OPC conflict identification and edge priority system
View Patent ↗An integrated circuit verification system provides an indication of conflicts between an OPC suggested correction and a manufacturing rule. The indication specifies which edge segments are in conflict so that a user may remove the conflict to achieve a better OPC result. In another embodiment of the invention, edge segments are assigned a priority such that the correction of a lower priority edge does not hinder a desired OPC correction of a higher priority edge.
1. A method of performing optical and process correction (OPC) on an integrated circuit (IC) layout, the method comprising:
determining a pair of edge segments in an IC layout design that will cause a conflict with a manufacturing rule if one or both edge segments of the pair of edge segments receives a desired OPC correction;
using a computer, assigning each of the edge segments of the pair of edge segments different priority levels, wherein the different priority levels are assigned as a result of the determining; and
generating one or more OPC corrections for the pair of edge segments, wherein the OPC correction of a lesser priority edge segment does not prevent a desired OPC correction of a higher priority edge segment.
2. The method of claim 1 , wherein the generating the one or more OPC corrections comprises generating OPC corrections on lower priority edge segments after higher priority edge segments.
3. The method of claim 1 , further comprising assigning a less than desired OPC correction to one or more lower priority edge segments so that one or more higher priority edge segments can be assigned an OPC correction that is or is close to the desired OPC correction.
4. The method of claim 1 , wherein the priority levels are assigned as a function of each edge segment's position in a circuit feature.
5. The method of claim 1 , wherein the priority levels are assigned as a function of each edge segment's expected edge position error.
6. The method of claim 1 , wherein the priority levels are assigned by searching a knowledge base for similar layout patterns that have been previously assigned priority levels.
7. The method of claim 1 , wherein the priority levels are assigned as a function of the type of feature being corrected.
8. The method of claim 1 , further comprising storing corrected layout data in a computer readable storage device, the corrected layout data being based on the generated OPC corrections.
9. The method of claim 1 , further comprising producing an integrated circuit using a mask or reticle designed according to the corrected layout data.
10. One or more computer-readable media storage devices storing a sequence of program instructions that when executed by a computer, cause the computer to perform a method of performing optical and process correction (OPC) on an integrated circuit (IC) layout, the method comprising:
determining a pair of edge segments in an IC layout design that will cause a conflict with a manufacturing rule if one or both edge segments of the pair of edge segments receives a desired OPC correction;
assigning each of the edge segments of the pair of edge segments different priority levels, wherein the different priority levels are assigned as a result of the determining; and
generating one or more OPC corrections, such that the OPC correction of a lesser priority edge segment does not prevent a desired OPC correction of a higher priority edge segment.
11. The computer-readable storage devices of claim 10 , wherein the generating the one or more OPC corrections comprises generating OPC corrections on lower priority edge segments after higher priority edge segments.
12. The computer-readable storage devices of claim 10 , wherein the method further comprises assigning a less than desired OPC correction to one or more lower priority edge segments so that one or more higher priority edge segments can be assigned an OPC correction that is or is close to the desired OPC correction.
13. The computer-readable storage devices of claim 10 , wherein the priority levels are assigned as a function of each edge segment's position in a circuit feature.
14. The computer-readable storage devices of claim 10 , wherein the priority levels are assigned as a function of each edge segment's expected edge position error.
15. The computer-readable storage devices of claim 10 , wherein the priority levels are assigned by searching a knowledge base for similar layout patterns that have been previously assigned priority levels.
16. The computer-readable storage devices of claim 10 , wherein the priority levels are assigned as a function of the type of feature being corrected.
17. A system for performing optical and process correction (OPC) on an integrated circuit (IC) layout, comprising:
means for reading at least a portion of an IC layout design;
means for determining a pair of edge segments in the IC layout design that will cause a conflict with a manufacturing rule if one or both edge segments of the pair of edge segment receives a desired OPC correction;
means for assigning each of the edge segments of the pair of edge segments different priority levels, wherein the different priority levels are assigned based on the determining; and
generating corrections such that the OPC correction of a lesser priority edge segment does not prevent a desired OPC correction of a higher priority edge segment.