Low voltage diode with reduced parasitic resistance and method for fabricating
View Patent ↗A method of making a diode begins by depositing an Al x Ga 1-x N nucleation layer on a SiC substrate, then depositing an n+ GaN buffer layer, an n− GaN layer, an Al x Ga 1-x N barrier layer, and an SiO 2 dielectric layer. A portion of the dielectric layer is removed and a Schottky metal deposited in the void. The dielectric layer is affixed to the support layer with a metal bonding layer using an Au—Sn utectic wafer bonding process, the substrate is removed using reactive ion etching to expose the n+ layer, selected portions of the n+, n−, and barrier layers are removed to form a mesa diode structure on the dielectric layer over the Schottky metal; and an ohmic contact is deposited on the n+ layer.
1. A diode, comprising:
a GaN substrate, the thickness of which is reduced to reduce parasitic resistance;
an n+ semiconducting buffer layer on the substrate;
an n− semiconducting layer on the n+ layer;
a semiconducting barrier layer on the n− layer;
a Schottky metal layer on the barrier layer; and
an ohmic contact on said GaN substrate.
2. The diode of claim 1 , wherein the n+ layer, the n− layer, and the barrier layer comprise Group III nitrides.
3. The diode of claim 1 , wherein the Schottky metal is selected from the group consisting of Cr, Fe, Mn, Nb, Ni, NiCr, Sn, Ta, Ti, Ge, and W.
4. A diode, comprising:
a GaN substrate, the thickness of which is reduced to reduce parasitic resistance;
an n+ semiconducting buffer layer of GaN, between 0.5 and 5 μm thick and doped with an impurity concentration of between 5×10 17 /cm 3 and 5×10 19 /cm 3 , on the substrate;
an n− semiconducting layer of GaN, between 0.5 and 5 μm thick and doped with an impurity concentration of between 1×10 15 /cm 3 and 1×10 17 /cm 3 , on the n+ layer;
a 0-20 Å thick semiconducting barrier layer of Al x Ga 1-x N, with 0.15≦x≦0.45, on the n− layer;
a Schottky metal layer on the barrier layer; and
an ohmic contact on said GaN substrate.
5. A diode, comprising:
a Schottky metal layer on a support layer;
a semiconducting barrier layer on the Schottky layer opposite said support layer;
a pair of oppositely doped semiconducting layers on said Schottky layer; and
a contact on the pair of semiconducting layers, said diode operating with a V f of approximately 0.2V or less.
6. The diode of claim 5 , operating with a V f of approximately 0.15V.
7. The diode of claim 5 , operating with a current density of greater than 100 A/cm 2 .
8. The diode of claim 5 , wherein said pair of oppositely doped semiconducting layers comprise an n− semiconducting layer on the barrier layer opposite the Schottky layer, and an n+ semiconducting buffer layer on the n− layer opposite the barrier layer.
9. The diode of claim 8 , wherein said contact is on said n+ layer opposite said n− layer.
10. The diode of claim 8 , further comprising a conductive support layer.
11. The diode of claim 5 , wherein the conductive support layer comprises a metallized layer.
12. The diode of claim 5 , wherein the conductive support layer is metallized Si.