IP Library Granted Patent US 7,397,025
Granted Patent B2
US 7,397,025 · App. 11/517,334 · Granted Jul 8, 2008

Mass spectrometer

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Quick Facts
Patent No.
US 7,397,025
App. No.
11/517,334
Granted
Jul 8, 2008
Kind
B2
Abstract

A mass spectrometer having an ion source section capable of creating positive ions and negative ions at high efficiency. The ion source is comprised of an ion source section for creating ions of a sample gas, a mass spectrometric section for conducting mass separation of created ions, linear RF generating multipole electrodes, magnetic fields generation means, a sample gas introduction system, a reaction gas introduction system and an electron source in which the linear RF generating multipole electrodes generate linear RF multipole electric fields. A static magnetic fields is applied in parallel on the center axis where the linear RF multipole electric fields are zero. A sample gas and a reagent gas are introduced into the ion source section. Electrons are injected for creating reaction of the positive ions or negative ions.

Claims (1)

1. A mass spectrometer comprising an ion source for creating ions for a sample ions, a mass spectrometric section for conducting mass separation of ions, linear RF generating multipole electrodes for generating RF multipole electric fields, magnetic field generation means for generating static magnetic fields to be superimposed substantially in parallel on a center axis, reaction gas introduction system for introducing the reaction gas to the inside of the ion source, and an electron source for generating electrons to be used for the creating reaction of the ions, in which the linear RF generating multipole electrodes, the magnetic field generating means and the electron source are placed inside the ion source.

Assignments (1)
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →