Developing apparatus and developing method
View Patent ↗A joint nozzle that delivers a developer, a rinsing liquid and nitrogen gas is disposed adjacent the spin center of a substrate in plan view. A controller operates electromagnetic switch valves to continue supply of the developer, while spinning the substrate, in a developing process, and to start supply of the rinsing liquid in a rinsing process, immediately after the supply of the developer ends, thereby achieving a shortened period of the developing process. A switching is made to a drying process by starting supply of the nitrogen gas immediately after completion of the rinsing process. Thus, even if the substrate has a large angle of contact, formation of droplets of the rinsing liquid is inhibited to prevent post-develop defects.
1. A developing apparatus for developing a substrate, comprising:
a spin-support device for rotatably supporting the substrate;
a developer nozzle for supplying a developer to the substrate;
a rinsing liquid nozzle for supplying a rinsing liquid to the substrate;
an inert gas nozzle for supplying an inert gas to the substrate;
wherein said developer nozzle is integrated with said rinsing liquid nozzle and said inert gas nozzle; and
a control device programmed for controlling spinning of the substrate and supply of the developer, the rinsing liquid and the inert gas;
wherein said rinsing liquid nozzle and said inert gas nozzle are juxtaposed in a position adjacent a spin center of the substrate in plan view, and
wherein said control device starts supplying the inert gas to adjacent the spin center after supplying the rinsing liquid to adjacent the spin center of the substrate being spun, and while a film of the rinsing liquid is present on the substrate, whereby the supplied inert gas breaks the film of the rinsing liquid.
2. An apparatus as defined in claim 1 , further comprising a driving device for slightly moving said inert gas nozzle adjacent the spin center of the substrate in plan view.
3. An apparatus as defined in claim 2 , wherein said driving device is arranged to move slightly also said rinsing liquid nozzle adjacent the spin center of the substrate in plan view.
4. An apparatus as defined in claim 3 , wherein said driving device is arranged to move slightly also said developer nozzle adjacent the spin center of the substrate in plan view.
5. An apparatus as defined in claim 1 , wherein:
said developer nozzle is juxtaposed with said rinsing liquid nozzle in said position adjacent the spin center of the substrate in plan view when said rinsing liquid nozzle is disposed adjacent the spin center of the substrate in plan view; and
said control device is arranged, while spinning the substrate, to switch instantly from the supply of the developer to adjacent the spin center to the supply of the rinsing liquid to adjacent the spin center.
6. An apparatus as defined in claim 1 , wherein said rinsing liquid nozzle and said inert gas nozzle are integrated with each other.
7. An apparatus as defined in claim 1 , wherein the rinsing liquid is a solution including a surfactant.
8. An apparatus as defined in claim 1 , further comprising a temperature control device disposed around said developer nozzle and said rinsing liquid nozzle for adjusting temperature of both the developer in said developer nozzle and the rinsing liquid in said rinsing liquid nozzle.
9. A developing apparatus for developing a substrate, comprising:
a spin-support device for rotatably supporting the substrate;
a developer nozzle for supplying a developer to the substrate;
a rinsing liquid nozzle for supplying a rinsing liquid to the substrate;
an inert gas nozzle for supplying an inert gas to the substrate;
wherein said developer nozzle is integrated with said rinsing liquid nozzle and said inert gas nozzle; and
a control device programmed for controlling spinning of the substrate and supply of the developer, the rinsing liquid and the inert gas;
wherein said rinsing liquid nozzle and said inert gas nozzle are mutually separated but both directed to a position adjacent a spin center of the substrate, and
wherein said control device starts supplying the inert gas to adjacent the spin center after supplying the rinsing liquid to adjacent the spin center of the substrate being spun, and while a film of the rinsing liquid is present on the substrate, whereby the supplied inert gas breaks the film of the rinsing liquid.
10. An apparatus as defined in claim 9 , wherein:
said developer nozzle is also directed to said position adjacent the spin center of the substrate when said rinsing liquid nozzle is directed to said position adjacent the spin center of the substrate; and
said control device is arranged, while spinning the substrate, to switch instantly from the supply of the developer to adjacent the spin center to the supply of the rinsing liquid to adjacent the spin center.
11. An apparatus as defined in claim 9 , wherein said rinsing liquid nozzle and said inert gas nozzle are integrated with each other.
12. An apparatus as defined in claim 9 , wherein the rinsing liquid is a solution including a surfactant.
13. An apparatus as defined in claim 9 , further comprising a temperature control device disposed around said developer nozzle and said rinsing liquid nozzle for adjusting temperature of both the developer in said developer nozzle and the rinsing liquid in said rinsing liquid nozzle.