Apparatus for determining optimum position of focus of an imaging system
View Patent ↗Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously moving wafer is illuminated by a laser pulse of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.
1. Apparatus for determining the position of optimum focus of an imaging system of an object inspection system, comprising:
an objective element projecting a single image of an object onto an imaging plane;
a detector disposed at said imaging plane and tilted at an angle with respect to said imaging plane, such that the sharpness of focus of said image varies across said detector;
a source of illumination illuminating said single image; and
a focal position calculator operative to determine the point of optimum image sharpness on said detector based on said single image,
wherein said single image of said object is generated using illumination of a different wavelength from that used for inspection of said object and wherein said object inspection is performed with illumination of a first wavelength in a dark field mode, and said focal position calculator is operative to determine said position of optimum focus of said imaging system from data obtained by using illumination of a second wavelength in a bright field mode.
2. Apparatus according to claim 1 , and wherein said imaging system is precalibrated such that when said imaging system is in said position of optimum focus the point of optimum image sharpness on said detector is in a known position.
3. Apparatus according to claim 1 , and wherein said focal position calculator utilizes an image processing algorithm to determine said point of optimum image sharpness.
4. Apparatus according to claim 3 , and wherein said imaging processing algorithm utilizes edge detection methodologies.
5. Apparatus for determining the optimum position of focus of an imaging system, said imaging system having an optical axis and an imaging plane perpendicular thereto, and comprising:
an objective element projecting an image of an object onto said imaging plane;
a detector disposed at said imaging plane;
a source of illumination having an emission aperture, disposed at a distance from said object, said source of illumination being essentially confocal to said imaging plane, said source of illumination being tilted at an angle with respect to said imaging plane such that different points across said emission aperture are located at different distances from said object, such that the sharpness of images of said different points on said imaging plane varies across said detector; and
a focal position calculator operative to determine a point of optimum sharpness on said detector,
wherein said image of said object is generated using illumination of a different wavelength from that used for inspection of said object and said object inspection is performed with illumination of a first wavelength in a dark field mode, and said focal position calculator is operative to determine said position of optimum focus of said imaging system from data obtained by using illumination of a second wavelength in a bright field mode.
6. Apparatus according to claim 5 , and wherein said imaging system is precalibrated such that when said imaging system is in said optimum position of focus, the point of optimum image sharpness on said detector is in a known position.
7. Apparatus according to claim 5 , and wherein said focal position calculator utilizes an image processing algorithm to determine said point of optimum image sharpness.
8. Apparatus according to claim 7 , and wherein said imaging processing algorithm utilizes edge detection methodologies.
9. Apparatus according to claim 5 , and wherein said source of illumination comprises a flat array of optical fibers, whose ends are terminated in a line which is not perpendicular to the axis of illumination of said array.
10. Apparatus according to claim 5 , and wherein said source of illumination comprises a mask including a plurality of illuminated holes, and wherein said mask is tilted with respect to an axis of said illumination source and is not perpendicular thereto.