Substrate processing method and substrate processing apparatus
View Patent ↗According to the substrate processing method of the invention, a jet of droplets generated from a gas and a heated processing liquid is supplied to the surface of a substrate. A resist stripping liquid to strip off the resist from the surface of the substrate is then supplied to the surface of the substrate.
1. A substrate processing method, comprising:
a jet of droplets supplying step of supplying a jet of droplets generated from a gas and a heated processing liquid to a surface of a substrate;
a resist stripping liquid supplying step of supplying a resist stripping liquid to the surface of the substrate after the jet of droplets supplying step;
a substrate rotating step of rotating the substrate; and
a liquid supplying step of supplying a liquid to the surface of the substrate in parallel with the substrate rotating step,
wherein the liquid supplying step is performed in parallel with the jet of droplets supplying step.
2. The substrate processing method according to claim 1 , wherein:
the resist stripping liquid includes a mixed liquid of sulfuric acid and a hydrogen peroxide liquid.
3. The substrate processing method according to claim 1 , wherein:
the jet of droplets supplying step is a step of supplying a jet of droplets generated from a heated gas and the heated processing liquid.
4. A substrate processing method, comprising:
a jet of droplets supplying step of supplying a jet of droplets generated from a gas and a heated processing liquid to a surface of a substrate; and
a resist stripping liquid supplying step of supplying a resist stripping liquid to the surface of the substrate after the jet of droplets supplying step; wherein:
a hardened resist layer is formed on the surface of the substrate,
the jet of droplets supplying step includes a step of supplying the jet of droplets such that the hardened layer is broken, and
the resist stripping liquid supplying step includes a step of supplying the resist stripping liquid such that the resist stripping liquid penetrates into an inside of the hardened resist layer from a broken portion of the hardened resist layer.
5. The substrate processing method according to claim 4 , wherein:
the resist stripping liquid includes a mixed liquid of sulfuric acid and a hydrogen peroxide liquid.
6. The substrate processing method according to claim 4 , wherein:
the jet of droplets supplying step is a step of supplying a jet of droplets generated from a heated gas and the heated processing liquid.
7. The substrate processing method according to claim 4 , further comprising:
a substrate rotating step of rotating the substrate; and
a liquid supplying step of supplying a liquid to the surface of the substrate in parallel with the substrate rotating step,
wherein the liquid supplying step is performed in parallel with the jet of droplets supplying step.
8. The substrate processing method according to claim 7 , wherein:
the resist stripping liquid includes a mixed liquid of sulfuric acid and a hydrogen peroxide liquid.
9. The substrate processing method according to claim 7 , wherein:
the jet of droplets supplying step is a step of supplying a jet of droplets generated from a heated gas and the heated processing liquid.