Gallium nitride-based semiconductor stacked structure
A gallium-nitride-based semiconductor stacked structure includes a sapphire substrate; a low-temperature-deposited buffer layer which is composed of a Group III nitride material of Al X Ga Y N (0.5<Y≦1, X+Y=1) containing gallium (Ga) in a predominant amount with respect to aluminum (Al), which has been grown at low temperature and which is provided in a junction area thereof joined to a (0001) plane (c-plane) of the sapphire substrate with a single crystal in an as-grown state; and a gallium-nitride (GaN)-based semiconductor layer formed on the low-temperature-deposited buffer layer. The low-temperature-deposited buffer layer is predominantly composed of an as-grown single crystal which has a [1.0.−1.0.] orientation parallel to a [2.−1.−1.0.] direction of a lattice forming a (0001) basal plane of the sapphire substrate.
1. A method for forming a gallium-nitride-based semiconductor stacked structure comprising the steps of:
providing a sapphire substrate;
forming, on the sapphire substrate, a low-temperature-deposited buffer layer which is composed of a Group III nitride material of Al X Ga Y N (0.5<Y≦1, X+Y=1) containing gallium (Ga) in a predominant amount with respect to aluminum (Al) and which is provided in a junction area thereof joined to a (0001) plane (c-plane) of the sapphire substrate with a single crystal in an as-grown state; and
forming a gallium-nitride-based semiconductor layer on the low-temperature-deposited buffer layer;
wherein the low-temperature-deposited buffer layer is formed on the (0001) plane of the sapphire substrate in such a manner that the junction area is predominantly formed of an as-grown single crystal which has a [1.0.−1.0.] orientation parallel to a [2.−1.−1.0.] direction of a lattice forming the (0001) plane of the sapphire substrate,
wherein the as-grown single crystal which is contained in the low-temperature-deposited buffer layer and which predominantly forms the junction area joined to the sapphire substrate has a thickness of 1 nm or more when formation of the low-temperature-deposited buffer layer has been completed.
2. A method for forming a gallium-nitride-based semiconductor stacked structure according to claim 1 , wherein the low-temperature-deposited buffer layer is formed on the (0001) plane of the sapphire substrate at 350° C. to 450° C.
3. A method for forming a gallium-nitride-based semiconductor stacked structure according to claim 1 , wherein the low-temperature-deposited buffer layer is formed on the (0001) plane of the sapphire substrate at a growth rate of 1 nm/min to 3 nm/min.
4. A method for forming a gallium-nitride-based semiconductor stacked structure comprising the steps of:
providing a sapphire substrate;
forming, on the sapphire substrate, a low-temperature-deposited buffer layer which is composed of a Group III nitride material of Al X Ga Y N (0.5<Y≦1, X+Y=1) containing gallium (Ga) in a predominant amount with respect to aluminum (Al) and which is provided in a junction area thereof joined to a (0001) plane (c-plane) of the sapphire substrate with a single crystal in an as-grown state; and
forming a gallium-nitride-based semiconductor layer on the low-temperature-deposited buffer layer;
wherein the low-temperature-deposited buffer layer is formed on the (0001) plane of the sapphire substrate in such a manner that the junction area is predominantly formed of an as-grown single crystal which has a [1.0.−1.0.] orientation parallel to a [2.−1.−1.0.] direction of a lattice forming the (0001) plane of the sapphire substrate, and
wherein the low-temperature-deposited buffer layer is formed on the (0001) plane of the sapphire substrate at a growth rate of 1 nm/min to 3 nm/min controlled through regulation of an amount, per unit time, of a Group III element source including gallium or aluminum supplied to a growth reaction system for growing the low-temperature-deposited buffer layer.