IP Library Granted Patent US 7,494,750
Granted Patent B2
US 7,494,750 · App. 11/478,887 · Granted Feb 24, 2009

Reticles

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Quick Facts
Patent No.
US 7,494,750
App. No.
11/478,887
Granted
Feb 24, 2009
Kind
B2
Abstract

The invention includes reticles and methods of forming reticles. In one aspect, a reticle can include a quartz-containing substrate, an attenuating layer, and an antireflective structure between the attenuating layer and the quartz-containing substrate. The invention can also include a reticle having a relatively transparent region between first and second surfaces, a relatively opaque region proximate the first surface, and a layer comprising one or both of metal fluoride and hafnium oxide proximate the first or second surface. The invention can also include methods of forming reticles in which an antireflective structure is formed over a surface of a quartz-containing substrate. The antireflective structure can comprise a Fabry-Perot pair, and in some aspects can comprise a layer containing one or both of metal fluoride and hafnium oxide.

Claims (37)

1. A reticle, comprising:

a base;

an attenuating layer supported by the base; and

an antireflective structure between the attenuating layer and the base.

2. The reticle of claim 1 wherein the antireflective structure is a first antireflective structure and further comprising a second antireflective structure on an opposing side of the base from the first antireflective structure.

3. The reticle of claim 2 wherein the second antireflective structure comprises a layer comprising one or more of metal fluoride, niobium oxide and hafnium oxide.

4. The reticle of claim 1 wherein the antireflective structure is a Fabry-Perot pair of a first layer and a second layer.

5. The reticle of claim 4 wherein the attenuating layer comprises Mo w Si x O y N z , where w, x, y and z are numbers greater than 0.

6. The reticle of claim 4 wherein the attenuating layer comprises tantalum.

7. The reticle of claim 4 wherein the first layer comprises chromium.

8. The reticle of claim 4 wherein the first layer comprises chromium and the second layer comprises one or both of silicon dioxide and fused silica.

9. The reticle of claim 1 wherein the base comprises quartz, and having openings extending through the antireflective structure and attenuating layer to the quartz of the base.

10. A reticle, comprising:

a quartz-containing region;

a chromium-containing region under the quartz-containing region;

a first antireflective structure between the quartz-containing region and the chromium-containing region, the first antireflective structure comprising Fabry-Perot paired layers;

a pattern of openings extending through the chromium-containing region and through the first antireflective structure; and

a second antireflective structure over the quartz-containing region; the second antireflective structure comprising a layer containing one or more of metal fluoride, niobium oxide and hafnium oxide, and comprising another layer containing one or both of silicon dioxide and fused silica.

11. A reticle, comprising:

a first layer comprising one or more of metal fluoride, niobium oxide and hafnium oxide;

a quartz base over the first layer;

a first antireflective structure over the quartz base, the first antireflective structure comprising a relatively low refractive index second layer paired with a relatively high refractive index third layer, the relatively high refractive index third layer being directly against the quartz base;

a chromium-containing material over the first antireflective structure; and

a pattern of openings extending through the chromium-containing material and through the first antireflective structure.

12. A reticle, comprising:

a relatively opaque material;

a first Fabry-Perot pair over the relatively opaque material; the first Fabry-Perot pair comprising a first layer and a second layer that is compositionally different from the first layer; the first layer being between the second layer and the relatively opaque material;

a relatively transparent material over the first Fabry-Perot pair, and directly against the second layer;

a second Fabry-Perot pair over the relatively transparent material; the second Fabry-Perot pair comprising a relatively high refractive index material directly against the relatively transparent material, and comprising a relatively low refractive index material directly against the relatively high refractive index material; and

a pattern of openings extending through the relatively opaque material and through the first Fabry-Perot pair.

13. A method of forming a reticle, comprising:

providing a quartz-containing substrate;

forming an antireflective structure over the substrate; the antireflective structure being formed to comprise Fabry-Perot paired layers;

forming a tantalum-comprising attenuating layer over the antireflective structure;

forming a chromium-containing material over the attenuating layer; and

forming a pattern of openings extending through the chromium-containing material, through the attenuating layer, and through the antireflective structure.

14. The method of claim 13 wherein one of the Fabry-Perot paired layers comprises one or more of metal fluoride, niobium oxide and hafnium oxide.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 1, 2016
From: MICRON TECHNOLOGY, INC
To: OVONYX MEMORY TECHNOLOGY, LLC
Reel/Frame 039974/0496 →