power Devices
Application: 16/890,503 →
Publication: US US20200304037A1
Power Devices with a Hybrid Gate Structure
Application: 16/907,163 →
Publication: US US20210399128A1
Laser-Assisted Method for Parting Crystalline Material
Application: 16/909,299 →
Publication: US US20200316724A1
Power Module
Application: 16/937,857 →
Publication: US US20210313243A1
Shielding Arrangements for Transformer Structures
Application: 16/942,082 →
Publication: US US20220037080A1
Sidewall Dopant Shielding Methods and Approaches for Trenched Semiconductor Device Structures
Application: 16/993,680 →
Publication: US US20220052152A1
Power Silicon Carbide Based Semiconductor Devices with Improved Short Circuit Capabilities and Methods of Making Such Devices
Application: 17/004,531 →
Publication: US US20220069138A1
Packaging for Rf Transistor Amplifiers
Application: 17/018,721 →
Publication: US US20220084950A1
Electronic Device Packages with Internal Moisture Barriers
Application: 17/078,456 →
Publication: US US20220130773A1
Vertical Power Transistor Device
Patent: 49,913 →
Application: 17/080,062 →
Packaged Transistor Having Die Attach Materials with Channels and Process of Implementing the Same
Application: 17/085,433 →
Publication: US US20210351121A1
Transistor Packages with Improved Die Attach
Application: 17/085,386 →
Publication: US US20220139852A1
Protection Structures for Semiconductor Devices with Sensor Arrangements
Application: 17/087,740 →
Publication: US US20220140138A1
Passivation Structures for Semiconductor Devices Having Patterned Structures Over Edge Termination Regions
Application: 17/088,686 →
Publication: US US20220140132A1
Power Semiconductor Devices with Improved Overcoat Adhesion and/or Protection
Application: 17/088,647 →
Publication: US US20220139793A1
Gate Trench Power Semiconductor Devices Having Improved Deep Shield Connection Patterns
Application: 17/092,923 →
Publication: US US20220149196A1
Semiconductor Devices Including an Offset Metal to Polysilicon Gate Contact
Application: 17/096,147 →
Publication: US US20220149165A1
Packaged Rf Power Device with Pcb Routing Outside Protective Member
Application: 17/097,294 →
Publication: US US20220157671A1
Methods and Apparatuses Related to Shaping Wafers Fabricated by Ion Implantation
Application: 16/950,414 →
Publication: US US20210066081A1
Power Semiconductor Devices Having Gate Trenches and Buried Edge Terminations and Related Methods
Application: 16/952,757 →
Publication: US US20210098568A1
Methods and Systems for Component Analysis, Sorting, and Sequencing Based on Component Parameters and Devices Utilizing the Methods and Systems
Application: 17/101,888 →
Publication: US US20220165627A1
Finfet Power Semiconductor Devices
Application: 17/108,505 →
Publication: US US20220173227A1
Power Transistor with Soft Recovery Body Diode
Application: 17/110,027 →
Publication: US US20220173237A1
Large Dimension Silicon Carbide Single Crystalline Materials with Reduced Crystallographic Stress
Application: 17/121,863 →
Publication: US US20220189768A1
Group III-Nitride High-Electron Mobility Transistors with Buried P-Type Layers and Process for Making the Same
Application: 17/123,727 →
Publication: US US20210104623A1
Large Diameter Silicon Carbide Wafers
Application: 17/124,810 →
Publication: US US20210198804A1
Process, System, and Device for Determining a Related Product
Application: 17/138,193 →
Publication: US US20220207464A1
Radio Frequency Transistor Amplifiers Having Widened and/or Asymmetric Source/Drain Regions for Improved on-Resistance Performance
Application: 17/144,346 →
Publication: US US20220223700A1
Devices Incorporating Stacked Bonds and Methods of Forming the Same
Application: 17/145,794 →
Publication: US US20220223559A1
Packaged Electronic Devices Having Dielectric Substrates with Thermally Conductive Adhesive Layers
Application: 17/159,925 →
Publication: US US20220238426A1
Group Iii-Nitride High-Electron Mobility Transistors with Gate Connected Buried P-Type Layers and Process for Making the Same
Application: 17/172,669 →
Publication: US US20210167199A1
Gate Trench Power Semiconductor Devices Having Improved Deep Shield Connection Patterns
Application: 17/172,481 →
Publication: US US20220130997A1
