Electron gun with magnetic immersion double condenser lenses
An electron gun comprises an electron emitter, an electrode surrounding the electron emitter, an extraction electrode, and a double condenser lens assembly, the double condenser lens assembly comprising a magnetic immersion pre-condenser lens and a condenser lens. In combination with a probe forming objective lens, the electron gun apparatus can provide an electron beam of independently adjustable probe size and probe current, as is desirable in electron beam applications. The electron emitter is immersed in the magnetic field generated by a magnetic type pre-condenser lens. When activated, the pre-condenser lens collimates the beam effectively to increase its angular intensity while at the same time enlarging the virtual source as compared with non-immersion case, due to geometric magnification and aberrations of its lens action. The pre-condenser lens is followed by a condenser lens. If the condenser lens is of the magnetic type, its peak magnetic field is far enough away and thus its action does not significantly affect the size of the virtual source. Independent adjustment of the lenses, combined with suitable selection of final probe forming objective aperture size, allows various combination of the final probe size and probe current to be obtained in a range sufficient for most electron beam applications.
1. An apparatus comprising:
an electron emitter surrounded by an electrode;
an extraction electrode; and
a double lens assembly comprising,
a magnetic immersion type pre-condenser lens configured to generate a magnetic field and immerse the emitter in a strong part of the magnetic field, and
a magnetic non-immersion condenser lens following the pre-condenser lens.
2. The apparatus of claim 1 further comprising a post-extraction accelerator.
3. The apparatus of claim 1 further comprising a probe forming objective lens.
4. The apparatus of claim 1 wherein the pre-condenser lens is configured to collimate the electron beam to increase an angular intensity while enlarging a virtual source size.
5. The apparatus of claim 1 wherein the condenser lens is positioned far enough from the emitter so that its action does not significantly affect a virtual source.
6. The apparatus of claim 1 wherein the condenser lens is positioned far enough from the emitter so that a magnetic field at an apex of the emitter contributed by the condenser lens will be about 0.0035 Tesla or less.
7. The apparatus of claim 1 wherein the pre-condenser lens and the condenser lens are configured so that through suitable combination of their lens strength, along with a selection of probe forming objective aperture size, various combinations of a final probe size and a probe current can be produced in combination with a probe forming objective lens.
8. The apparatus of claim 1 wherein the electrode comprises a suppressor electrode and the electron emitter comprises a Schottky emitter surrounded by the suppressor electrode.
9. The apparatus of claim 1 wherein the electrode comprises a suppressor electrode and the electron emitter comprises a thermal field emitter surrounded by the suppressor electrode.
10. The apparatus of claim 1 wherein the electrode comprises a shielding electrode and the electron emitter comprises a cold field emitter surrounded by the shielding electrode.
11. The apparatus of claim 1 wherein magnetic circuits of the pre-condenser lens and the condenser lens are bundled together and share a common lens element.
12. A method of generating an electron beam probe, the method comprising:
providing an electron emitter;
providing an electrode surrounding the emitter;
providing an extraction electrode;
providing a double lens assembly comprising a magnetic immersion type pre-condenser lens followed by a magnetic condenser lens;
causing the pre-condenser lens to generate a magnetic field and immerse the emitter in a strong part of the magnetic field;
causing the condenser lens to condense the electron beam;
providing a final probe forming objective lens; and
causing the condensed electron beam to be focused into a final electron beam probe by the probe forming objective lens.
13. The method of claim 12 wherein the pre-condenser lens is configured to collimate the electron beam to increase an angular intensity while enlarging a virtual source size.
14. The method of claim 12 wherein the condenser lens is positioned far enough from the emitter so that action of the condenser lens does not significantly affect a virtual source.
15. The method of claim 12 wherein the condenser lens is positioned far enough from the emitter so that a magnetic field at an apex of the emitter contributed by the condenser lens will be about 0.0035 Tesla or less.
16. The method of claim 12 comprising adjusting the pre-condenser lens, the condenser lens, the final probe forming objective lens, and selecting a final probe forming objective aperture producing various combinations of a final probe size and a probe current.