Ethylene terephthalate polymer retaining ring for a chemical mechanical polishing head
Embodiments of a retaining ring for use with a chemical mechanical polishing process with a body including a polyethylene terephthalate polymer or polymer including ethylene terephthalate monomers are disclosed.
1 . A retaining ring for use in a chemical mechanical polishing process, a body of the retaining ring comprises a PET polymer, wherein the PET polymer is free or substantially free of inorganic particles.
2 . The retaining ring of claim 1 , wherein the inorganic particles comprise filler particles, nucleating agents, or both.
3 . The retaining ring of claim 1 , wherein a portion of the body of the retaining ring comprises the PET polymer.
4 . The retaining ring of claim 1 , wherein all or a majority of the body of the retaining ring comprises the PET polymer.
5 . The retaining ring of claim 1 , wherein the body of the retaining ring comprises at least one additional polymer blended with the PET polymer.
6 . The retaining ring of claim 1 , wherein the body of the retaining ring further comprises organic filler particles dispersed within the PET polymer in an amount less than or equal to 2% by weight.
7 . The retaining ring of claim 6 , wherein the organic particles comprise TEFLON particles.
8 . A retaining ring for use in a chemical mechanical polishing process, a body of the retaining ring comprises a polymer, the polymer comprising ethylene terephthalate monomers, wherein the polymer is free or substantially free of inorganic particles.
9 . The retaining ring of claim 8 , wherein the inorganic particles comprise filler particles, nucleating agents, or both.
10 . The retaining ring of claim 8 , wherein all or a majority of the body of the retaining ring comprises the polymer including the ethylene terephthalate monomer.
11 . The retaining ring of claim 8 , wherein a portion of the body of the retaining ring comprises the polymer including the ethylene terephthalate monomers.
12 . The retaining ring of claim 8 , wherein the polymer is a copolymer, the copolymer comprising one or more additional monomers.
13 . The retaining ring of claim 12 , wherein the additional monomers are selected from the group consisting of phenylene sulfide and etherketone.
14 . The retaining ring of claim 8 , wherein a majority of the polymer comprises ethylene terephthalate monomers.
15 . The retaining ring of claim 8 , wherein the body of the retaining ring comprises at least one additional polymer blended with the polymer.
16 . The retaining ring of claim 8 , wherein the body of the retaining ring further comprises organic filler particles dispersed within the polymer in an amount less than or equal to 2.0 % by weight.
17 . The retaining ring of claim 16 , wherein the organic particles comprise TEFLON particles.
18 . A method of polishing a substrate comprising:
providing a chemical mechanical polishing apparatus comprising a retaining ring having a body, the body including a polymer including a PET polymer, wherein the polymer is free or substantially free of inorganic particles;
retaining the substrate using the retaining ring; and
polishing the substrate including the step of placing the body in contact with a polishing pad surface.
19 . The method of claim 18 , wherein the body of the retaining ring is free of organic particles.
20 . The method of claim 18 , wherein all or a majority of the body of the retaining ring comprises the PET polymer.
21 . The method of claim 18 , wherein the body of the retaining ring further comprises organic filler particles dispersed within the PET polymer.
22 . A method of polishing a substrate comprising the step of:
providing a chemical mechanical polishing apparatus, the apparatus comprising a retaining ring having a body, the body comprising ethylene terephthalate monomer, wherein the polymer is free or substantially free of inorganic particles;
retaining the substrate using the retaining ring; and
polishing the substrate including the step of placing the body in contact with a polishing pad surface.
23 . The method of claim 22 , wherein the body of the retaining ring is free of organic particles.
24 . The method of claim 22 , wherein a majority of the polymer comprises ethylene terephthalate monomers.
25 . The method of claim 22 , wherein the polymer is a copolymer, the copolymer comprising one or more additional monomers.
26 . The method of claim 22 , wherein the body of the retaining ring further comprises organic filler particles dispersed within the polymer.
27 . A retaining ring for use in a chemical mechanical polishing process, a body of the retaining ring comprises a PET polymer, wherein the PET polymer has organic filler particles dispersed therein and the PET polymer is free or substantially free of inorganic particles.
28 . The retainer ring of claim 27 , wherein the PET polymer has less than 0.1% organic particles dispersed therein.
29 . A retaining ring for use in a chemical mechanical polishing process, a body of the retaining ring comprises a polymer, the polymer comprising ethylene terephthalate monomers, wherein the polymer has organic filler particles dispersed therein and the polymer is free or substantially free of inorganic particles.
30 . The retainer ring of claim 29 , wherein the polymer has less than 0.1% organic particles dispersed therein.