IP Library Granted Patent US 7,489,550
Granted Patent B2
US 7,489,550 · App. 11/524,300 · Granted Feb 10, 2009

EEPROM and method of driving the same

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Quick Facts
Patent No.
US 7,489,550
App. No.
11/524,300
Granted
Feb 10, 2009
Kind
B2
Abstract

An EEPROM (Electrically Erasable and Programmable Read Only Memory) has a first MOS transistor and a second MOS transistor. The first MOS transistor and the second MOS transistor have a common gate electrode and constitute one memory cell. A program operation and an erase operation are carried out by using the first MOS transistor. A read operation is carried out by using the second MOS transistor.

Claims (13)

1. An EEPROM comprising:

a P-channel MOS transistor; and

an N-channel MOS transistor,

wherein said P-channel MOS transistor and said N-channel MOS transistor have a common floating gate electrode and constitute one memory cell,

wherein a read operation is carried out by using said N-channel MOS transistor, and

wherein charges are injected into and drawn out of said common floating gate electrode through a gate insulating film of said P-channel MOS transistor, where a voltage of 0 V is applied to a source, drain and a back gate of said N-channel MOS transistor.

2. The EEPROM according to claim 1 , wherein in said read operation, a voltage of 0 V is applied to a source, drain and a back gate of said P-channel MOS transistor.

3. A method of driving an EEPROM, said EEPROM comprising a P-channel MOS transistor and an N-channel MOS transistor which have a common floating gate electrode and constitute one memory cell, said method comprising:

carrying out a read operation by using said N-channel MOS transistor;

carrying out a program operation by injecting charges into said common floating gate electrode through a gate insulating film of said P-channel MOS; and

carrying out an erase operation by drawing charges out of said common floating gate electrode through said gate insulating film of said P-channel MOS transistor,

wherein in said program operation and said erase operation, a voltage of 0 V is applied to a source, drain and a back gate of said N-channel MOS transistor.

4. The method according to claim 3 , wherein in said read operation, a voltage of 0 V is applied to a source, drain and a back gate of said P-channel MOS transistor.

Assignments (2)
CHANGE OF NAME Recorded Nov 4, 2010
From: NEC ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 025311/0851 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 21, 2006
From: TANAKA, KOUJI
To: NEC ELECTRONICS CORPORATION
Reel/Frame 018325/0256 →