Patent Assignment
Reel/Frame 020134/0102
Assignment of Assignor's Interest
Recorded: 2007-11-19
Received: 2007-11-19
Pages: 6
Assignor
SYMMORPHIX, INC.
Executed: 2007-10-26
Assignee
SPRINGWORKS, LLC.
4400 BAKER ROAD, MINNETONKA, MN, 55343, UNITED STATES
Covered Properties
(22)
Energy Conversion and Storage Films and Devices by Physical Vapor Deposition of Titanium and Titanium Oxides and Sub-Oxides
Application:
11/726,972 →
Monolithic sputter target backing plate with integrated cooling passages
Application:
11/497,669 →
Deposition of LICOO2
Application:
11/297,057 →
Biased Pulse Dc Reactive Sputtering of Oxide Films
Application:
11/228,717 →
Biased Pulse Dc Reactive Sputtering of Oxide Films
Application:
11/228,834 →
Dielectric Barrier Layer Films
Application:
11/228,805 →
Deposition of Perovskite and Other Compound Ceramic Films for Dielectric Applications
Application:
11/218,652 →
Biased Pulse Dc Reactive Sputtering of Oxide Films
Application:
11/191,643 →
Mode size converter for a planar waveguide
Application:
11/100,864 →
Mode Size Converter for a Planar Waveguide
Application:
11/100,856 →
Biased Pulse Dc Reactive Sputtering of Oxide Films
Application:
10/954,182 →
Energy Conversion and Storage Films and Devices by Physical Vapor Deposition of Titanium and Titanium Oxides and Sub-Oxides
Application:
10/851,542 →
Transparent Conductive Oxides
Application:
10/850,968 →
Dielectric Barrier Layer Films
Application:
10/789,953 →
Optically Coupling into Highly Uniform Waveguides
Application:
10/650,461 →
Low Temperature Zirconia Based Thermal Barrier Layer by Pvd
Application:
10/291,179 →
Planar Optical Devices and Methods for Their Manufacture
Application:
10/288,278 →
Biased Pulse Dc Reactive Sputtering of Oxide Films
Application:
10/101,863 →
Mode Size Converter for a Planar Waveguide
Application:
10/101,492 →
As-Deposited Planar Optical Waveguides with Low Scattering Loss and Methods for Their Manufacture
Application:
09/903,081 →
Planar Optical Devices and Methods for Their Manufacture
Application:
09/903,050 →
Method of Producing Amorphous Silicon for Hard Mask and Waveguide Applications
Application:
09/766,463 →