Method and System for Wafer Temperature Control
Systems and methods for controlling the temperature of a wafer are disclosed. These systems and methods may employ a back side wafer pressure control system (BSWPC) that includes subsystems and a controller operable in tandem to control the temperature of wafers in one or more process chambers. The subsystems may include mechanical components for controlling a flow of gas to the backside of a wafer while the controller may be utilized to control these mechanical components in order to control wafer temperature in a process chamber. Furthermore, embodiments of these systems and methods may also use a chiller in combination with the controller to provide both coarse and fine temperature control.
1 . A method of controlling the temperature of a wafer in a process chamber, comprising:
sensing a plurality of process variables associated with a process chamber, the plurality of process variables including at least one process variable indicative of the temperature of a wafer;
calculating an error utilizing a setpoint and the plurality of process variables; and
controlling a pressure of a gas outlet onto a wafer based on the error.
2 . The method of claim 1 , further comprising controlling a chiller based on the error.
3 . The method of claim 2 , further comprising calculating a control signal for the chiller based on the error.
4 . The method of claim 2 , wherein controlling the pressure of a gas comprises controlling a pressure control device.
5 . The method of claim 4 , wherein the pressure control device comprises a fixed orifice.
6 . The method of claim 5 , wherein the pressure control device comprises a throttling orifice.
7 . The method of claim 4 , further comprising calculating a control signal for the pressure control device.
8 . The method of claim 2 , wherein the process variables comprise a point of use (POU) pressure, a mass flow and an upstream pressure.
9 . The method of claim 8 , wherein the mass flow has been corrected using a curve fitting algorithm.
10 . The method of claim 2 , wherein calculating an error comprises modifying each of the process variables with a coefficient.
11 . The method of claim 10 , wherein calculating an error is done using a first order heat transfer equation.
12 . The method of claim 10 , wherein calculating an error is done using an equation of the form: E(t)=setpoint−K 1 *POU_Pressure−K 2 *Mass_Flow−K 3 *Wafer_Temp−K 4 *Up_Pressure.
13 . A system for controlling the temperature of a wafer in a process chamber, comprising:
a temperature sensor for sensing data related to a temperature of a wafer;
a subsystem operable to regulate a pressure of a gas outlet onto the wafer; and
a control system operable to calculate an error utilizing a setpoint and a plurality of process variables, including the data related to the temperature of the wafer, and to control the subsystem based on the error.
14 . The system of claim 13 , further comprising a chiller, wherein the control system is further operable to control the chiller based on the error.
15 . The system of claim 14 , wherein the control system and the subsystem are integrated.
16 . The system of claim 14 , wherein the control system and the subsystem are distributed.
17 . The system of claim 14 , wherein the control system is further operable to calculate a control signal for the chiller based on the error.
18 . The system of claim 17 , wherein the subsystem comprises a pressure control device.
19 . The system of claim 18 , wherein the pressure control device comprises a fixed orifice.
20 . The system of claim 19 , wherein the pressure control device comprises a throttling orifice.
21 . The system of claim 18 , wherein the controller is further operable to calculate a control signal for the pressure control device.
22 . The system of claim 21 , further comprising a point of use (POU) pressure sensor, a mass flow sensor and an upstream pressure sensor.
23 . The system of claim 22 , wherein the pressure control device comprises the POU pressure sensor.
24 . The system of claim 18 , wherein calculating an error comprises modifying each of the process variables with a coefficient.
25 . The system of claim 24 , wherein calculating an error is done using a first order heat transfer equation.
26 . The system of claim 24 , wherein calculating an error is done using an equation of the form: E(t)=setpoint−K 1 *POU_Pressure−K 2 *Mass_Flow−K 3 *Wafer_Temp−K 4 *Up_Pressure.