Power Semiconductor Device with Reduced Strain
Application: 17/177,641 →
Publication: US US20220262909A1
Wide Bandgap Semiconductor Device with Sensor Element
Application: 17/201,468 →
Publication: US US20210202341A1
Power Component Configured for Improving Partial Discharge Performance and System and Process of Implementing the Same
Application: 17/207,223 →
Publication: US US20220302014A1
Power Transistor with Soft Recovery Body Diode
Application: 17/208,271 →
Publication: US US20220173238A1
Carrier-Assisted Method for Parting Crystalline Material Along Laser Damage Region
Application: 17/225,384 →
Publication: US US20210225652A1
Power Module Having Electrical Interconnections Using Mechanical Fittings and Process of Implementing the Same
Application: 17/228,148 →
Publication: US US20220328990A1
Package with Different Types of Semiconductor Dies Attached to a Flange
Application: 17/228,978 →
Publication: US US20210233877A1
Power Module
Application: 17/239,418 →
Publication: US US20210313256A1
Power Module
Patent: 1,073,632 →
Application: 29/780,368 →
Group Iii-Nitride Transistors with Back Barrier Structures and Buried P-Type Layers and Methods Thereof
Application: 17/322,199 →
Publication: US US20220367697A1
Circuits and Group Iii-Nitride Transistors with Buried P-Layers and Controlled Gate Voltages and Methods Thereof
Application: 17/321,963 →
Publication: US US20220367695A1
Circuits and Group Iii-Nitride High-Electron Mobility Transistors with Buried P-Type Layers Improving Overload Recovery and Process for Implementing the Same
Application: 17/321,992 →
Publication: US US20220367696A1
Field Effect Transistor with Source-Connected Field Plate
Application: 17/325,666 →
Publication: US US20220130965A1
Field Effect Transistor with Selective Modified Access Regions
Application: 17/325,643 →
Publication: US US20220376098A1
Field Effect Transistors with Modified Access Regions
Application: 17/325,635 →
Publication: US US20220376106A1
Field Effect Transistor with Selective Channel Layer Doping
Application: 17/325,610 →
Publication: US US20220376105A1
Multilayer Encapsulation for Humidity Robustness and Related Fabrication Methods
Application: 17/335,796 →
Publication: US US20220384366A1
Device and Process for Fault Detection of a Power Device
Application: 17/341,942 →
Publication: US US20220393460A1
Reduced Optical Absorption for Silicon Carbide Crystalline Materials
Application: 17/350,100 →
Publication: US US20220403552A1
Package for Power Electronics
Application: 17/352,965 →
Publication: US US20210313289A1
Power Semiconductor Die Having a Combination of Active Area and Termination Region Area Being Less Than 90% of Total Die Area
Application: 17/357,103 →
Publication: US US20220416077A1
Superjunction Power Semiconductor Devices Formed via Ion Implantation Channeling Techniques and Related Methods
Application: 17/371,514 →
Publication: US US20210367029A1
Semiconductor Devices Having Asymmetric Integrated Gate Resistors for Balanced Turn-on/Turn-Off Behavior
Application: 17/382,407 →
Publication: US US20230026868A1
Power Semiconductor Devices Including Angled Gate Trenches
Application: 17/383,696 →
Publication: US US20220130998A1
Encapsulation Stack for Improved Humidity Performance and Related Fabrication Methods
Application: 17/390,020 →
Publication: US US20230031205A1
Interconnect Metal Openings Through Dielectric Films
Application: 17/390,316 →
Publication: US US20230029763A1
Arrangements of Power Semiconductor Devices for Improved Thermal Performance
Application: 17/459,497 →
Publication: US US20230060641A1
Semiconductor Device Incorporating a Substrate Recess
Application: 17/477,004 →
Publication: US US20230078017A1
Vertical Power Devices Fabricated Using Implanted Methods
Application: 17/482,019 →
Publication: US US20230087937A1
Contact and Die Attach Metallization for Silicon Carbide Based Devices and Related Methods of Sputtering Eutectic Alloys
Application: 17/494,909 →
Publication: US US20220028821A1
Transistor Semiconductor Die with Increased Active Area
Application: 17/501,244 →
Publication: US US20220037524A1
Transistor Device Structure with Angled Wire Bonds
Application: 17/503,733 →
Publication: US US20230124581A1
