Capacitor and its manufacturing method

1. A method for manufacturing a piezoelectric element, the method, comprising:

forming a conductive layer that directly contacts a base substrate;

forming a dielectric layer above the conductive layer;

forming a second conductive layer above the dielectric layer;

forming a first lanthanum nickelate layer above the dielectric layer;

etching a part of the first lanthanum nickelate layer to form a mask;

patterning the second conductive layer and the dielectric layer by using the mask; and

removing the mask after the patterning of the second conductive layer and the dielectric layer.

2. The method for manufacturing a piezoelectric element according to claim 1 , wherein the dielectric layer is formed to be composed of a perovskite oxide expressed by a general formula ABO 3 , wherein A is formed to include lead (Pb), and B is formed to include at least one of zirconium (Zr) and titanium (Ti).

3. The method for manufacturing a piezoelectric element according to claim 1 , comprising the step of applying plasma processing to at least the first lanthanum nickelate layer, after the step of patterning.

4. The method for manufacturing a piezoelectric element according to claim 1 , comprising the step of forming a second lanthanum nickelate layer, before the step of forming the dielectric layer, wherein the step of patterning is conducted until the second lanthanum nickelate layer is exposed.

5. The method for manufacturing a piezoelectric element according to claim 4 , comprising, after the step of patterning, the step of removing at least a portion of at least one of the first lanthanum nickelate layer and the second lanthanum nickelate layer.

6. A method of manufacturing an actuator comprising the method of manufacturing a piezoelectric as defined in claim 1 .

7. A method of manufacturing an ink jet head comprising the method of manufacturing a piezoelectric as defined in claim 1 .