Granted Patent B2

US 7,517,792 · App. 11/584,645 · Granted Apr 14, 2009

Abstract

Claims (55)

1. A method of fabricating a semiconductor device having a multilayer interconnection structure, comprising the steps of:

forming, on a first insulation film having a first interconnection pattern, a second interlayer insulation film;

forming a second interconnection pattern in said second interlayer insulation film by a dual damascene process such that said second interconnection pattern makes a contact with said first interconnection pattern with a plurality of via-plugs forming a first via-plug group;

forming a third interlayer insulation film on said second interlayer insulation film; and

forming a third interconnection pattern in said third interlayer insulation film by a dual damascene process such that said third interconnection pattern makes a contact with said second interconnection pattern with a plurality of via-plugs forming a second via-plug group;

wherein there is provided a step of controlling a density of said via-plugs forming said second via-plug group to be 70% or less in the event said via-plugs are formed with a minimum pitch of 0.4 μm in said first and second via-plug groups.

2. The method as claimed in claim 1 , wherein said density is obtained for a region having a size of 50 μm for each edge.

3. A method of fabricating a semiconductor device having a multilayer interconnection structure, comprising the steps of:

forming, on a first insulation film having a first interconnection pattern, a second interlayer insulation film;

forming a second interconnection pattern in said second interlayer insulation film by a dual damascene process such that said second interconnection pattern makes a contact with said first interconnection pattern with a plurality of via-plugs forming a first via-plug group;

forming a third interlayer insulation film on said second interlayer insulation film; and

forming a third interconnection pattern in said third interlayer insulation film by a dual damascene process such that said third interconnection pattern makes a contact with said second interconnection pattern with a plurality of via-plugs forming a second via-plug group;

wherein there is provided a step of controlling a density of said via-plugs forming said second via-plug group to be 60% or less in an area having a size of 50-100 μm for each edge in the event said via-plugs are formed with a minimum pitch of 0.4 μm in said first and second via-plug groups.

4. The method as claimed in claim 3 , wherein said second density value is restricted to be less than 1.6 times said first density value.

5. A method of fabricating a semiconductor device having a multilayer interconnection structure, comprising the steps of:

forming, on a first insulation film having a first interconnection pattern, a second interlayer insulation film;

forming a second interconnection pattern in said second interlayer insulation film by a dual damascene process such that said second interconnection pattern makes a contact with said first interconnection pattern with a plurality of via-plugs forming a first via-plug group;

forming a third interlayer insulation film on said second interlayer insulation film; and

forming a third interconnection pattern in said third interlayer insulation film by a dual damascene process such that said third interconnection pattern makes a contact with said second interconnection pattern with a plurality of via-plugs forming a second via-plug group;

wherein there is provided a step of controlling a density of said via-plugs forming said second via-plug group to be 85% or less in the event said via-plugs are formed with a minimum pitch of 0.6 μm in said first and second via-plug groups.

6. The method as claimed in claim 5 , wherein said density is obtained for a region having a size of 50 μm for each edge.

7. A designing method of a semiconductor device having an interconnection structure, said interconnection structure comprising:

a first interconnection layer comprising a first interlayer insulation film and a first interconnection pattern formed in said first interlayer insulation film so as to be exposed at a surface of said first interlayer insulation film, said first interlayer insulation film and said first interconnection pattern forming a common first planarized principal surface;

a second interconnection layer comprising a second interlayer insulation film formed on said first interlayer insulation film and a second interconnection pattern formed in said second interlayer insulation film so as to be exposed at a surface of said second interlayer insulation film, said second interlayer insulation film and said second interconnection pattern forming a common second planarized principal surface; and

a third interconnection layer comprising a third interlayer insulation film formed on said second interlayer insulation film and a third interconnection pattern formed in said third interlayer insulation film so as to be exposed at a surface of said third interlayer insulation film, said third interlayer insulation film and said third interconnection pattern forming a common third planarized principal surface;

said second interconnection pattern being connected to said first interconnection pattern by a plurality of via-plugs extending through said second interlayer insulation film and forming a first via-plug group,

said third interconnection pattern being connected to said second interconnection pattern by a plurality of via-plugs extending through said third interlayer insulation film and forming a second via-plug group,

said first via-plug group including said plural via-plugs therein with a number such that a via-plug density defined as a ratio of a total area of said via-plugs forming said first via-plug group and included in a unit area to a total area of said via-plugs forming said first via-plug group and disposed in said unit area with a maximum possible number according a design rule, takes a first density value,

said second via-plug group including said plural via-plugs therein with a number such that a via-plug density defined as a ratio of a total area of said via-plugs forming said second -via-plug group and included in a unit area to a total area of said via-plugs forming said second via-plug group and disposed in said unit area with a maximum possible number according a design rule, takes a second density value smaller than said second density value,

said design rule being set such that said via-plugs are disposed with a minimum pitch of 0.4 μm in any of said first and second via-plug groups,

said second density value being restricted to be 70% or less.