Multiple Silicide Process for Separately Forming N-Type and P-Type Ohmic Contacts and Related Devices
Application: 17/505,744 →
Publication: US US20230124215A1
Transistor with Ohmic Contacts
Application: 17/508,846 →
Publication: US US20230130614A1
Compact Power Module
Application: 17/524,690 →
Publication: US US20230142930A1
Packaged Semiconductor Devices, and Package Molds for Forming Packaged Semiconductor Devices
Application: 17/532,027 →
Publication: US US20230162991A1
Edge Termination for Power Semiconductor Devices and Related Fabrication Methods
Application: 17/538,026 →
Publication: US US20230170383A1
Group Iii-Nitride High-Electron Mobility Transistors with a Buried Metallic Conductive Material Layer and Process for Making the Same
Application: 17/552,555 →
Publication: US US20230197841A1
Package for Power Electronics
Application: 17/557,322 →
Publication: US US20220115346A1
Limiting Failures Caused by Dendrite Growth on Semiconductor Chips
Application: 17/567,322 →
Publication: US US20230215833A1
Laser-Assisted Method for Parting Crystalline Material
Application: 17/572,137 →
Publication: US US20220126395A1
Wide Bandgap Unipolar/Bipolar Transistor
Application: 17/589,929 →
Publication: US US20230246073A1
Interface Layer Control Methods for Semiconductor Power Devices and Semiconductor Devices Formed Thereof
Application: 17/590,851 →
Publication: US US20220157962A1
Multilayer Encapsulation for Humidity Robustness and Highly Accelerated Stress Tests and Related Fabrication Methods
Application: 17/591,704 →
Publication: US US20220384290A1
Semiconductor Die Including a Metal Stack
Application: 17/665,191 →
Publication: US US20230253359A1
Power Semiconductor Devices Having Multilayer Gate Dielectric Layers That Include an Etch Stop/Field Control Layer and Methods of Forming Such Devices
Application: 17/668,448 →
Publication: US US20220165862A1
Methods of Forming Semiconductor Power Devices Having Graded Lateral Doping
Application: 17/669,409 →
Publication: US US20220165876A1
Radio Frequency Transistor Amplifiers Having Self-Aligned Double Implanted Source/Drain Regions for Improved on-Resistance Performance and Related Methods
Application: 17/669,479 →
Publication: US US20230261054A1
Semiconductor Packages with Increased Power Handling
Application: 17/670,174 →
Publication: US US20230260861A1
Methods for Dicing Semiconductor Wafers Having a Metallization Layer and Semiconductor Devices Made by the Methods
Application: 17/702,126 →
Publication: US US20220216108A1
Systems and Processes for Increasing Semiconductor Device Reliability
Application: 17/702,868 →
Publication: US US20220216175A1
Support Shield Structures for Trenched Semiconductor Devices
Application: 17/703,708 →
Publication: US US20230307529A1
Power Semiconductor Device with Shallow Conduction Region
Application: 17/705,172 →
Publication: US US20230327026A1
Packaged Electronic Devices Having Transient Liquid Phase Solder Joints and Methods of Forming Same
Application: 17/707,084 →
Publication: US US20230317670A1
Power Semiconductor Devices Including Multiple Gate Bond Pads
Application: 17/712,649 →
Publication: US US20230120729A1
Die Backside Metallization Methods and Apparatus
Application: 17/658,691 →
Publication: US US20230326897A1
Transistor Including a Discontinuous Barrier Layer
Application: 17/733,939 →
Publication: US US20230352424A1
Dynamic Performance of on-Chip Current Sensors
Application: 17/736,720 →
Publication: US US20230361212A1
Dual Inline Power Module
Application: 17/736,487 →
Publication: US US20230363097A1
Group Iii Nitride-Based Monolithic Microwave Integrated Circuits Including Static Random Access Memory Blocks with Associated Addressing and Buffering Circuits
Application: 17/737,431 →
Publication: US US20230361059A1
Vertical Power Devices Having Mesas and Etched Trenches Therebetween
Application: 17/744,604 →
Publication: US US20230369445A1
Power Semiconductor Devices Having Moisture Barriers
Application: 17/747,128 →
Publication: US US20230378010A1
Trench Bottom Shielding Methods and Approaches for Trenched Semiconductor Device Structures
Application: 17/831,599 →
Publication: US US20220293787A1
High Power Transistor with Interior-Fed Fingers
Application: 17/834,421 →
