IP Library Granted Patent US 8,618,553
Granted Patent B2
US 8,618,553 · App. 12/871,095 · Granted Dec 31, 2013

Process for producing silicon carbide crystals having increased minority carrier lifetimes

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Quick Facts
Patent No.
US 8,618,553
App. No.
12/871,095
Granted
Dec 31, 2013
Kind
B2
Abstract

A process is described for producing silicon carbide crystals having increased minority carrier lifetimes. The process includes the steps of heating and slowly cooling a silicon carbide crystal having a first concentration of minority carrier recombination centers such that the resultant concentration of minority carrier recombination centers is lower than the first concentration.

Claims (17)

1. A silicon carbide single crystal wafer having a minority carrier lifetime of at least 20 microseconds.

2. The silicon carbide single crystal wafer of claim 1 further comprising an epitaxial layer.

3. The silicon carbide single crystal of claim 1 , wherein said wafer has a minority carrier lifetime of at least about 30 microseconds.

4. The silicon carbide single crystal wafer of claim 3 further comprising an epitaxial layer.

5. A semiconductor device comprising:

a silicon carbide single crystal substrate having a minority carrier lifetime of at least 20 microseconds; and

at least one epitaxial layer.

6. The semiconductor device of claim 5 wherein said device is a power device.

7. The semiconductor device of claim 6 wherein said device is selected from the group consisting of a pn diode, a PiN diode, a thyristor and an IGBT.

8. The semiconductor device of claim 5 , wherein said substrate has a minority carrier lifetime of at least about 30 microseconds.

9. The semiconductor device of claim 8 wherein said device is a power device.

10. The semiconductor device of claim 9 wherein said device is selected from the group consisting of a pn diode, a PiN diode, a thyristor and an IGBT.

11. A diode comprising:

a p type layer;

an n type layer; and

a silicon carbide intrinsic layer sandwiched in between the p type layer and the n type layer wherein the minority carrier lifetime of the intrinsic layer is at least 20 microseconds.

12. The silicon carbide single crystal of claim 11 , wherein said intrinsic layer has a minority carrier lifetime of at least about 30 microseconds.

Assignments (2)
RELEASE OF SECURITY INTEREST IN INTELLECTUAL PROPERTY COLLATERAL AT REEL/FRAME NO. 64185/0755 Recorded Sep 30, 2025
From: U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS COLLATERAL AGENT
To: WOLFSPEED, INC.
Reel/Frame 072989/0001 →
SECURITY INTEREST Recorded Jun 30, 2023
From: WOLFSPEED, INC.
To: U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION
Reel/Frame 064185/0755 →