IP Library Granted Patent US 7,528,458
Granted Patent B2
US 7,528,458 · App. 11/681,576 · Granted May 5, 2009

Photodiode having increased proportion of light-sensitive area to light-insensitive area

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Quick Facts
Patent No.
US 7,528,458
App. No.
11/681,576
Granted
May 5, 2009
Kind
B2
Abstract

A photodiode having an increased proportion of light-sensitive area to light-insensitive area includes a semiconductor having a backside surface and a light-sensitive frontside surface. The semiconductor includes a first active layer having a first conductivity, a second active layer having a second conductivity opposite the first conductivity, and an intrinsic layer separating the first and second active layers. A plurality of isolation trenches are arranged to divide the photodiode into a plurality of cells. Each cell has a total frontside area including a cell active frontside area sensitive to light and a cell inactive frontside area not sensitive to light. The cell active frontside area forms at least 95 percent of the cell total frontside area. A method of forming the photodiode is also disclosed.

Claims (21)

1. A photodiode having an increased proportion of light-sensitive area to light-insensitive area comprising:

a semiconductor having a backside surface and a light-sensitive frontside surface and including:

a first active layer having a first conductivity,

a second active layer having a second conductivity opposite the first conductivity, and

an intrinsic layer separating the first and second active layers; and

a plurality of isolation trenches arranged to divide the photodiode into a plurality of cells, each cell having a total frontside area including a cell active frontside area sensitive to light and a cell inactive frontside area not sensitive to light, and the cell active frontside area forming at least 95 percent of the cell total frontside area.

2. The photodiode of claim 1 , wherein:

the isolation trenches together define a trench inactive frontside area;

the frontside surface of the semiconductor has a total area including a semiconductor active area equal to the sum of each cell active frontside area and a semiconductor inactive area including each cell inactive frontside area and the trench inactive frontside area; and

the semiconductor active area forms at least 90 percent of the semiconductor total area.

3. The photodiode of claim 1 , wherein each cell includes a via having a via frontside area forming a portion of the cell inactive frontside area and a frontside electrical contact having a electrical contact frontside area also forming a portion of the cell inactive frontside area.

4. The photodiode of claim 3 , wherein the electrical contact frontside area is less than 4 percent of the cell total frontside area.

5. The photodiode of claim 3 , wherein the via frontside area is less than 2 percent of the cell total frontside area.

6. The photodiode of claim 3 , wherein each via has a ratio of a length of the via to a diameter of the via equal to at least 7.0.

7. The photodiode of claim 3 , wherein the frontside electrical contact has a length in a direction substantially parallel to the frontside surface and extending between the via and a connection to the second active layer, the length being no greater than three times a diameter of the via.

8. The photodiode of claim 1 , wherein each isolation trench has a ratio of a depth of the isolation trench to a width of the isolation trench equal to at least 5.0.

9. The photodiode of claim 1 , further comprising at least one cathode contact pad and at least one anode contact pad positioned on the semiconductor backside surface.

10. The photodiode of claim 1 , wherein the first conductivity is one of p-type and n-type, and the second conductivity is the other one of p-type and n-type.

11. The photodiode of claim 1 , wherein the first active layer is one of cathodic and anodic and the second active layer is the other one of cathodic and anodic.

12. The photodiode of claim 1 , wherein each isolation trench is substantially linear in shape along the depth of the trench and has a longitudinal axis extending in a direction of the depth.

13. The photodiode of claim 12 , wherein the isolation trench longitudinal axes are substantially perpendicular to the frontside surface.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 8, 2009
From: ICEMOS TECHNOLOGY CORPORATION
To: ICEMOS TECHNOLOGY LTD.
Reel/Frame 022076/0237 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 17, 2007
From: WILSON, ROBIN; BROGAN, CONOR; GRIFFIN, HUGH J.; MACNAMARA, CORMAC
To: ICEMOS TECHNOLOGY CORPORATION
Reel/Frame 019308/0988 →