Publication: US US20220302271A1
Field Effect Transistor with Multiple Stepped Field Plate
Application: 17/834,013 →
Publication: US US20220302291A1
Power Package Having Connected Components and Processes Implementing the Same
Application: 17/837,640 →
Publication: US US20230402360A1
Semiconductor Devices Having Asymmetric Integrated Lumped Gate Resistors for Balanced Turn-on/Turn-Off Behavior and/or Multiple Spaced-Apart Lumped Gate Resistors for Improved Power Handling
Application: 17/843,010 →
Publication: US US20230023195A1
Power Module
Application: 17/844,231 →
Publication: US US20230411359A1
Gate Trench Power Semiconductor Devices Having Trench Shielding Patterns Formed During the Well Implant and Related Methods
Application: 17/845,120 →
Publication: US US20230411446A1
Circuits and Methods for Controlling Bidirectional Cllc Converters
Application: 17/788,002 →
Publication: US US20230040992A1
Gate Trench Power Semiconductor Devices Having Improved Breakdown Performance and Methods of Forming Such Devices
Application: 17/847,650 →
Publication: US US20230420527A1
Semiconductor Devices Having on-Chip Gate Resistors
Application: 17/847,410 →
Publication: US US20230420451A1
Semiconductor Device with Selectively Grown Field Oxide Layer in Edge Termination Region
Application: 17/849,190 →
Publication: US US20230420577A1
Top Side Cooled Semiconductor Packages
Application: 17/849,316 →
Publication: US US20230420329A1
Methods of Forming Ohmic Contacts on Semiconductor Devices with Trench/Mesa Structures
Application: 17/848,907 →
Publication: US US20230420536A1
Packages with Backside Mounted Die and Exposed Die Interconnects and Methods of Fabricating the Same
Application: 17/848,538 →
Publication: US US20230421117A1
Methods and Systems for Implementing a Modular Platform Implementing Active Devices
Application: 17/848,526 →
Publication: US US20230422399A1
Methods of Forming Uniformly Doped Deep Implanted Regions in Silicon Carbide and Silicon Carbide Layers Including Uniformly Doped Implanted Regions
Application: 17/849,037 →
Publication: US US20230420575A1
Semiconductor Device Packages with Exposed Heat Dissipating Surfaces and Methods of Fabricating the Same
Application: 17/849,206 →
Publication: US US20230421119A1
Optimization of Power Module Performance via Parasitic Mutual Coupling
Application: 17/849,676 →
Publication: US US20230421145A1
Gallium Nitride High-Electron Mobility Transistors with P-Type Layers and Process for Making the Same
Application: 17/859,425 →
Publication: US US20220344500A1
High Power Multilayer Module Having Low Inductance and Fast Switching for Paralleling Power Devices
Application: 17/859,449 →
Publication: US US20220354014A1
Multi-Cavity Package Having Single Metal Flange
Application: 17/867,801 →
Publication: US US20220352141A1
Electronic Devices with Reduced Ohmic to Ohmic Dimensions
Application: 17/893,277 →
Publication: US US20240072125A1
Semiconductor Package
Patent: 1,056,862 →
Application: 29/866,001 →
Transistor Die Including Matching Circuit
Application: 17/900,652 →
Publication: US US20240072732A1
Vertical Semiconductor Device with Improved Ruggedness
Application: 17/929,858 →
Publication: US US20220416075A1
Device and Process for Implementing Silicon Carbide (Sic) Surface Mount Devices
Application: 17/951,523 →
Publication: US US20240105390A1
Transistor Package and Process of Implementing the Transistor Package
Application: 17/951,527 →
Publication: US US20240105570A1
Barrier Structure for Dispersion Reduction in Transistor Devices
Application: 17/951,708 →
Publication: US US20240105823A1
Barrier Structure for Sub-100 Nanometer Gate Length Devices
Application: 17/951,711 →
Publication: US US20240105824A1
High Reliability Semiconductor Devices and Methods of Fabricating the Same
Application: 17/935,509 →
Publication: US US20230019230A1
Power Module
Patent: 1,036,395 →
Application: 29/855,192 →
Silicon Carbide Device with Single Metallization Process for Ohmic and Schottky Contacts
Application: 17/957,737 →
Publication: US US20240113235A1
Implanted Regions for Semiconductor Structures with Deep Buried Layers
Application: 17/961,032 →
Publication: US US20240120202A1
Methods of Forming Semiconductor Structures and Resulting Semiconductor Structures
