Epitaxial semiconductor structures having reduced stacking fault nucleation sites
View Patent ↗Epitaxial silicon carbide layers are fabricated by forming features in a surface of a silicon carbide substrate having an off-axis orientation toward a crystallographic direction. The features include at least one sidewall that is orientated nonparallel (i.e., oblique or perpendicular) to the crystallographic direction. The epitaxial silicon carbide layer is then grown on the surface of the silicon carbide substrate that includes features therein.
1. A silicon carbide semiconductor structure comprising:
a silicon carbide substrate having an off-axis orientation toward a crystallographic direction and including a plurality of features in a surface thereof, the plurality of features including at least one sidewall that is oriented nonparallel to the crystallographic direction; and
an epitaxial silicon carbide layer on the surface of the silicon carbide substrate that includes the plurality of features therein, the epitaxial silicon carbide layer being thicker than a depth of the at least one sidewall.
2. A structure according to claim 1 wherein the crystallographic direction is a <11 2 0> direction.
3. A structure according to claim 1 wherein the plurality of features comprises a plurality of trenches extending oblique and/or perpendicular to the crystallographic direction and including sidewalls that are oriented nonparallel to the crystallographic direction.
4. A structure according to claim 1 wherein the plurality of features comprises a plurality of depressions including at least one sidewall that is oriented nonparallel to the crystallographic direction.
5. A structure according to claim 4 wherein the plurality of depressions comprises a periodically repeating pattern of hexagonal pits.
6. A structure according to claim 1 wherein the epitaxial silicon carbide layer contains lower basal plane dislocation density than the silicon carbide substrate.
7. A structure according to claim 1 further comprising:
a semiconductor device in the epitaxial silicon carbide layer.
8. A semiconductor structure comprising:
a monocrystalline substrate having an off-axis orientation toward a crystallographic direction and including a plurality of features in a surface thereof, the plurality of features including at least one sidewall that is oriented nonparallel to the crystallographic direction; and
an epitaxial layer on the surface of the monocrystalline substrate that includes the plurality of features therein, the epitaxial layer being thicker than a depth of the at least one sidewall.
9. A structure according to claim 8 wherein the epitaxial layer contains lower basal plane dislocation density than the monocrystalline substrate.
10. A structure according to claim 8 wherein the monocrystalline substrate comprises silicon carbide.
11. A structure according to claim 8 wherein the plurality of features comprises a plurality of depressions including at least one sidewall that is oriented nonparallel to the crystallographic direction.
12. A structure according to claim 11 wherein the plurality of depressions comprises a periodically repeating pattern of hexagonal pits.
13. A structure according to claim 8 further comprising:
a semiconductor device in the epitaxial layer.