Fabrication method and fabrication apparatus of group III nitride crystal substance
A fabrication method of a group III nitride crystal substance includes the steps of cleaning the interior of a reaction chamber by introducing HCl gas into the reaction chamber, and vapor deposition of a group III nitride crystal substance in the cleaned reaction chamber. A fabrication apparatus of a group III nitride crystal substance includes a configuration to introduce HCl gas into the reaction chamber, and a configuration to grow a group III nitride crystal substance by HVPE. Thus, a fabrication method of a group III nitride crystal substance including the method of effectively cleaning deposits adhering inside the reaction chamber during crystal growth, and a fabrication apparatus employed in the fabrication method are provided.
1. A fabrication method of a group III nitride crystal substance, the method comprising steps of:
cleaning an interior of a reaction chamber by introducing HCl gas into the reaction chamber; and
vapor deposition of a group III nitride crystal substance in the cleaned reaction chamber,
wherein the step of cleaning the interior of the reaction chamber being carried out under conditions of at least 1.013 hPa and not more than 1013 hPa for HCl gas partial pressure and at least 650° C. and not more than 1200° C. for a temperature in the reaction chamber.
2. A fabrication apparatus of a group III nitride crystal substance employed in a fabrication method including steps of cleaning an interior of a reaction chamber by introducing a HCl gas into the reaction chamber and vapor deposition of a group III nitride crystal substance in the cleaned reaction chamber, the apparatus comprising:
a group III element raw material gas generation chamber,
a HCl gas introduction pipe to introduce HCl gas into said reaction chamber,
a HCl gas introduction pipe to introduce HCl gas into said group III element raw material gas generation chamber,
a group III element raw material gas introduction pipe to introduce into said reaction chamber group III raw material gas generated at said group III element raw material gas generation chamber,
a nitride raw material gas introduction pipe to introduce nitrogen raw material gas into said reaction chamber,
a gas exhaust pipe to discharge gas from said reaction chamber, and
a substrate holder to dispose an underlying substrate for growing a group III nitride crystal substance in said reaction chamber, wherein
said reaction chamber being formed in a reactor tube.
3. The fabrication apparatus for a group III nitride crystal substance according to claim 2 , wherein
said reaction chamber includes a crystal growth zone qualified as a region in proximity to said substrate holder, and
a protection member of said reaction chamber is arranged on an inner wall of said reactor tube at said crystal growth zone.
4. The fabrication apparatus for a group III nitride crystal substance according to claim 2 , wherein a device to trap ammonium chloride is attached at an inlet and/or outlet of said gas exhaust pipe.