Silicone coating composition
View Patent ↗The present invention relates to a composition comprising: (a) a polymer having at least one repeating unit of formula where R 1 is a non-hydrolysable group and n is an integer ranging from 1 to 3; and (b) a crosslinking catalyst. The composition is useful in forming low k dielectric constant materials and as well as hard mask and underlayer materials with anti-reflective properties for the photolithography industry.
1. A composition comprising:
(a) a polymer having at least one repeating unit of formula
where R 1 is a non-hydrolysable group and n is an integer ranging from 1 to 3 where the polymer is capable of being crosslinked with a crosslinking catalyst and further where the polymer is free of SiOH and SiOR groups where R is alkyl; and (b) a crosslinking catalyst which is selected from a compound having the formula Z + A − and its hydrate, where Z is a cation selected from triarylsubstituted sulfonium, trialkylsubstituted sulfonium and a sulfonium which is substituted with a mixture of aryl and alkyl groups, and A is an anion containing a group selected from monocarboxylate and dicarboxylate.
2. The composition of claim 1 wherein the non-hydrolysable group is selected from hydrogen, substituted alkyl, alkyl, substituted monocycloalkyl, monocycloalkyl, polycycloalkyl, substituted polycycloalkyl, substituted monocyclic aryl, monocyclic aryl, substituted polycyclic aryl, polycyclic aryl, substituted monocyclic aralkyl, monocyclic aralkyl, polycyclic aralkyl, substituted polycyclic aralkyl, carboxy, and carbinol.
3. The composition of claim 1 wherein A is selected from acetate, formate, proprionate, succinate, malonate, monomalonate, adipate.
4. The composition of claim 1 which further comprises one or more of the following: photoacid generator, thermal acid generator, surfactant, and porogen.
5. A method of forming an image on a substrate comprising, a) coating the substrate with the composition of claim 1 ; b) heating the coating of step a); c) forming a coating from a photoresist solution on the coating of step b); d) heating the photoresist coating to substantially remove solvent from the coating; e) image-wise exposing the photoresist coating; f) developing an image using an aqueous alkaline developer; g) optionally, heating the substrate prior to and after development; and h) dry etching the composition of step b).
6. The method of claim 5 wherein the substrate is a carbon-layer/hardmask.
7. The method of claim 5 wherein the substrate is selected from Si, SiO 2 , SiON, SiN, p-Si, α-Si, W, W—Si, Al, Cu, and Al—Si.
8. A coated substrate comprising: a substrate having thereon; a layer of the composition of claim 1 ; and a layer of a positive photoresist composition above the composition.
9. The coated substrate of claim 8 wherein the substrate is a carbon-layer/hardmask.
10. The coated substrate of claim 8 wherein the substrate is selected from Si, SiO 2 , SiON, SiN, p-Si, α-Si, W, W—Si, Al, Cu, and Al—Si.
11. The composition of claim 1 where the non-hydrolysable group is selected from substituted alkyl, alkyl, substituted monocycloalkyl, monocycloalkyl, polycycloalkyl, substituted polycycloalkyl, substituted monocyclic aryl, monocyclic aryl, substituted polycyclic aryl, polycyclic aryl, substituted monocyclic aralkyl, monocyclic aralkyl, polycyclic aralkyl, and substituted polycyclic aralkyl.
12. The composition of claim 1 where the non-hydrolysable group is stable during storage.
13. The composition of claim 1 where the crosslinking catalyst which is selected from a compound having the formula Z + A − and its hydrate, where Z is a cation selected from triphenylsulfonium, (4-t-butylphenyl)diphenylsulfonium, and A is an anion containing a group selected from monocarboxylate and dicarboxylate.