Semiconductor device and method of manufacturing the same
View Patent ↗A semiconductor device includes a first copper-containing conductive film formed on a substrate, insulating films formed on the first copper-containing conductive film with a concave portion reaching the first copper-containing conductive film, a second barrier insulating film formed to cover the side wall of the concave portion of these insulating films, a second adhesive alloy film made of copper and a dissimilar element other than copper, and coming in contact with the first copper-containing conductive film at the bottom surface of the concave portion and in contact with the second barrier insulating film at the side wall of the concave portion to cover the inside wall of the concave portion, and a second copper-containing conductive film containing copper as a main component, and formed on the second adhesive alloy film in contact with the second adhesive alloy film to fill the concave portion.
1. A semiconductor device, comprising:
a lower layer conductive film formed on a substrate;
an interlayer insulating film formed on said lower layer conductive film, said interlayer insulating film consisting of a multi-layer structure and includes an opening that reaches said lower layer conductive film;
a barrier insulating film formed to cover the only entire side wall of said opening in said interlayer insulating film, said barrier insulating film includes a material capable of preventing copper from being diffused;
an alloy film made of copper and a dissimilar element other than copper, said alloy film directly contacts said lower layer conductive film at the bottom surface of said opening and said alloy film is in contact with said barrier insulating film at the side wall of said opening in order to cover the inside wall of said opening; and
an upper layer conductive film containing copper as a main component, said upper layer conductive film is formed on said alloy film in contact with said alloy film to fill the opening,
wherein said barrier insulating film is a SiN film consisting of Si and N or a SiCN film.
2. The semiconductor device as set forth in claim 1 , wherein said alloy film contains, as said dissimilar element, at least one element which is also contained in said barrier insulating film.
3. The semiconductor device as set forth in claim 1 , wherein said barrier insulating film and said alloy film contain silicon.
4. The semiconductor device as set forth in claim 1 , wherein said alloy film is a copper silicide layer.
5. The semiconductor device as set forth in claim 1 , wherein said alloy film is made of an alloy of copper and at least one metal selected from among Hf, Ta, Ti, Nb and Zr.
6. The semiconductor device as set forth in claim 1 , wherein said alloy film is formed to have a substantial uniform composition rate of said copper and said dissimilar element from the boundary with said upper layer conductive film to the boundary with said barrier insulating film.
7. The semiconductor device as set forth in claim 1 , wherein said barrier insulating film is made of a material which contains substantially no oxygen.
8. A semiconductor device, comprising:
an interlayer insulating film formed on said lower layer conductive film, said interlayer insulating film consisting of a multi-layer structure and including an opening that reaches said lower layer conductive film;
a barrier insulating film formed covering the only entire side wall of said opening in said interlayer insulating film, said barrier insulating film including a material capable of preventing copper from being diffused;
an alloy film made of copper and a dissimilar element other than copper, said alloy film directly contacting said lower layer conductive film at the bottom surface of said opening and said alloy film in contact with said barrier insulating film at the side wall of said opening in order to cover the inside wall of said opening; and
an upper layer conductive film containing copper as a main component, said upper layer conductive film formed on said alloy film in contact with said alloy film to fill the opening wherein said barrier insulating film is a SiN film consisting of Si and N or a SiCN film.
9. The semiconductor device as set forth in claim 8 , wherein said alloy film contains, as said dissimilar element, at least one element which is also contained in said barrier insulating film.
10. The semiconductor device as set forth in claim 8 , wherein said barrier insulating film and said alloy film contain silicon.
11. The semiconductor device as set forth in claim 8 , wherein said alloy film is a copper silicide layer.
12. The semiconductor device as set forth in claim 8 , wherein said alloy film is made of an alloy of copper and at least one metal selected from among Hf, Ta, Ti, Nb and Zr.
13. The semiconductor device as set forth in claim 8 , wherein said alloy film is formed to have a substantial uniform composition rate of said copper and said dissimilar element from the boundary with said upper layer conductive film to the boundary with said barrier insulating film.
14. The semiconductor device as set forth in claim 8 , wherein said barrier insulating film is made of a material which contains substantially no oxygen.