Substrate processing apparatus

1. A substrate processing apparatus that is arranged adjacent to an exposure device, comprising:

a processing section for subjecting a substrate to processing; and

an interface that transfers and receives the substrate between said processing section and said exposure device,

said interface including

first and second transport units that transport the substrate,

a cleaning processing unit that subjects the substrate to cleaning processing before exposure processing by said exposure device,

a drying processing unit that subjects the substrate to drying processing after the exposure processing by said exposure device, and

a platform on which the substrate is temporarily placed, wherein

said first transport unit is configured to transport the substrate among said processing section, said cleaning processing unit, and said platform,

said second transport unit is configured to transport the substrate among said platform, said exposure device, and said drying processing unit,

said platform includes

a temperature control waiting unit configured to make the substrate wait while keeping the substrate at a predetermined temperature, and

a substrate platform on which the substrate is placed, and

said first and second transport units are configured to transport the substrate before the exposure processing by said exposure device such that the substrate waits in said temperature control waiting unit, and transport the substrate after the exposure processing by said exposure device such that the substrate is placed on said substrate platform.

2. The substrate processing apparatus according to claim 1 , wherein said cleaning processing unit subjects the substrate to the drying processing after subjecting the substrate to the cleaning processing.

3. The substrate processing apparatus according to claim 1 , wherein said drying processing unit subjects the substrate to the cleaning processing before subjecting the substrate to the drying processing.

4. The substrate processing apparatus according to claim 1 , wherein

said processing section, said interface, and said exposure device are arranged side by side in a first direction,

said interface has at least one side surface in a second direction perpendicular to said first direction within a horizontal plane, and

said drying processing unit is arranged on the side of said one side surface within said interface.

5. The substrate processing apparatus according to claim 4 , wherein

said interface has another side surface opposite to said one side surface in said second direction, and

said cleaning processing unit is arranged on the side of said opposite side surface within said interface.

6. The substrate processing apparatus according to claim 5 , wherein

said platform is arranged in a substantially central portion in said second direction within said interface,

said first transport unit is arranged between said cleaning processing unit and said platform, and

said second transport unit is arranged between said platform and said drying processing unit.

7. The substrate processing apparatus according to claim 4 , wherein

said interface has another side surface opposite to said one side surface in said second direction,

said first transport unit is arranged on the side of said opposite side surface within said interface,

said cleaning processing unit and said platform are stacked in a substantially central portion in said second direction within said interface, and

said second transport unit is arranged in an area from said cleaning processing unit and said platform to said drying processing unit.

8. The substrate processing apparatus according to claim 1 , wherein

said second transport unit includes first and second holders that each hold the substrate,

said first holder holding the substrate when the substrate is transported before the exposure processing by said exposure device and after the drying processing by said drying processing unit, and

said second holder holding the substrate when the substrate after said exposure processing is transported from said exposure device to said drying processing unit.

9. The substrate processing apparatus according to claim 8 , wherein said second holder is provided below said first holder.

10. The substrate processing apparatus according to claim 1 , wherein

said interface further includes an edge exposure unit that exposes a peripheral portion of the substrate, and

said first transport unit transports the substrate among said processing section, said edge exposure unit, said cleaning processing unit, and said platform.