CATHODE INCORPORATING FIXED OR ROTATING TARGET IN COMBINATION WITH A MOVING MAGNET ASSEMBLY AND APPLICATIONS THEREOF

1 . A sputtering cathode apparatus comprising:

a hollow cylindrical sputter target that is fixed or rotatable about its central axis; and

an internal magnet assembly that can be rotated axially within the sputter target.

2 . The apparatus of claim 1 , the magnet assembly comprising a plurality of magnet bars to induce sputtering at more than one radial direction.

3 . The apparatus of claim 1 , wherein the magnet assembly is unbalanced.

4 . The apparatus of claim 1 wherein the magnet assembly is capable of continuously rotating.

5 . The apparatus of claim 1 further comprising a mechanism for moving the internal magnet assembly to move the plasma on the target surface to optimize the coating of parts moving past the cathode.

6 . The apparatus of claim 1 further comprising a mechanism for moving the internal magnet assembly to move the plasma on the target surface to optimize the coating of stationary parts in a vacuum chamber.

7 . The apparatus of claim 1 wherein the magnet assembly is moved to a burn-in position prior to returning to its intended sputter position.

8 . The apparatus of claim 1 having offset magnet bars to reduce target erosion at the ends of the target cylinder.

9 . A sputtering cathode apparatus comprising:

a hollow cylindrical sputter target;

a magnet assembly aligned substantially coaxially within the sputter target; and

a rotation mechanism operatively coupled with the magnet assembly, whereby the magnet assembly can be rotated during the sputtering process.

10 . The apparatus of claim 9 , the magnet assembly comprising a collinear magnet stack offset from the axis of the magnet assembly.

11 . The apparatus of claim 9 , the magnet assembly comprising a plurality of collinear magnet stacks arranged asymmetrically about the axis of the magnet assembly.

12 . The apparatus of claim 11 , wherein the magnet stacks are offset from each other in the direction of the longitudinal axis, thereby reducing the magnetic field at the end of the stacks and thus reducing target erosion at the ends of the target cylinder.

13 . The apparatus of claim 9 , the magnet assembly comprising a plurality of collinear magnet stacks arranged symmetrically about the axis of the magnet assembly.

14 . The apparatus of claim 13 , wherein the magnet stacks are offset from each other in the direction of the longitudinal axis, thereby reducing the magnetic field at the end of the stacks and thus reducing target erosion at the ends of the target cylinder.

15 . The apparatus of claim 9 , wherein the rotation mechanism is a controllable rotation mechanism.

16 . The apparatus of claim 9 , the rotation mechanism comprising:

a motor; and

a polytooth belt operatively coupled with the motor.

17 . A process for sputtering comprising the steps of:

controllably rotating a magnet assembly inside a target; and

sweeping sputter deposition across the surface of the target.

18 . The process of claim 17 , wherein the sweeping is continuous.

19 . The process of claim 17 , wherein the sweeping is swept back and forth over a given angular range.

20 . The process of claim 17 , further comprising the step of controllably rotating the hollow cylindrical target.