Pre-bias optical proximity correction
View Patent ↗A pre-bias optical proximity correction (OPC) method allows faster convergence during OPC iterations, providing an initial set of conditions to edge fragments of a layout based on density conditions near the edge fragments.
1. A method of modifying an integrated device layout, comprising:
receiving polygon layout data representing a desired layout design or portion thereof;
designating a number of edge fragments of polygons in the polygon layout data;
determining a density signature of the edge fragments;
scaling the density signature of the edge fragments by a set of calibrated coefficients; and
with a computer, modifying the placement of at least one of the designated edge fragments using the scaled density signature.
2. The method of claim 1 , wherein the calibrated coefficients are determined from density signatures of edge fragments in a test pattern and a set of known OPC corrections to the edge fragments in the test pattern.
3. The method of claim 1 , wherein the density signature for an edge fragment is determined by convolving the edge fragments with a set of radially symmetric functions.
4. The method of claim 3 , wherein at least one of the radially symmetric functions is a top-hat kernel.
5. The method of claim 3 , further comprising defining at least one simulation site corresponding to the one or more edge fragments, the at least one of the radially symmetric functions centered over the at least one simulation site.
6. The method of claim 1 , wherein the density signature for an edge fragment is determined by convolving the edge fragment with a number of concentric top-hat kernels and determining the area of a kernel that is occupied by polygons.
7. The method of claim 1 , wherein the method further comprises determining OPC corrections for the edge fragments in the polygon layout data, and wherein the scaling comprises determining a correlation between the density signature of the edge in the test layout pattern and the OPC correction of the edges, and using the correlation to determine a bias for at least one edge in the desired layout data.
8. The method of claim 1 , wherein the scaling comprises determining at least one bias value.
9. The method of claim 8 , wherein the determining the at least one bias value comprises multiplying at least one density signature value with a corresponding calibrated coefficient.
10. The method of claim 1 , further comprising determining one or more OPC corrections for the edge fragments.
11. The method of claim 1 , further comprising creating a photomask based at least in part on the modified placement of the at least one of the designated edge fragments.
12. The method of claim 11 , further comprising fabricating a chip using the photomask.
13. A computer-readable storage medium storing computer-executable instructions for causing a computer to perform a method of modifying polygon layout data, the method comprising:
receiving the polygon layout data the polygon layout data representing a desired layout design or portion thereof;
designating a number of edge fragments of polygons in the polygon layout data;
determining a density signature of the edge fragments;
scaling the density signature of the edge fragments by a set of calibrated coefficients; and
modifying the placement of at least one of the designated edge fragments using the scaled density signature.
14. The computer-readable storage medium of claim 13 , wherein the calibrated coefficients are determined from density signatures of edge fragments in a test pattern and a set of known OPC corrections to the edge fragments in the test pattern.
15. The computer-readable storage medium of claim 13 , wherein the density signature for an edge fragment is determined by convolving the edge fragments with a set of radially symmetric functions.
16. The computer-readable storage medium of claim 13 , wherein the density signature for an edge fragment is determined by convolving the edge fragment with a number of concentric top-hat kernels and determining the area of a kernel that is occupied by polygons.
17. A system, comprising:
means for receiving polygon layout data representing a desired layout design or portion thereof;
means for designating a number of edge fragments of polygons in the polygon layout data;
means for determining a density signature of the edge fragments;
means for scaling the density signature of the edge fragments by a set of calibrated coefficients; and
means for modifying the placement of at least one of the designated edge fragments using the scaled density signature.