Method of fabricating semiconductor device
View Patent ↗An insulating film is formed on a main surface of a substrate. A conductive film is formed on the insulating film. A lower layer resist film, an intermediate layer, an anti-reflection film and an upper layer resist film are formed on the conductive film. A focal point at a time of exposure is detected by detecting a height of the upper layer resist film. In detecting the focal point at the time of exposure, a focal point detection light is radiated on the upper layer resist film. After detecting the focal point, the upper layer resist film is exposed and developed thereby to form a resist pattern. With the resist pattern as a mask, the intermediate layer and the anti-reflection film are patterned, and the lower layer resist film is developed. With these patterns as a mask, the conductive film is etched thereby to form a gate electrode.
1. A method of fabricating a semiconductor device, comprising the steps of:
forming a first film including a film to be processed on a main surface of a substrate;
forming a second film including a photosensitive material on the first film;
detecting a focal point at a time of exposure by radiating a focal point detection light on the second film and using a specified polarized light obtained from the focal point detection light;
exposing the second film;
patterning the second film; and
patterning the first film with the patterned second film as a mask;
wherein the step of forming the second film includes:
forming on the first film an anti-reflection film having absorbency within a wavelength region of the focal point detection light; and
forming the second film on the anti-reflection film.
2. The method of fabricating a semiconductor device according to claim 1 , wherein
the polarized light is selected from any one of a p-polarized light, an s-polarized light, and a linearly polarized light of 45 degrees including the s-polarized light and the p-polarized light.
3. The method of fabricating a semiconductor device according to claim 1 , wherein
the polarized light is the linearly polarized light of 45 degrees including the s-polarized light and the p-polarized light, and
the focal point at the time of exposure is calculated using an amplitude and a phase difference of the s-polarized light and the p-polarized light and optical constants of the first and second films.
4. The method of fabricating a semiconductor device according to claim 1 , wherein
the anti-reflection film includes at least one of an organic material and an inorganic material.
5. The method of fabricating a semiconductor device according to claim 4 , wherein
the anti-reflection film is formed of an organic material and contains a compound having absorbency within the wavelength region of the focal point detection light.
6. The method of fabricating a semiconductor device according to claim 1 , wherein
the exposure step is a step of conducting liquid immersion lithography.
7. A method of fabricating a semiconductor device, comprising the steps of:
forming a first film including a film to be processed on a main surface of a substrate;
forming a second film including a photosensitive material on the first film;
forming a third film higher in a refractive index than the second film on the second film;
detecting a focal point at a time of exposure by radiating a focal point detection light on the third film and using a specified polarized light obtained from the focal point detection light;
exposing the second film;
removing the third film and patterning the second film; and
patterning the first film with the patterned second film as a mask.
8. The method of fabricating a semiconductor device according to claim 7 , wherein
the third film contains a compound having absorbency within the wavelength region of the focal point detection light.
9. The method of fabricating a semiconductor device according to claim 7 , wherein
the exposure step is a step of conducting liquid immersion lithography.