Application: 17/966,081 →
Publication: US US20240128336A1
Semiconductor Devices with Additional Mesa Structures for Reduced Surface Roughness
Application: 17/977,003 →
Publication: US US20240145537A1
Radio Frequency Power Amplifier Implementing an Off Mode Output Impedance Control and a Process of Implementing the Same
Application: 18/061,246 →
Publication: US US20240186960A1
Core-Shell Particle Die-Attach Material
Application: 18/074,079 →
Publication: US US20240182757A1
Multiple Transport Level Tester System
Application: 18/077,869 →
Publication: US US20240192261A1
Transistor Devices Including Self-Aligned Ohmic Contacts and Contact Regions and Related Fabrication Methods
Application: 18/063,787 →
Publication: US US20240194751A1
Power Electronics Package Layouts, Structures, and/or Configurations for One or More Power Devices and Processes Implementing the Same
Application: 18/145,502 →
Publication: US US20240213124A1
Gate Trench Power Semiconductor Devices Having Self-Aligned Trench Shielding Regions and Related Methods
Application: 18/093,343 →
Publication: US US20240234495A1
Buried Shield Structures for Power Semiconductor Devices and Related Fabrication Methods
Application: 18/150,432 →
Publication: US US20240234507A1
Device Design for Short-Circuit Protection of Transistors
Application: 18/093,838 →
Publication: US US20230152830A1
Semiconductor Device and Related Fabrication Method
Application: 18/152,130 →
Publication: US US20240234370A1
Thermal Enhanced Power Semiconductor Package
Application: 18/154,353 →
Publication: US US20240243031A1
Power Module Having an Elevated Power Plane with an Integrated Signal Board and Process of Implementing the Same
Application: 18/156,484 →
Publication: US US20230163062A1
Power Semiconductor Devices Including Multiple Layer Metallization
Application: 18/160,765 →
Publication: US US20240213196A1
Semiconductor Device Packages Including Multilayer Stacks with Improved Adhesion
Application: 18/161,144 →
Publication: US US20240258217A1
Integrated Power Module
Application: 18/161,983 →
Publication: US US20230170306A1
Edge Termination Structures for Semiconductor Devices
Application: 18/163,824 →
Publication: US US20230178650A1
Flip-Chip Field Effect Transistor Layouts and Structures
Application: 18/105,586 →
Publication: US US20240266348A1
Semiconductor Device Having Semiconductor Structure with Polarity Inverting Layer
Application: 18/164,205 →
Publication: US US20240266419A1
Semiconductor Structure for Improved Radio Frequency Thermal Management
Application: 18/164,249 →
Publication: US US20240266426A1
Power Semiconductor Devices Having Non-Rectangular Semiconductor Die for Enhanced Mechanical Robustness and Reduced Stress and Electric Field Concentrations
Application: 18/107,537 →
Publication: US US20240274660A1
Hourglass-Shaped Vias for Group Iii-Nitride Semiconductor Devices
Application: 18/168,985 →
Publication: US US20240274507A1
Gate Trench Power Semiconductor Devices Having Improved Deep Shield Connection Patterns
Application: 18/109,933 →
Publication: US US20230207686A1
Electroless Die-Attach Process for Semiconductor Packaging
Application: 18/169,492 →
Publication: US US20240274514A1
Metal Nitride Core-Shell Particle Die-Attach Material
Application: 18/169,518 →
Publication: US US20240282741A1
Nitrogen-Polar Group III-Nitride Semiconductor Device with Isolation Implant Regions
Application: 18/173,534 →
Publication: US US20240290876A1
Electric Field Modification for Nitrogen-Polar Group III-Nitride Semiconductor Devices
Application: 18/175,231 →
Publication: US US20240290847A1
Field Reducing Structures for Nitrogen-Polar Group III-Nitride Semiconductor Devices
Application: 18/179,070 →
Publication: US US20240304702A1
Power Semiconductor Package
Application: 18/179,036 →
Publication: US US20240304507A1
Metal Stack with Phonon Scattering Layer That Forms a Non-Ohmic Contact to a Semiconductor Layer
Application: 18/121,782 →
Publication: US US20240313099A1
High-Performance Stress Buffer Die-Coat and Devices and Processes Implementing the Same
Application: 18/187,924 →
Publication: US US20240321663A1
Die-Coat Material Configured to Enhance Device Reliability and Devices and Processes Implementing the Same
