Junction barrier Schottky diodes with current surge capability
View Patent ↗An electronic device includes a silicon carbide drift region having a first conductivity type, a Schottky contact on the drift region, and a plurality of junction barrier Schottky (JBS) regions at a surface of the drift region adjacent the Schottky contact. The JBS regions have a second conductivity type opposite the first conductivity type and have a first spacing between adjacent ones of the JBS regions. The device further includes a plurality of surge protection subregions having the second conductivity type. Each of the surge protection subregions has a second spacing between adjacent ones of the surge protection subregions that is less than the first spacing.
1. A Schottky diode, comprising:
a silicon carbide drift region having a first conductivity type;
a Schottky contact on the drift region;
a plurality of junction barrier Schottky (JBS) regions at a surface of the drift region adjacent the Schottky contact, the plurality of JBS regions having a second conductivity type opposite the first conductivity type and having a first width and a first spacing between adjacent ones of the JBS regions; and
a surge protection region at the surface of the drift region adjacent the Schottky contact, the surge protection region having a second width greater than the first width and comprising a plurality of surge protection subregions having the second conductivity type and each of the surge protection subregions having a third width less than the first width and having a second spacing between adjacent ones of the surge protection subregions that is less than the first spacing between adjacent ones of the JBS regions.
2. The Schottky diode of claim 1 , wherein the first spacing is about 4 μm to about 6 μm and wherein the second spacing is about 1 μm to about 3 μm.
3. The Schottky diode of claim 1 , wherein the first width is about 1 μm to about 0.3 μm and wherein the third width is about 1 μm to about 3 μm.
4. The Schottky diode of claim 1 , wherein the surge protection subregions extend into the drift layer from the surface of the drift layer by a depth of about 0.3 μm to about 0.5 μm.
5. The Schottky diode of claim 1 , wherein a doping level of the drift region is about 5×10 14 cm −3 to about 1×10 16 cm −3 .
6. The Schottky diode of claim 5 , wherein the first spacing, the second spacing and the third width are configured such that a voltage drop from a surface of the drift layer to a center of a junction between one of the surge protection subregions and the drift region is sufficient to cause the junction to become forward biased at a forward current that is higher than a rated current of the Schottky diode so as to provide a current surge handling ability in the Schottky diode.
7. The Schottky diode of claim 1 , wherein an interface between the Schottky contact and the surge protection subregions is an ohmic contact.
8. The Schottky diode of claim 1 , wherein the drift layer comprises 4H—SiC, wherein the drift layer has a doping level of about 5×10 15 cm −3 to 1×10 16 cm −3 , and wherein the current surge protection subregions have a doping level greater than 5×10 18 cm −3 .
9. The Schottky diode of claim 1 , wherein a portion of the drift region beneath the surge protection region has a higher electric potential than a portion of the drift region beneath the JBS regions in response to a forward voltage applied to the Schottky contact.
10. The Schottky diode of claim 1 , further comprising a plurality of current surge protection regions in the drift layer adjacent the Schottky contact.
11. The Schottky diode of claim 1 , wherein the first conductivity type comprises n-type and the second conductivity type comprises p-type.
12. The Schottky diode of claim 1 , wherein the surge protection subregions comprise a plurality of trenches in the drift region and a plurality of doped regions in the drift layer extending beneath respective ones of the plurality of trenches.
13. The Schottky diode of claim 12 , wherein the surge protection subregions define vertical current paths in the drift region between respective ones of the surge protection subregions, wherein a depth of the surge protection regions is defined by a depth of the trenches and a depth of the doped regions.
14. A method of forming a Schottky diode, comprising:
providing a plurality of junction barrier Schottky (JBS) regions at a surface of a silicon carbide drift region having a first conductivity type, the plurality of JBS regions having a second conductivity type opposite the first conductivity type and having a first spacing between adjacent ones of the JBS regions;
providing a surge protection region at the surface of the drift region, the surge protection region comprising a plurality of adjacent surge protection subregions that are spaced apart laterally from the JBS regions and that have the second conductivity type, and each of the surge protection subregions having a second spacing between adjacent ones of the surge protection subregions that is less than the first spacing between adjacent ones of the JBS regions, wherein the surge protection region has a width that is greater than the first spacing; and
providing a Schottky contact on the drift region and in contact with the plurality of JBS regions and the plurality of surge protection regions.
15. The method of claim 14 , wherein the first spacing is about 4 μm to about 6 μm and wherein the second spacing is about 1 μm to about 3 μm.
16. The method of claim 14 , wherein forming the plurality of JBS regions and forming the surge protection region comprises:
selectively implanting dopant ions of the second conductivity into the drift layer; and
annealing the implanted ions at a temperature greater than 1700° C.
17. The method of claim 16 , further comprising forming a graphite coating on the drift layer including the implanted ions, wherein annealing the implanted ions comprises annealing the graphite coating.
18. The method of claim 16 , further comprising etching a plurality of trenches in the drift layer before implanting the ions, wherein implanting the ions comprises implanting the ions into the plurality of trenches.
19. The method of claim 16 , wherein forming the Schottky contact on the drift region comprises forming the Schottky contact to the drift region and an ohmic contact to the surge protection subregions using a single metal.
20. A Schottky diode, comprising:
a silicon carbide drift region having a first conductivity type;
a Schottky contact on the drift region;
a plurality of junction barrier Schottky (JBS) regions at a surface of the drift region adjacent to and in contact with the Schottky contact, the plurality of JBS regions being spaced apart laterally from the JBS regions and having a second conductivity type opposite the first conductivity type and having a first spacing between adjacent ones of the JBS regions; and
a surge protection region including a plurality of surge protection subregions at the surface of the drift region adjacent to and in contact with the Schottky contact, the plurality of surge protection subregions having the second conductivity type and each of the surge protection subregions having a second spacing between adjacent ones of the surge protection subregions that is less than the first spacing, wherein the surge protection region has a width that is greater than the first spacing.