Selective shielding for multiple exposure masks
View Patent ↗A system for preparing mask data to create a desired layout pattern on a wafer with a multiple exposure photolithographic printing system. In one embodiment, boundaries of features are expanded to create shields for those features, or portions thereof, that are not oriented in a direction that are printed with greater fidelity by an illumination pattern used in the multiple exposure printing system.
1. A method comprising:
receiving data representing a number of polygons that define a target pattern of features to be printed on a wafer with a first mask and a second mask;
using a computer, analyzing the data to locate first features, or portions thereof, which are oriented in a first direction;
analyzing the data to locate second features, or portions thereof, which are not oriented in the first direction;
creating data for the first mask by expanding polygons corresponding to the first features, or portions thereof, but not expanding polygons corresponding to the second features, or portions thereof, wherein the expanding is calculated to create a shield for the first features when printing on the wafer using the first mask; and
creating data for the second mask by expanding polygons corresponding to the second features, or portions thereof, but not expanding polygons corresponding to the first features, or portions thereof, wherein the expanding is calculated to create a shield for the second features when printing on the wafer using the second mask.
2. The method of claim 1 , further comprising performing optical and process correction (OPC) on the modified data.
3. The method of claim 2 , wherein the analyzing the data to locate the second features, or portions thereof, further comprises analyzing the data to locate the line ends of the second features, or portions thereof, and
wherein the modifying the data further comprises extending the line ends prior to performing OPC.
4. The method of claim 1 , wherein the expanded polygons are expanded by a substantially identical amount.
5. The method of claim 1 , further comprising storing the modified data in a computer-readable storage device.
6. The method of claim 1 , further comprising using the modified data to manufacture a mask.
7. A computer-readable storage device storing the modified data produced by the method of claim 1 .
8. A mask for use in a photolithographic printing system designed at least in part by the method of claim 1 .
9. The method of claim 1 , wherein:
the target pattern of features comprises two or more edge fragments to be printed on the wafer with the first mask and the second mask; and
the two or more edge fragments are mapped to a single corresponding location on the wafer.
10. The method of claim 1 , wherein:
the first features, or portions thereof, comprise a first edge fragment;
the second features, or portions thereof, comprise a second edge fragment;
the expanding polygons corresponding to the first features, or portions thereof, further comprises mapping the first edge fragment to a single corresponding location on the wafer; and
the expanding polygons corresponding to the second features, or portions thereof, further comprises mapping the second edge fragment to the single corresponding location on the wafer.
11. A computer-readable storage device storing a sequence of program instructions that cause a computer to perform a method, the method comprising:
receiving data representing a number of polygons that define a target pattern of features to be printed on a wafer with a first mask and a second mask;
analyzing the data to locate second features, or portions thereof, which are oriented in a first direction;
analyzing the data to locate first features, or portions thereof, which are not oriented in the first direction;
creating data for the first mask by expanding polygons corresponding to the first features, or portions thereof, but not expanding polygons corresponding to the second features, or portions thereof, wherein the expanding is calculated to create a shield for the first features when printing on the wafer using the first mask; and
creating data for the second mask by expanding polygons corresponding to the second features, or portions thereof, but not expanding polygons corresponding to the first features, or portions thereof, wherein the expanding is calculated to create a shield for the second features when printing on the wafer using the second mask.
12. The computer-readable storage device of claim 11 , wherein the method further comprises performing optical and process correction (OPC) on the modified data.
13. The computer-readable storage device of claim 12 , wherein the analyzing the data to locate the second features, or portions thereof, comprises analyzing the data to locate the line ends of the second features, or portions thereof, and
wherein the modifying the data comprises extending the line ends prior to performing OPC.
14. The computer-readable storage device of claim 11 , wherein the expanded polygons are expanded by a substantially identical amount.
15. The computer-readable storage device of claim 11 , wherein:
the target pattern of features comprises two or more edge fragments to be printed on the wafer with the first mask and the second mask; and
the two or more edge fragments are mapped to a single corresponding location on the wafer.
16. The computer-readable storage device of claim 11 , wherein:
the first features, or portions thereof, comprise a first edge fragment;
the second features, or portions thereof, comprise a second edge fragment;
the expanding polygons corresponding to the first features, or portions thereof, further comprises mapping the first edge fragment to a single corresponding location on the wafer; and
the expanding polygons corresponding to the second features, or portions thereof, further comprises mapping the second edge fragment to the single corresponding location on the wafer.