IP Library Patent Application 11497669
Patent Application
App. No. 11/497,669

Monolithic sputter target backing plate with integrated cooling passages

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Quick Facts
Patent No.
US None
App. No.
11/497,669
Abstract

A single-piece backing plate for a sputtering target is disclosed where cooling passages are formed internal to the backing plate. In some embodiments, cooling passages can be formed through the edges of a single plate of material by gun drilling. These passages can then be sealed at the edge so as to form cooling passages within the plate. A sputtering target can then be bonded to one side of the plate to form a target assembly. In some embodiments, an insulating plate can be permanently bonded a side of the backing plate. Some embodiments of the target plate according to the present invention remove the need for multiple internal sealing surfaces, multiple attachment devices, and external back-side plasma suppression plates that are often utilized in conventional backing plate assemblies.

Claims (31)

1 . A cooling backing plate for a sputter target, comprising:

a single metallic plate with a first surface for mounting a sputter target;

cooling channels formed laterally within the single metallic plate, the cooling channels being formed through the single metallic plate; and

plugs positioned in the cooling channels so as to seal and form cooling passages within the single metallic plate.

2 . The backing plate of claim 1 , wherein the cooling channels are formed through an edge of the single metallic plate.

3 . The backing plate of claim 1 , wherein the cooling channels have a diameter that is greater than ½ a thickness of the single metallic plate.

4 . The backing plate of claim 1 , wherein the single metallic plate is a material from a group consisting of titanium, aluminum, nickel, cobalt, nickel alloy, cobalt alloy, copper, and iron.

5 . The backing plate of claim 1 , wherein the single metallic plate having a lateral width greater than a substrate.

6 . The backing plate of claim 1 , wherein the single metallic plate has a smallest dimension greater than about 15 inches.

7 . The backing plate of claim 1 , wherein the single metallic plate is substantially rectangular.

8 . The backing plate of claim 1 , wherein the single metallic plate is a parallelapiped.

9 . The backing plate of claim 1 , wherein the single metallic plate is oval.

10 . The backing plate of claim 1 , wherein the single metallic plate is circular.

11 . The backing plate of claim 1 , wherein the single metallic plate is triangular.

12 . The backing plate of claim 1 , wherein the single metallic plate is multi-sided.

13 . The backing plate of claim 1 wherein an insulating plate is permanently bonded to a second surface of the single metallic plate

14 . A method of forming a cooling backing plate for a sputtering target, comprising:

machining a single plate of material to form a smooth, flat first surface for mounting a sputtering target;

forming through-holes through the single sheet in directions parallel with the smooth, flat first surface; and

positioning plugs within the through holes so as to form that cooling channels are formed within the single sheet of material.

15 . The method of claim 14 , wherein forming through-holes includes gun-drilling holes through an edge of the single plate of material.

16 . The method of claim 14 , wherein forming through-holes includes laser ablation machining through an edge of the single plate of material.

17 . The method of claim 14 , wherein forming through-holes includes electrodischarge machining through an edge of the single plate of material.

18 . The method of claim 14 , further including bonding an insulating plate on a second surface of the single plate of material opposite the first surface of the single plate of material.

19 . A target assembly, comprising:

a backing plate, comprising:

a single metallic plate;

cooling channels formed laterally within the single metallic plate, the cooling channels being formed through the single metallic plate; and

plugs positioned in the cooling channels so as to seal and form cooling passages within the single metallic plate; and

a sputtering target bonded to a first surface of the backing plate.

20 . The target assembly of claim 19 , further including an insulating plate permanently bonded to a second surface of the backing plate, the second surface opposite the first surface.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 19, 2007
From: SYMMORPHIX, INC.
To: SPRINGWORKS, LLC.
Reel/Frame 020134/0102 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 3, 2006
From: DEMARAY, RICHARD E.
To: SYMMORPHIX, INC.
Reel/Frame 018371/0375 →