Low power magnetoresistive random access memory elements
View Patent ↗Low power magnetoresistive random access memory elements and methods for fabricating the same are provided. In one embodiment, a magnetoresistive random access device has an array of memory elements. Each element comprises a fixed magnetic portion, a tunnel barrier portion, and a free SAF structure. The array has a finite magnetic field programming window Hwin represented by the equation H win ≈( Hsat − σ sat )−( Hsw + σ sw ), where Hsw is a mean switching field for the array, Hsat is a mean saturation field for the array, and Hsw for each memory element is represented by the equation H SW ≅√{square root over (H k H SAT )}, where H k represents a total anisotropy and H SAT represents an anti-ferromagnetic coupling saturation field for the free SAF structure of each memory element. N is an integer greater than or equal to 1. H k , H SAT , and N for each memory element are selected such that the array requires current to operate that is below a predetermined current value.
1. A magnetoresistive random access device having an array of memory elements, each memory element comprising:
a fixed magnetic portion,
a tunnel barrier portion disposed proximate to said fixed magnetic portion; and
a free SAF structure disposed proximate to said tunnel barrier portion, wherein:
the array of memory elements has a finite magnetic field programming window H win represented by the equation H win ≈( Hsat − σ sat )−( Hsw + σ sw );
Hsw is a mean switching field for said array;
Hsat is a mean saturation field for said array;
Hsw for said each memory element is represented by the equation H SW ≅√{square root over (H k H SAT )}, wherein H k represents a total anisotropy field of said free SAF structure of said each memory element and H SAT represents a total anti-ferromagnetic coupling saturation field for said free SAF structure of said each memory element;
N is an integer greater than or equal to 1;
σ sw is a standard deviation for Hsw ; and
σ sat is a standard deviation for H SAT ,
and wherein said free SAF structure is configured to have H k , H SAT , and N values such that the array of memory elements is thermally stable and requires current to operate that is below a predetermined current value.
2. The magnetoresistive random access device of claim 1 , wherein H k of said free SAF structure of said each memory element of said array has a value that is no greater than 15 Oe-microns divided by a width of said free SAF structure, wherein said width is a dimension (in microns) of said free SAF structure that is orthogonal to a longitudinal axis of said free SAF structure.
3. The magnetoresistive random access device of claim 1 , wherein said free SAF structure comprises two magnetic portions, each of said two magnetic portions comprising a layer of low magnetization material.
4. The magnetoresistive random access device of claim 3 , each of said at least two magnetic portions comprising a material selected from the group consisting of Ni, Fe, Co, alloys of Ni, alloys of Fe, and alloys of Co.
5. The magnetoresistive random access device of claim 3 , wherein said low magnetization material is doped with at least one material selected from the group consisting of molybdenum, tantalum, and boron.
6. The magnetoresistive random access device of claim 3 , at least one of said two magnetic portions further comprising a layer of high spin polarization material.
7. The magnetoresistive random access device of claim 1 , wherein said free SAF structure comprises two magnetic portions, each of said two magnetic portions having a thickness no greater than about 5 nm.
8. The magnetoresistive random access device of claim 1 , wherein said free SAF structure has a length and a width and a length/width ratio in the range of from about 1 to about 3.
9. The magnetoresistive random access device of claim 8 , said free SAF structure having a length/width ratio in the range of from about 2 to about 2.5.
10. The magnetoresistive random access device of claim 1 , said free SAF structure having a value of HSAT in the range of from about 150 Oe to about 350 Oe.
11. The magnetoresistive random access device of claim 1 , said free SAF structure is configured to have a value of H SAT less than approximately 180/w 0.5 (Oe), where w is the width (in microns) of said free SAF structure.
12. The magnetoresistive random access device of claim 1 , wherein said free SAF structure is a second order SAF structure.
13. The magnetoresistive random access device of claim 12 , wherein said free SAF structure comprises two magnetic portions separated by an anti-ferromagnetic coupling spacer layer and a layer of material that produces a higher anti-ferromagnetic exchange coupling than said anti-ferromagnetic coupling spacer layer alone.
14. The magnetoresistive random access device of claim 1 , wherein said free SAF structure comprises two magnetic portions separated by an anti-ferromagnetic coupling spacer layer, wherein a thickness of said anti-ferromagnetic coupling spacer layer is such that said free SAF structure is a first order SAF structure and wherein said thickness of said anti-ferromagnetic coupling spacer layer is greater than a thickness at which an anti-ferromagnetic coupling saturation field H SAT of said anti-ferromagnetic coupling material is a maximum.
15. The magnetoresistive random access device of claim 1 , wherein said free SAF structure has an anisotropy axis and has a shape with at least one substantially pointed end disposed substantially along said anisotropy axis.