Application: 18/187,804 →
Publication: US US20240321659A1
Semiconductor Devices with Integrated Test Structures
Application: 18/125,610 →
Publication: US US20240321651A1
Semiconductor Devices with Integrated Test Areas
Application: 18/125,655 →
Publication: US US20240321647A1
Power Semiconductor Devices Including a Trenched Gate and Methods of Forming Such Devices
Application: 18/125,779 →
Publication: US US20230231047A1
Power Module Having Pin Fins
Patent: 1,041,429 →
Application: 29/873,303 →
Silicon Carbide Thermal Bridge Integrated on a Low Thermal Conductivity Substrate and Processes Implementing the Same
Application: 18/296,461 →
Publication: US US20240341026A1
Silicon Carbide Wafers with Relaxed Positive Bow and Related Methods
Application: 18/297,144 →
Publication: US US20230241803A1
Semiconductor Power Devices Having Multiple Gate Trenches and Methods of Forming Such Devices
Application: 18/302,843 →
Publication: US US20230261073A1
Semiconductor Devices Having Gate Resistors with Low Variation in Resistance Values
Application: 18/136,911 →
Publication: US US20230268407A1
Heteroepitaxial Semiconductor Devices with Enhanced Thermal Dissipation
Application: 18/137,797 →
Publication: US US20240355918A1
Power Semiconductor Devices Including Beryllium Metallization
Application: 18/304,869 →
Publication: US US20240355738A1
Signal Loop Busbars and Semiconductor Power Modules Including the Same and Processes of Implementing the Same
Application: 18/305,976 →
Publication: US US20240356322A1
Semiconductor Devices with Low Barrier Height Schottky Contacts
Application: 18/138,240 →
Publication: US US20240355897A1
Power Package
Patent: 1,121,577 →
Application: 29/875,226 →
Method for Reducing Parasitic Capacitance and Increasing Peak Transconductance While Maintaining on-State Resistance and Related Devices
Application: 18/310,684 →
Publication: US US20230395695A1
Power Module
Patent: 1,134,247 →
Application: 29/875,793 →
Mosfets with Implanted Charge Compensation Regions
Application: 63/466,479 →
Semi-Insulating Gan and Method of Making the Same
Patent: 7,170,095 →
Application: 10/618,024 →
Publication: US US20050009310A1
Low 1C Screw Dislocation 3 Inch Silicon Carbide Wafer
Patent: 7,314,520 →
Application: 10/957,806 →
Publication: US US20060073707A1
Low Micropipe 100 Mm Silicon Carbide Wafer
Patent: 7,314,521 →
Application: 10/957,807 →
Publication: US US20070209577A1
Optically Triggered Wide Bandgap Bipolar Power Switching Devices and Circuits
Patent: 7,679,223 →
Application: 11/412,338 →
Publication: US US20060261876A1
Method of Manufacturing an Adaptive Algan Buffer Layer
Patent: 7,485,512 →
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Publication: US US20060281238A1
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Laser-Assisted Method for Parting Crystalline Material
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High Power Multilayer Module Having Low Inductance and Fast Switching for Paralleling Power Devices
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Structures for Reducing Electron Concentration and Process for Reducing Electron Concentration
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Laser-Assisted Method for Parting Crystalline Material
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Package for Power Electronics
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Device Design for Short-Circuitry Protection Circuitry Within Transistors
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Composite-Channel High Electron Mobility Transistor
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Depletion Mode Semiconductor Devices Including Current Dependent Resistance
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Overcurrent Protection for Power Transistors
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Contact and Die Attach Metallization for Silicon Carbide Based Devices and Related Methods of Sputtering Eutectic Alloys
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Multi-Cavity Package Having Single Metal Flange
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High Power Transistor with Interior-Fed Gate Fingers
