Semiconductor device and manufacturing method thereof
View Patent ↗A semiconductor device and a manufacturing method thereof in which the peripheral length of an aperture and the mechanical strength of cylinders in a cell can be increased without changing the occupation rate of patterns in the cell. By forming a slit in the middle of each mask pattern so as not to expose parts of wafer, the aperture of the wafer becomes nearly cocoon-shaped with a constriction in the middle. Thereby, the peripheral length of the aperture can be increased without changing the occupation rate of the mask patterns in a cell. Further, the shape of the bottom of the aperture also becomes nearly cocoon-shaped with a constriction in the middle, and therefore it is possible to increase the mechanical strength of cylinders.
1. A semiconductor device manufacturing method of a deep sub-half micron semiconductor device, comprising the steps of:
coating a wafer with a resist,
replicating mask patterns on the resist with a photomask, and
forming cylinder type capacitors in a concave shape by photolithography, where each of the capacitors has a separate aperture defined by the respective mask patterns,
wherein each of the mask patterns includes a slit in the middle of each aperture so as not to expose parts of the wafer and so that each of apertures on the wafer is constricted in the middle in nearly a cocoon shape, and
wherein each of the mask patterns has a shape of a rectangle that is divided by the slit, and wherein each of the mask patterns further includes reentrant angles at a pair of opposite corners.
2. A semiconductor device manufacturing method of a deep sub-half micron semiconductor device, comprising the steps of:
coating a wafer with a resist;
replicating mask patterns on the resist with a photomask; and
forming cylinder type capacitors in a concave shape by photolithography,
wherein a slit is formed in the middle of each mask pattern on the photomask so as not to expose parts of the wafer, and each of apertures on the wafer is constricted in the middle in nearly a cocoon shape,
wherein each mask pattern has the shape of a rectangle with reentrant angles at a pair of opposite corners and is divided in the middle by the slit crossing both the reentrant angles.