IP Library Granted Patent US 8,642,126
Granted Patent B2
US 8,642,126 · App. 11/572,665 · Granted Feb 4, 2014

Carbon nanotube device and process for producing the same

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Quick Facts
Patent No.
US 8,642,126
App. No.
11/572,665
Granted
Feb 4, 2014
Kind
B2
Abstract

A carbon nanotube device has a substrate ( 1 ), a layer ( 3 ) having a space ( 5 ) which penetrates in the vertical direction of the substrate ( 1 ), and carbon nanotubes ( 7 ) formed on the surface of the substrate facing the space ( 5 ) in such a manner as to have number density distributions successively changed according to the distances from the center of the space ( 5 ), the supply amount of catalyst substances is diluted by supplying the catalyst substances through an opening of a coating film ( 4 ) opposite to the substrate ( 1 ) and the hole ( 5 ), a catalyst having a nominal thickness distribution according to the way how the space ( 5 ) appears is formed on the substrate ( 1 ) facing the space ( 5 ), and a carbon source is supplied, thereby forming carbon nanotubes having the number density distribution are formed on the substrate ( 1 ).

Claims (64)

1. A carbon nanotube device comprising:

a substrate;

an insulating layer laid on said substrate, having a space over said substrate;

a coating layer which sandwiches said insulating layer with said substrate and has a tiny opening leading to said space;

a catalyst substance laid on said substrate in said space; and

a carbon nanotube aggregate supported by said catalyst substance in said space,

and wherein

said carbon nanotube aggregate is extending from said catalyst substance and said substrate toward said tiny opening in said space,

said carbon nanotube aggregate is a spine comprised of a plurality of carbon nanotubes entwined with one another,

nominal thickness of said catalyst in said catalyst substance successively decreases according to distance from said tiny opening,

nominal thickness of said catalyst in a center of said catalyst substance facing said tiny opening is the thickest,

number density of said plurality of carbon nanotubes in said carbon nanotube aggregate successively decreases according to distance from said center of said catalyst substance,

said plurality of carbon nanotubes on said center of said catalyst substance are grown in a vertical direction with respect to said substrate; and

a leading end of said spine is sharp and adjacent to said tiny opening.

2. The carbon nanotube device according to claim 1 , wherein said insulating layer comprises an insulating material, and said tiny opening is small compared to the thickness of said insulating layer.

3. The carbon nanotube device according to claim 1 , wherein said carbon nanotube device is to be used for a field emission electron source,

said substrate has a conductive layer on a side contacting said insulating layer,

said coating layer is conductive, and

field emission of electrons from said leading end of said spine toward said tiny opening is performed as a voltage is applied between said conductive layer and said coating layer.

4. The carbon nanotube device according to claim 3 , further comprising a catalyst support substance at a portion between said catalyst substance and said conductive layer.

5. The carbon nanotube device according to claim 1 , wherein each of said plurality of carbon nanotubes is a single-walled carbon nanotube.

6. The carbon nanotube device according to claim 1 , wherein

a side face of said space is formed in an axisymmetrical shape around an axis from said tiny opening to said substrate, and a size of said space decreases from said coating layer as coming close to said substrate.

7. The carbon nanotube device according to claim 1 , wherein said plurality of carbon nanotubes apart from said center of said catalyst substance are grown in a horizontal direction with respect to said substrate.

8. A process for producing a carbon nanotube device, comprising:

forming an insulating layer on a substrate;

forming a coating layer on said insulating layer, said coating layer having a tiny opening;

etching said insulating layer through said tiny opening to make a space exposing a part of said substrate;

forming a catalyst body containing a catalyst substance on said substrate in said space, by supplying a diluted catalyst substance source through said tiny opening into said space, so that nominal thickness of said catalyst in said catalyst substance successively decreases according to distance from said tiny opening, and nominal thickness of said catalyst in a center of said catalyst substance facing said tiny opening is the thickest; and

supplying a carbon source through said tiny opening into said space, thereby forming a carbon nanotube aggregate supported by said catalyst substance in said space so that:

said carbon nanotube aggregate is extending from said catalyst substance and said substrate toward said tiny opening in said space,

said carbon nanotube aggregate is a spine comprised of a plurality of carbon nanotubes entwined with one another;

said plurality of carbon nanotubes on said center of said catalyst substance are grown in a vertical direction with respect to said substrate; and

number density of said plurality of carbon nanotubes in said carbon nanotube aggregate successively decreases according to distance from said center of said catalyst substance.