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Systems and Processes for Increasing Semiconductor Device Reliability
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Stepped Field Plates with Proximity to Conduction Channel and Related Fabrication Methods
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High Power Multilayer Module Having Low Inductance and Fast Switching for Paralleling Power Devices
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Power Module Having Pin Fins
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Passivation Structure for Semiconductor Devices
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Semiconductors with Improved Thermal Budget and Process of Making Semiconductors with Improved Thermal Budget
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Stabilized, High-Doped Silicon Carbide
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Dislocation Distribution for Silicon Carbide Crystalline Materials
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Silicon Carbide Wafers with Relaxed Positive Bow and Related Methods
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Laser-Assisted Method for Parting Crystalline Material
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Vertical Semiconductor Device with Improved Ruggedness
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Alignment for Wafer Images
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System and Process for Implementing Accelerated Test Conditions for High Voltage Lifetime Evaluation of Semiconductor Power Devices
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Power Switching Devices with High Dv/Dt Capability and Methods of Making Such Devices
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Power Semiconductor Package
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Interface Layer Control Methods for Semiconductor Power Devices and Semiconductor Devices Formed Thereof
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Trenched Power Device with Segmented Trench and Shielding
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Integrated Circuit Having Die Attach Materials with Channels and Process of Implementing the Same
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Contact Structures for Semiconductor Devices
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Semiconductor Power Devices Having Graded Lateral Doping in the Source Region
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Power Semiconductor Devices Having Multilayer Gate Dielectric Layers That Include an Etch Stop/Field Control Layer and Methods of Forming Such Devices
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High Voltage Power Module
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Vertical Semiconductor Device with Improved Ruggedness
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Trench Bottom Shielding Methods and Approaches for Trenched Semiconductor Device Structures
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Edge Termination Structures for Semiconductor Devices
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Power Module Having an Elevated Power Plane with an Integrated Signal Board and Process of Implementing the Same
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Power Semiconductor Devices Including a Trenched Gate and Methods of Forming Such Devices
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Field Effect Transistor with at Least Partially Recessed Field Plate
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Gate Trench Power Semiconductor Devices Having Improved Deep Shield Connection Patterns
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Semiconductor Die with Improved Ruggedness
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Power Module
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Silicon Carbide Wafers with Relaxed Positive Bow and Related Methods
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Power Semiconductor Package
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Related Assignments (25)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest Mar 20, 2014
From: PALA, VIPINDAS; VAN BRUNT, EDWARD ROBERT; CHENG, LIN
To: CREE, INC.
