High temperature ALD inlet manifold
View Patent ↗A system and method for distributing one or more gases to an atomic layer deposition (ALD) reactor. An integrated inlet manifold block mounted over a showerhead assembly includes high temperature (up to 200° C.) rated valves mounted directly thereto, and short, easily purged reactant lines. Integral passageways and metal seals avoid o-rings and attendant dead zones along flow paths. The manifold includes an internal inert gas channel for purging reactant lines within the block inlet manifold
1. An atomic layer deposition (ALD) device, comprising:
a dispersion assembly configured to disperse gas;
an inlet manifold block mounted over the dispersion assembly and having a bore, an internal inert gas channel, a first internal reactant line, and a second internal reactant line, the first and second internal reactant lines being in flow communication with the bore;
a first reactant valve mounted on the inlet manifold block and configured to control a supply of a first reactant gas to the first internal reactant line;
a first inert gas valve mounted on the inlet manifold block and configured to control a supply of an inert gas from the internal inert gas channel to the first reactant valve;
a second reactant valve coupled to the inlet manifold block and configured to control a supply of a second reactant gas to the second internal reactant line; and
a second inert gas valve mounted on the inlet manifold block and configured to control a supply of the inert gas from the internal inert gas channel to the second reactant valve.
2. The ALD device of claim 1 further comprising a controller configured to control the first reactant valve and the second reactant valve.
3. The ALD device of claim 1 , wherein the controller alternates the supply of the first reactant gas and the second reactant gas to the bore.
4. The ALD device of claim 1 , wherein the dispersion assembly comprises a showerhead assembly having an exhaust passage.
5. The ALD device of claim 1 further comprising a spacer block, the spacer block being disposed between the first reactant valve and the inlet manifold block.
6. The ALD device of claim 5 , wherein the spacer block comprises a base plate and a cap.
7. The ALD device of claim 1 further comprising a spacer block, the spacer block being disposed between the first inert gas valve and the inlet manifold block.
8. The ALD device of claim 1 , wherein the distance between the first reactant valve and the inlet manifold block is about 10 mm.
9. The ALD device of claim 8 , wherein the first internal reactant line is angled relative to a centerline through the conically shaped bore so as to promote swirling of the first reactant gas in the bore.
10. The ALD device of claim 1 , wherein at least a portion of the bore has a conical shape.
11. The ALD device of claim 1 , wherein the first internal reactant line has no o-rings between the first reactant valve and the inlet manifold block.
12. The ALD device of claim 1 , wherein the first and second reactant valves and the first and second inert gas valves are rated for operation at a temperature of at least 200° C.