9. The carbon nanotube device production process according to claim 8 , wherein said insulating layer having said space is formed of an insulating material, and said tiny opening is small compared to the thickness of said insulating layer.

10. The carbon nanotube device production process according to claim 8 , wherein

said carbon nanotube device is to be used for a field emission electron source,

said coating layer is conductive,

said insulating layer is formed after a conductive layer is formed on a surface of said substrate, and

said carbon nanotube aggregate is formed on a surface of said conductive layer.

11. The carbon nanotube device production process according to claim 10 , wherein

after said insulating layer is formed,

a catalyst support substance is formed on a portion of a surface of said conductive layer exposed to said space,

a catalyst substance is formed on said catalyst support substance,

and then a carbon source is supplied into said space, thereby forming said carbon nanotube aggregate on said conductive layer, said catalyst support substance, and said catalyst substance.

12. The carbon nanotube device production process according to claim 8 , wherein each of said plurality of carbon nanotubes is a single-walled carbon nanotube.

13. The carbon nanotube device production process according to claim 8 , wherein

a side face of said space is formed in an axisymmetrical shape around an axis from said tiny opening toward said substrate and which has a size decreasing as coming close to said substrate from said coating layer, in said insulating layer.

14. The carbon nanotube device production process according to claim 8 , wherein said plurality of carbon nanotubes apart from said center of said catalyst substance are grown in a horizontal direction with respect to said substrate.

15. A carbon nanotube device comprising:

a substrate;

an insulating layer laid on said substrate, having a space which penetrates to said substrate;

a coating layer which sandwiches said insulating layer with said substrate and has a tiny opening leading to said space;

a catalyst substance laid on said substrate in said space; and

a carbon nanotube aggregate supported by said catalyst substance in said space,

and wherein

nominal thickness of said catalyst in said catalyst substance successively decreases according to distance from said tiny opening, and

said carbon nanotube aggregate is a spine comprised of a plurality of carbon nanotubes entwined with one another, and is extending from said catalyst substance and said substrate toward said tiny opening in said space.

16. A process for producing a carbon nanotube device, comprising:

forming an insulating layer on a substrate;

forming a coating layer on said insulating layer, said coating layer having a tiny opening;

etching said insulating layer through said tiny opening to make a space exposing a part of said substrate;

forming a catalyst substance containing a catalyst on said substrate in said space, by supplying a diluted catalyst substance source through said tiny opening into said space so that nominal thickness of said catalyst in said catalyst substance successively decreases according to distance from said tiny opening; and

supplying a carbon source through said tiny opening into said space, thereby forming a carbon nanotube aggregate supported by said catalyst substance in said space so that said carbon nanotube aggregate is a spine comprised of a plurality of carbon nanotubes entwined with one another, and is extending from said catalyst substance and said substrate toward said tiny opening in said space.

Assignments (3)
CHANGE OF NAME Recorded Mar 12, 2015
From: DAINIPPON SCREEN MFG. CO., LTD.
To: SCREEN HOLDINGS CO., LTD.
Reel/Frame 035248/0483 →
CORRECTIVE ASSIGNMENT TO CORRECT THE THE ASSIGNEE ADDRESS AND WE NEED TO ADD ANOTHER ASSIGNEE PREVIOUSLY RECORDED ON REEL 018971 FRAME 0808. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Mar 13, 2007
From: NODA, SUGURU
To: DAINIPPON SCREEN MFG. CO., LTD.; NODA, SUGURU
Reel/Frame 019003/0143 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 7, 2007
From: NODA, SUGURU
To: DAINIPPON SCREEN MFG. CO., LTD.
Reel/Frame 018971/0808 →