Reel/Frame 032484/0824 →
Assignment of Assignor's Interest Dec 5, 2019
From: LEE, KYOUNG-KEUN
To: CREE, INC.
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Assignment of Assignor's Interest Dec 6, 2019
From: MARTIN, DANIEL JOHN; CURBOW, WILLIAM AUSTIN
To: CREE FAYETTEVILLE, INC.
Reel/Frame 051205/0172 →
Assignment of Assignor's Interest May 11, 2020
From: STEINMANN, PHILIPP; VAN BRUNT, EDWARD ROBERT; RYU, SEI-HYUNG; PARK, JAE-HYUNG
To: CREE, INC.
Reel/Frame 052626/0452 →
Assignment of Assignor's Interest May 18, 2020
From: HARDIMAN, CHRIS; RADULESCU, FABIAN; SHEPPARD, SCOTT; NAMISHIA, DAN
To: CREE, INC.
Reel/Frame 052689/0481 →
Assignment of Assignor's Interest Jun 2, 2020
From: MCPHERSON, BRICE; MARTIN, DANIEL; LOSTETTER, ALEXANDER
To: CREE FAYETTEVILLE, INC.
Reel/Frame 052813/0193 →
Assignment of Assignor's Interest Jun 3, 2020
From: MOXEY, GUY; SAXENA, KULDEEP
To: CREE, INC.
Reel/Frame 052821/0101 →
Assignment of Assignor's Interest Jun 19, 2020
From: LICHTENWALNER, DANIEL JENNER; ISLAM, NAEEM
To: CREE, INC.
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Assignment of Assignor's Interest Jun 29, 2020
From: LEONARD, ROBERT TYLER; CONRAD, MATTHEW DAVID; VAN BRUNT, EDWARD ROBERT
To: CREE, INC.
Reel/Frame 053071/0434 →
Assignment of Assignor's Interest Jul 24, 2020
From: MCPHERSON, BRICE
To: CREE FAYETTEVILLE, INC.
Reel/Frame 053304/0690 →
Assignment of Assignor's Interest Aug 14, 2020
From: LICHTENWALNER, DANIEL J.; ISLMAN, NAEEM; KIM, WOONGSUN; RYU, SEI-HYUNG
To: CREE, INC.
Reel/Frame 053498/0370 →
Assignment of Assignor's Interest Aug 27, 2020
From: HAN, KIJEONG; KIM, JOOHYUNG; RYU, SEI-HYUNG
To: CREE, INC.
Reel/Frame 053616/0417 →
Assignment of Assignor's Interest Sep 22, 2020
From: KOVALEVSKII, DMITRI; ADAMSON, TYLER
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Reel/Frame 053844/0749 →
Assignment of Assignor's Interest Oct 13, 2020
From: LICHTENWALNER, DANIEL JENNER; KIM, WOONGSUN
To: CREE, INC.
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Assignment of Assignor's Interest Feb 9, 2021
From: LICHTENWALNER, DANIEL JENNER; VAN BRUNT, EDWARD ROBERT
To: CREE, INC.
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Merger Aug 13, 2021
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Confirmatory License Feb 2, 2023
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To: U.S. DEPARTMENT OF ENERGY
Reel/Frame 062570/0755 →
Assignment of Assignor's Interest Apr 25, 2023
From: DONOFRIO, MATTHEW; EDMOND, JOHN; GOLAKIA, HARSHAD
To: CREE, INC.
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Security Interest Jun 30, 2023
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Notice of Grant of Security Interest in Intellectual Property Sep 30, 2025
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Notice of Grant of Security Interest in Intellectual Property Sep 30, 2025
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