8. The method as claimed in claim 7 , wherein said unit area is a region having a size of 50 μm for each edge.

9. A designing method of a semiconductor device having an interconnection structure, said interconnection structure comprising:

a first interconnection layer comprising a first interlayer insulation film and a first interconnection pattern formed in said first interlayer insulation film so as to be exposed at a surface of said first interlayer insulation film, said first interlayer insulation film and said first interconnection pattern forming a common first planarized principal surface;

a second interconnection layer comprising a second interlayer insulation film formed on said first interlayer insulation film and a second interconnection pattern formed in said second interlayer insulation film so as to be exposed at a surface of said second interlayer insulation film, said second interlayer insulation film and said second interconnection pattern forming a common second planarized principal surface; and

a third interconnection layer comprising a third interlayer insulation film formed on said second interlayer insulation film and a third interconnection pattern formed in said third interlayer insulation film so as to be exposed at a surface of said third interlayer insulation film, said third interlayer insulation film and said third interconnection pattern forming a common third planarized principal surface;

said second interconnection pattern being connected to said first interconnection pattern by a plurality of via-plugs extending through said second interlayer insulation film and forming a first via-plug group,

said third interconnection pattern being connected to said second interconnection pattern by a plurality of via-plugs extending through said third interlayer insulation film and forming a second via-plug group,

said first via-plug group including said plural via-plugs therein with a number such that a via-plug density defined as a ratio of a total area of said via-plugs forming said first via-plug group and included in a unit area to a total area of said via-plugs forming said first via-plug group and disposed in said unit area with a maximum possible number according a design rule, takes a first density value,

said second via-plug group including said plural via-plugs therein with a number such that a via-plug density defined as a ratio of a total area of said via-plugs forming said second via-plug group and included in a unit area to a total area of said via-plugs forming said second via-plug group and disposed in said unit area with a maximum possible number according a design rule, takes a second density value smaller than said second density value,

said design rule being set such that said via-plugs are disposed with a minimum pitch of 0.4μm in any of said first and second via-plug groups,

said second density value being restricted to be 60% or less in the event said unit region has a size of 50-60 μm for each edge.

10. The method as claimed in claim 7 , wherein said second density value is restricted to be less than 1.6 times said first density value.

11. The method as claimed in claim 7 , wherein said via-plugs forming said first via-plug group and said via-plugs forming said second via-plug group are formed in a first region of said second interlayer insulation film and a second region of said third interlayer insulation film, respectively, said first and second regions overlapping with each other when viewed in a direction perpendicular to said third interlayer insulation film.

12. A designing method of a semiconductor device having an interconnection structure, said interconnection structure comprising:

a first interconnection layer comprising a first interlayer insulation film and a first interconnection pattern formed in said first interlayer insulation film so as to be exposed at a surface of said first interlayer insulation film, said first interlayer insulation film and said first interconnection pattern forming a common first planarized principal surface;

a second interconnection layer comprising a second interlayer insulation film formed on said first interlayer insulation film and a second interconnection pattern formed in said second interlayer insulation film so as to be exposed at a surface of said second interlayer insulation film, said second interlayer insulation film and said second interconnection pattern forming a common second planarized principal surface; and

a third interconnection layer comprising a third interlayer insulation film formed on said second interlayer insulation film and a third interconnection pattern formed in said third interlayer insulation film so as to be exposed at a surface of said third interlayer insulation film, said third interlayer insulation film and said third interconnection pattern forming a common third planarized principal surface;

said second interconnection pattern being connected to said first interconnection pattern by a plurality of via-plugs extending through said second interlayer insulation film and forming a first via-plug group,

said third interconnection pattern being connected to said second interconnection pattern by a plurality of via-plugs extending through said third interlayer insulation film and forming a second via-plug group,

said first via-plug group including said plural via-plugs therein with a number such that a via-plug density defined as a ratio of a total area of said via-plugs forming said first via-plug group and included in a unit area to a total area of said via-plugs forming said first via-plug group and disposed in said unit area with a maximum possible number according a design rule, takes a first density value,

said second via-plug group including said plural via-plugs therein with a number such that a density defined as a ratio of a total area of said via-plugs forming said second via-plug group and included in a unit area to a total area of said via-plugs forming said second via-plug group and disposed in said unit area with a maximum possible number according a design rule, takes a second density value smaller than said second density value,

said design rule being set such that said via-plugs are disposed with a minimum pitch of 0.6 μm in any of said first and second via-plug groups,

said second density value being restricted to be 85% or less.

13. The method as claimed in claim 12 , wherein said unit area is a region having a size of 50 μm for each edge.

Assignments (8)