27 . A system for controlling the temperature of a wafer in a process chamber comprising:
a plurality of temperature sensors, each temperature sensor operable for sensing data related to a temperature of a wafer in a respective process chamber of a plurality of process chambers;
a chiller; and
an integrated back side wafer pressure control system comprising:
a plurality of subsystems, each subsystem associated with a respective process chamber and comprising a pressure controller device operable to regulate a pressure of a gas outlet onto the wafer in the respective process chamber, and
a control system operable to calculate an error corresponding to one or more of the plurality of process chambers utilizing a setpoint and a plurality of process variables associated with the one or more process chambers, including the data related to the temperature of the wafer in the one or more process chambers, and further operable to control the subsystem associated with the one or more process chambers and the chiller based on the calculated error.
28 . A method of controlling the temperature of a wafer in a process chamber, comprising:
sensing a plurality of process variables associated with a process chamber, including data related to the temperature of the wafer, a pressure of gas at the backside of the wafer and a flow of gas to the wafer chuck;
calculating an error utilizing a setpoint and the plurality of process variables; and
controlling a pressure of a gas outlet onto the wafer based on the error.
29 . The method of claim 28 , wherein the data related to the temperature of the wafer includes at least one of a temperature of a chuck, a temperature of the gas and a plasma power.
30 . The system of claim 13 , wherein the plurality of process variables further includes a flow rate of the gas.
31 . The system of claim 30 , wherein the plurality of process variables further includes a power supplied to a plasma.
32 . The method of claim 28 , further comprising controlling a chiller based on the error.
33 . The method of claim 1 , wherein the plurality of process variables further includes a flow rate of the gas.
34 . The method of claim 33 , wherein the plurality of process variables further includes a power supplied to a plasma.
35 . The system of claim 13 , wherein the plurality of process variables further includes a power supplied to a plasma.
36 . The system of claim 14 , wherein the plurality of process variables further includes a flow rate of the gas.
37 . The system of claim 14 , wherein the plurality of process variables further includes a power supplied to a plasma.
38 . The system of claim 27 , wherein the plurality of process variables further includes a flow rate of the gas.
39 . The system of claim 27 , wherein the plurality of process variables further includes a power supplied to a plasma.
40 . The method of claim 1 , wherein the plurality of process variables further includes a power supplied to a plasma.
41 . The method of claim 2 , wherein the plurality of process variables further includes a flow rate of the gas.
42 . The method of claim 2 , wherein the plurality of process variables further includes a power supplied to a plasma.
43 . The method of claim 28 , wherein the plurality of process variables further includes a power supplied to a plasma.
44 . The method of claim 28 , wherein the plurality of process variables further includes a flow rate of the gas.
45 . The method of claim 32 , wherein the plurality of process variables further includes a flow rate of the gas.
46 . The method of claim 32 , wherein the plurality of process variables further includes a power supplied to a plasma.
47 . A method of controlling a temperature of a wafer in a process chamber, comprising:
sensing a plurality of process variables associated with the process chamber, the plurality of process variables including at least one process variable indicative of the temperature of the wafer;
calculating an error utilizing a setpoint and the plurality of process variables; and
controlling at least one of a pressure and a flow rate of a gas outlet onto the wafer based upon the error.
48 . The method of claim 48 , wherein controlling at least one of a pressure and a flow rate of a gas outlet onto the wafer based upon the error includes controlling both the pressure and the flow rate of the gas outlet onto the wafer based upon the error.
49 . The method of claim 48 , wherein the setpoint is one of a temperature setpoint, a pressure setpoint, and a flow rate setpoint.
50 . A system for controlling a temperature of a wafer in a process chamber, comprising:
a temperature sensor for sensing data related to the temperature of the wafer;
a subsystem operable to regulate at least one of a pressure and a flow rate of a gas outlet onto the wafer; and
a control system operable to calculate an error utilizing a setpoint and a plurality of process variables, including the data related to the temperature of the wafer, and to control the subsystem based upon the error.
51 . The system of claim 50 , wherein the subsystem is operable to regulate both the pressure and the flow rate of the gas outlet onto the wafer.
52 . The system of claim 50 , wherein the setpoint is one of a temperature setpoint, a pressure setpoint, and a flow rate setpoint.